公开(公告)号：WO2010040696A1

公开(公告)日：2010-04-15

申请号：PCT/EP2009/062840

申请日：2009-10-02

Applicant: ASML NETHERLANDS B.V. ,  LEEWIS, Christian ,  CRAMER, Hugo ,  VAN DE KERKHOF, Marcus ,  QUAEDACKERS, Johannes ,  MATTHEUS, Christine

Inventor： LEEWIS, Christian ,  CRAMER, Hugo ,  VAN DE KERKHOF, Marcus ,  QUAEDACKERS, Johannes ,  MATTHEUS, Christine

IPC: G03F7/20

CPC classification number: G03F7/70641 ,  G03F1/38 ,  G03F7/706 ,  G03F7/70608 ,  G03F7/70625 ,  G03F7/70675 ,  G03F7/70683

Abstract: In order to determine whether an exposure apparatus is outputting the correct dose of radiation and its projection system is focusing the radiation correctly, a test pattern is used on a mask for printing a specific marker onto a substrate. This marker is then measured by an inspection apparatus, such as a scatterometer, to determine whether there are errors in focus and dose and other related properties. The test pattern is configured such that changes in focus and dose may be easily determined by measuring the properties of a pattern that is exposed using the mask. The test pattern may be a 2D pattern where physical or geometric properties, e.g., pitch, are different in each of the two dimensions. The test pattern may also be a one-dimensional pattern made up of an array of structures in one dimension, the structures being made up of at least one substructure, the substructures reacting differently to focus and dose and giving rise to an exposed pattern from which focus and dose may be determined.

Abstract translation: 为了确定曝光装置是否正在输出正确剂量的辐射，并且其投影系统正确地对准辐射，在掩模上使用测试图案将特定标记物印刷到基底上。 然后通过诸如散射仪的检查装置测量该标记，以确定焦点和剂量以及其它相关性质是否存在错误。 测试图案被配置为使得可以通过测量使用掩模曝光的图案的特性容易地确定聚焦和剂量的变化。 测试图案可以是二维图案，其中物理或几何性质（例如间距）在两个维度的每一个中是不同的。 测试图案也可以是由一维结构阵列组成的一维图案，该结构由至少一个子结构构成，该子结构与焦点和剂量不同地反应并产生暴露图案， 可以确定焦点和剂量。

公开(公告)号：WO2010076254A1

公开(公告)日：2010-07-08

申请号：PCT/EP2009/067620

申请日：2009-12-21

Applicant: ASML Netherlands B.V. ,  MEGENS, Henricus ,  FINDERS, Jozef ,  KIERS, Antoine ,  QUAEDACKERS, Johannes ,  VAN DER SCHAAR, Maurits ,  LEEWIS, Christian ,  VAN LAARHOVEN, Hendrik

Inventor： MEGENS, Henricus ,  FINDERS, Jozef ,  KIERS, Antoine ,  QUAEDACKERS, Johannes ,  VAN DER SCHAAR, Maurits ,  LEEWIS, Christian ,  VAN LAARHOVEN, Hendrik

IPC: G03F7/20

CPC classification number: G03F7/70466 ,  G03F7/70616 ,  G03F7/70625 ,  G03F7/70633

Abstract: A first target population and a second target population are etched into a substrate. The second target population has an asymmetry with respect to the first target population. This can allow the different target populations to be distinguished and characteristics of the different target populations determined.

Abstract translation: 将第一目标群体和第二目标群体蚀刻到基底中。 第二个目标人口与第一个目标人群有不对称性。 这可以允许区分不同的目标群体并确定不同目标群体的特征。

公开(公告)号：WO2013189724A2

公开(公告)日：2013-12-27

申请号：PCT/EP2013/061370

申请日：2013-06-03

Applicant: ASML NETHERLANDS B.V.

Inventor： HINNEN, Paul ,  WANG, Shu-jin ,  LEEWIS, Christian ,  PAO, Kuo-Feng

IPC: G03F7/20

CPC classification number: G03F7/70641 ,  G03F1/42 ,  G03F1/44 ,  G03F7/70625 ,  G03F7/70683

Abstract: A method of determining focus of a lithographic apparatus has the following steps. Using the lithographic process to produce first and second structures on the substrate, the first structure has features which have a profile that has an asymmetry that depends on the focus and an exposure perturbation, such as dose or aberration. The second structure has features which have a profile that is differently sensitive to focus than the first structure and which is differently sensitive to exposure perturbation than the first structure. Scatterometer signals are used to determine a focus value used to produce the first structure. This may be done using the second scatterometer signal, and/or recorded exposure perturbation settings used in the lithographic process, to select a calibration curve for use in determining the focus value using the first scatterometer signal or by using a model with parameters related to the first and second scatterometer signals.

Abstract translation: 确定光刻设备的焦点的方法具有以下步骤。 使用光刻工艺在衬底上产生第一和第二结构，第一结构具有特征，其具有取决于焦点和曝光扰动（例如剂量或像差）的不对称性的轮廓。 第二结构具有这样的特征，其具有与第一结构不同的焦点敏感性，并且与第一结构不同的曝光扰动敏感度。 散射仪信号用于确定用于产生第一结构的聚焦值。 这可以使用第二散射仪信号和/或在光刻处理中使用的记录的曝光扰动设置来完成，以选择用于使用第一散射仪信号确定聚焦值的校准曲线，或者通过使用具有与 第一和第二散射仪信号。

公开(公告)号：WO2010049348A2

公开(公告)日：2010-05-06

申请号：PCT/EP2009/063918

申请日：2009-10-22

Applicant: ASML Netherlands B.V. ,  LEEWIS, Christian ,  VAN DE KERKHOF, Marcus ,  VAN DER MAST, Karel ,  VANOPPEN, Peter ,  ALVAREZ SANCHEZ, Ruben

Inventor： LEEWIS, Christian ,  VAN DE KERKHOF, Marcus ,  VAN DER MAST, Karel ,  VANOPPEN, Peter ,  ALVAREZ SANCHEZ, Ruben

IPC: G03F7/20

CPC classification number: G03F7/70625

Abstract: In a method for determining one or more properties of a substrate, scatterometry spectra can be measured from one or more targets on the substrate. Reconstructions of each of said spectra can be performed to derive one or more values for the property of the substrate, by comparing representations of each of the measured spectra with one or more modeled representations of spectra calculated using variable parameter values. At least one parameter in the reconstruction for each spectrum can be linked to the value of the parameter used in the reconstruction for a different spectrum.

Abstract translation: 在确定衬底的一个或多个特性的方法中，可以从衬底上的一个或多个靶测量散射光谱。 可以通过将每个测量光谱的表示与使用可变参数值计算的光谱的一个或多个建模表示进行比较，来执行每个所述光谱的重建以导出衬底性质的一个或多个值。 每个频谱的重建中至少有一个参数可以链接到在不同频谱的重构中使用的参数的值。