公开(公告)号：US20210141311A1

公开(公告)日：2021-05-13

申请号：US17155951

申请日：2021-01-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Dzmitry LABETSKI ,  Christianus Wilhelmus Johannes BERENDSEN ,  Rui Miguel DUARTE RODRIGUES NUNES ,  Alexander Igorevich ERSHOV ,  Kornelis Frits FEENSTRA ,  Igor Vladimirovich FOMENKOV ,  Klaus Martin HUMMLER ,  Arun JOHNKADAKSHAM ,  Matthias KRAUSHAAR ,  Andrew David LAFORGE ,  Marc Guy LANGLOIS ,  Maksim LOGINOV ,  Yue MA ,  Seyedmohammad MOJAB ,  Kerim NADIR ,  Alexander SHATALOV ,  John Tom STEWART ,  Henricus Gerardus TEGENBOSCH ,  Chunguang XIA

IPC: G03F7/20 ,  H05G2/00

Abstract: An extreme ultraviolet radiation (EUV) source, including: a vessel having an inner vessel wall and an intermediate focus (IF) region; an EUV collector disposed inside the vessel, the EUV collector including a reflective surface configured to reflect EUV radiation toward the intermediate focus region, the reflective surface configured to directionally face the IF region of the vessel; a showerhead disposed along at least a portion of the inner vessel wall, the showerhead including a plurality of nozzles configured to introduce gas into the vessel; and one or more exhausts configured to remove gas introduced into the vessel, the one or more exhausts being oriented along at least a portion of the inner vessel wall so that the gas is caused to flow away from the EUV collector.

公开(公告)号：US20240085796A1

公开(公告)日：2024-03-14

申请号：US18380439

申请日：2023-10-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Dzmitry LABETSKI ,  Christianus Wilhelmus Johannes BERENDSEN ,  Rui Miguel DUARTE RODRIGUES NUNES ,  Alexander Igorevich ERSHOV ,  Kornelis Frits FEENSTRA ,  Igor Vladimirovich FOMENKOV ,  Klaus Martin HUMMLER ,  Arun JOHNKADAKSHAM ,  Matthias KRAUSHAAR ,  Andrew David LAFORGE ,  Marc Guy LANGLOIS ,  Maksim LOGINOV ,  Yue MA ,  Seyedmohammad MOJAB ,  Kerim NADIR ,  Alexander SHATALOV ,  John Tom STEWART ,  Henricus Gerardus TEGENBOSCH ,  Chunguang XIA

IPC: G03F7/00 ,  H05G2/00

CPC classification number: G03F7/70033 ,  G03F7/70916 ,  H05G2/003 ,  H05G2/008

Abstract: An extreme ultraviolet radiation (EUV) source, including: a vessel having an inner vessel wall and an intermediate focus (IF) region; an EUV collector disposed inside the vessel, the EUV collector including a reflective surface configured to reflect EUV radiation toward the intermediate focus region, the reflective surface configured to directionally face the IF region of the vessel; a showerhead disposed along at least a portion of the inner vessel wall, the showerhead including a plurality of nozzles configured to introduce gas into the vessel; and one or more exhausts configured to remove gas introduced into the vessel, the one or more exhausts being oriented along at least a portion of the inner vessel wall so that the gas is caused to flow away from the EUV collector.

公开(公告)号：US20200089124A1

公开(公告)日：2020-03-19

申请号：US16469689

申请日：2018-01-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Dzmitry LABETSKI ,  Christianus Wilhelmus Johanne BERENDSEN ,  Rui Miguel DUARTE RODRIGES NUNES ,  Alexander Igorevich ERSHOV ,  Kornelis Frits FEENSTRA ,  Igor Vladimirovich FOMENKOV ,  Klaus Martin HUMMLER ,  Arun JOHNKADAKSHAM ,  Matthias KRAUSHAAR ,  Andrew David LAFORGE ,  Marc Guy LANGLOIS ,  Maksim LOGINOV ,  Yue MA ,  Seyedmohammad MOJAB ,  Kerim NADIR ,  Alexander SHATALOV ,  John Tom STEWART (IV) ,  Henricus Gerardus TEGENBOSCH ,  Chunguang XIA

IPC: G03F7/20 ,  H05G2/00

Abstract: An extreme ultraviolet radiation (EUV) source, including: a vessel having an inner vessel wall and an intermediate focus (IF) region; an EUV collector disposed inside the vessel, the EUV collector including a reflective surface configured to reflect EUV radiation toward the intermediate focus region, the reflective surface configured to directionally face the IF region of the vessel; a showerhead disposed along at least a portion of the inner vessel wall, the showerhead including a plurality of nozzles configured to introduce gas into the vessel; and one or more exhausts configured to remove gas introduced into the vessel, the one or more exhausts being oriented along at least a portion of the inner vessel wall so that the gas is caused to flow away from the EUV collector.

公开(公告)号：US20200012202A1

公开(公告)日：2020-01-09

申请号：US16575068

申请日：2019-09-18

Applicant: ASML Netherlands B.V.

Inventor： Marc Guy LANGLOIS

IPC: G03F7/20

Abstract: Methods and apparatus for in-situ incline cleaning an element disposed in a EUV generating chamber are disclosed. A capillary-based hydrogen radical generator is employed to form hydrogen radicals from hydrogen gas. The capillary-based hydrogen radical generator is resistively heated during operation and is oriented such that hydrogen radicals catalytically generated from the hydrogen gas are directed to a surface of the element to clean the surface.