公开(公告)号：US20160278196A1

公开(公告)日：2016-09-22

申请号：US15035983

申请日：2014-10-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Rolf Theodorus Nicolaas BEIJSENS ,  Kornelis Frits FEENSTRA ,  Arjen Teake DE JONG ,  Reinier Theodorus Martinus JILISEN ,  Niek Antonius Jacobus Maria KLEEMANS ,  Andrey NIKIPELOV ,  Pavel SEROGLAZOV ,  Nicolaas Antonius Allegondus Johannes VAN ASTEN ,  Harald Ernest VERBRAAK

IPC: H05G2/00

Abstract: A radiation system to generate a radiation emitting plasma, the radiation system include a fuel emitter to provide a fuel target at a plasma formation region, a first laser arranged to provide a first laser beam at the plasma formation region incident on the fuel target to generate a radiation emitting plasma, an imaging device arranged to obtain a first image of the radiation emitting plasma at the plasma formation region, the first image indicating at least one image property of the radiation emitting plasma, and a controller. The controller is arranged to receive the first image, and to generate at least one instruction based on the at least one image property of the radiation emitting plasma to modify operation of at least one component of the radiation system to reduce a detrimental effect of debris.

Abstract translation: 一种用于产生辐射发射等离子体的辐射系统，所述辐射系统包括燃料发射器，以在等离子体形成区域处提供燃料靶;布置成在入射到燃料靶上的等离子体形成区域处提供第一激光束的第一激光器，以产生 辐射发射等离子体，成像装置，被配置为获得等离子体形成区域处的发射等离子体的第一图像，第一图像表示发射等离子体的至少一个图像特性，以及控制器。 控制器布置成接收第一图像，并且基于辐射发射等离子体的至少一个图像特性生成至少一个指令，以修改辐射系统的至少一个分量的操作，以减少碎片的有害影响。

公开(公告)号：US20210141311A1

公开(公告)日：2021-05-13

申请号：US17155951

申请日：2021-01-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Dzmitry LABETSKI ,  Christianus Wilhelmus Johannes BERENDSEN ,  Rui Miguel DUARTE RODRIGUES NUNES ,  Alexander Igorevich ERSHOV ,  Kornelis Frits FEENSTRA ,  Igor Vladimirovich FOMENKOV ,  Klaus Martin HUMMLER ,  Arun JOHNKADAKSHAM ,  Matthias KRAUSHAAR ,  Andrew David LAFORGE ,  Marc Guy LANGLOIS ,  Maksim LOGINOV ,  Yue MA ,  Seyedmohammad MOJAB ,  Kerim NADIR ,  Alexander SHATALOV ,  John Tom STEWART ,  Henricus Gerardus TEGENBOSCH ,  Chunguang XIA

IPC: G03F7/20 ,  H05G2/00

Abstract: An extreme ultraviolet radiation (EUV) source, including: a vessel having an inner vessel wall and an intermediate focus (IF) region; an EUV collector disposed inside the vessel, the EUV collector including a reflective surface configured to reflect EUV radiation toward the intermediate focus region, the reflective surface configured to directionally face the IF region of the vessel; a showerhead disposed along at least a portion of the inner vessel wall, the showerhead including a plurality of nozzles configured to introduce gas into the vessel; and one or more exhausts configured to remove gas introduced into the vessel, the one or more exhausts being oriented along at least a portion of the inner vessel wall so that the gas is caused to flow away from the EUV collector.

公开(公告)号：US20240085796A1

公开(公告)日：2024-03-14

申请号：US18380439

申请日：2023-10-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Dzmitry LABETSKI ,  Christianus Wilhelmus Johannes BERENDSEN ,  Rui Miguel DUARTE RODRIGUES NUNES ,  Alexander Igorevich ERSHOV ,  Kornelis Frits FEENSTRA ,  Igor Vladimirovich FOMENKOV ,  Klaus Martin HUMMLER ,  Arun JOHNKADAKSHAM ,  Matthias KRAUSHAAR ,  Andrew David LAFORGE ,  Marc Guy LANGLOIS ,  Maksim LOGINOV ,  Yue MA ,  Seyedmohammad MOJAB ,  Kerim NADIR ,  Alexander SHATALOV ,  John Tom STEWART ,  Henricus Gerardus TEGENBOSCH ,  Chunguang XIA

IPC: G03F7/00 ,  H05G2/00

CPC classification number: G03F7/70033 ,  G03F7/70916 ,  H05G2/003 ,  H05G2/008

Abstract: An extreme ultraviolet radiation (EUV) source, including: a vessel having an inner vessel wall and an intermediate focus (IF) region; an EUV collector disposed inside the vessel, the EUV collector including a reflective surface configured to reflect EUV radiation toward the intermediate focus region, the reflective surface configured to directionally face the IF region of the vessel; a showerhead disposed along at least a portion of the inner vessel wall, the showerhead including a plurality of nozzles configured to introduce gas into the vessel; and one or more exhausts configured to remove gas introduced into the vessel, the one or more exhausts being oriented along at least a portion of the inner vessel wall so that the gas is caused to flow away from the EUV collector.

公开(公告)号：US20200089124A1

公开(公告)日：2020-03-19

申请号：US16469689

申请日：2018-01-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Dzmitry LABETSKI ,  Christianus Wilhelmus Johanne BERENDSEN ,  Rui Miguel DUARTE RODRIGES NUNES ,  Alexander Igorevich ERSHOV ,  Kornelis Frits FEENSTRA ,  Igor Vladimirovich FOMENKOV ,  Klaus Martin HUMMLER ,  Arun JOHNKADAKSHAM ,  Matthias KRAUSHAAR ,  Andrew David LAFORGE ,  Marc Guy LANGLOIS ,  Maksim LOGINOV ,  Yue MA ,  Seyedmohammad MOJAB ,  Kerim NADIR ,  Alexander SHATALOV ,  John Tom STEWART (IV) ,  Henricus Gerardus TEGENBOSCH ,  Chunguang XIA

IPC: G03F7/20 ,  H05G2/00

Abstract: An extreme ultraviolet radiation (EUV) source, including: a vessel having an inner vessel wall and an intermediate focus (IF) region; an EUV collector disposed inside the vessel, the EUV collector including a reflective surface configured to reflect EUV radiation toward the intermediate focus region, the reflective surface configured to directionally face the IF region of the vessel; a showerhead disposed along at least a portion of the inner vessel wall, the showerhead including a plurality of nozzles configured to introduce gas into the vessel; and one or more exhausts configured to remove gas introduced into the vessel, the one or more exhausts being oriented along at least a portion of the inner vessel wall so that the gas is caused to flow away from the EUV collector.