公开(公告)号：WO2017080727A1

公开(公告)日：2017-05-18

申请号：PCT/EP2016/073995

申请日：2016-10-07

Applicant: ASML NETHERLANDS B.V.

Inventor： MAASSEN, Martinus ,  PLUG, Reinder, Teun ,  BHATTACHARYYA, Kaustuve

IPC: G03F7/20

CPC classification number: G03F7/705 ,  G03F7/70625 ,  G03F7/70991

Abstract: Increasingly, metrology systems are integrated within the lithographic apparatuses, to provide integrated metrology within the lithographic process. However, this integration can result in a throughput or productivity impact of the whole lithographic apparatus which can be difficult to predict. It is therefore proposed to provide a simulation model which is operable to acquire throughput information associated with a throughput of a plurality of substrates within a lithographic apparatus, said throughput information comprising a throughput parameter, predict, using a throughput simulator the throughput using the throughput parameter as an input parameter. The throughput simulator may be calibrated using the acquired throughput information. The impact of at least one change of a throughput parameter on the throughput of the lithographic apparatus may be predicted using the throughput simulator.

Abstract translation: 计量系统越来越多地集成在光刻设备内，以提供光刻过程中的集成度量。 然而，这种集成可导致整个光刻设备的吞吐量或生产率影响，这可能难以预测。 因此提出提供一种模拟模型，其可操作以获取与光刻设备内的多个衬底的吞吐量相关联的吞吐量信息，所述吞吐量信息包括吞吐量参数，使用吞吐量模拟器预测使用吞吐量参数 作为输入参数。 吞吐量模拟器可以使用获取的吞吐量信息进行校准。 吞吐量参数的至少一个变化对光刻设备的吞吐量的影响可以使用吞吐量模拟器来预测。

公开(公告)号：WO2017153130A1

公开(公告)日：2017-09-14

申请号：PCT/EP2017/053257

申请日：2017-02-14

Applicant: ASML NETHERLANDS B.V.

Inventor： DE WIT, Johannes, Matheus, Marie ,  FEIJEN, Kim, Gerard ,  SIJBEN, Anko, Jozef, Cornelus ,  MAASSEN, Martinus ,  VAN DE GROES, Henricus, Martinus, Johannes

IPC: G03F7/20 ,  G02B5/20

Abstract: Disclosed is an illumination system for a metrology apparatus and a metrology apparatus comprising such an illumination system. The illumination system comprises an illumination source; and a linear variable filter arrangement configured to filter a radiation beam from said illumination source and comprising one or more linear variable filters. The illumination system is operable to enable selective control of a wavelength characteristic of the radiation beam subsequent to it being filtered by the linear variable filter arrangement.

Abstract translation: 公开了一种用于度量设备和包括这种照明系统的度量设备的照明系统。 照明系统包括照明源; 以及线性可变滤波器装置，其被配置为对来自所述照射源的辐射束进行滤波并且包括一个或多个线性可变滤波器。 照明系统可操作以在辐射束被线性可变滤波器装置滤波之后实现对辐射束的波长特性的选择性控制。