公开(公告)号：US20190086814A1

公开(公告)日：2019-03-21

申请号：US16194567

申请日：2018-11-19

Applicant: ASML NETHERLANDS B.V.

Inventor： Jeroen Peter Johannes Bruijstens ,  Richard Joseph Bruls ,  Hans Jansen ,  Siebe Landheer ,  Laurentinus Catrinus Jorritsma ,  Arnout Johannes Meester ,  Bauke Jansen ,  Ivo Adam Johannes Thomas ,  Marcio Alexandre Cano Miranda ,  Maurice Martinus Johannes Van Der Lee ,  Gheorghe Tanasa ,  Lambertus Dominicus Noordam

IPC: G03F7/20 ,  G03B27/52

CPC classification number: G03F7/70341 ,  G03B27/52

Abstract: A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.