公开(公告)号：US20160026085A1

公开(公告)日：2016-01-28

申请号：US14871795

申请日：2015-09-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Bob STREEFKERK ,  Sjoerd Nicolaas Lambertus DONDERS ,  Roelof Frederik DE GRAAF ,  Christiaan Alexander HOOGENDAM ,  Hans JANSEN ,  Martinus Hendikus Antonius LEENDERS ,  Paulus Martinus Maria LIEBREGTS ,  Jeroen Johannes Sophia Maria MERTENS ,  Jan-Gerard Cornelis VAN DER TOORN ,  Michel RIEPEN

IPC: G03F7/20

CPC classification number: G03F7/2041 ,  G03F7/3085 ,  G03F7/70058 ,  G03F7/70341 ,  G03F7/70825 ,  G03F7/70875 ,  G03F7/70916 ,  G03F2007/2067 ,  H01L21/0274 ,  H01L21/67098

Abstract: An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.