公开(公告)号：US20160225477A1

公开(公告)日：2016-08-04

申请号：US14917623

申请日：2014-09-24

Applicant: ASML NETHERLANDS B.V.

Inventor： Vadim Yevgenyevich BANINE ,  Peturs Rutgerus BARTRAIJ ,  Ramon Pascal VAN GORKOM ,  Lucas Johannes Peter AMENT ,  Pieter Willem Herman DE JAGER ,  Gosse Charles DE VRIES ,  Rilpho Ludovicus DONKER ,  Wouter Joep ENGELEN ,  Olav Waldemar Vladimir FRIJNS ,  Leonardus Adrianus Gerardus GRIMMINCK ,  Andelko KATALENIC ,  Erik Roelof LOOPSTRA ,  Han-Kwang NIENHUYS ,  Andrey Alexandrovich NIKIPELOV ,  Michael Jozef Mathijs RENKENS ,  Franciscus Johannes Joseph JANSSEN ,  Borgert KRUIZINGA

IPC: G21K1/06 ,  G03F7/20

Abstract: A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.

Abstract translation: 用于光刻系统的传送系统。 光束传送系统包括被配置为从辐射源接收辐射束并且沿着一个或多个方向反射辐射部分的光学元件，以形成用于提供给一个或多个工具的一个或多个分支辐射束。