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公开(公告)号：US11067901B2
公开(公告)日：2021-07-20
申请号：US16464705
申请日：2017-11-29
Applicant: ASML NETHERLANDS B.V.
Inventor： Scott Anderson Middlebrooks , Adrianus Cornelis Matheus Koopman , Markus Gerardus Martinus Maria Van Kraaij , Maxim Pisarenco
Abstract: A method including: obtaining a logistic mathematical model predicting the formation of a physical structure created using a patterning process; evaluating the logistic mathematical model to predict formation of a part of the physical structure and generate an output; and adapting, based on the output, an aspect of the patterning process.
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2.发明授权公开(公告)号：US10649345B2
公开(公告)日：2020-05-12
申请号：US16035961
申请日：2018-07-16
Applicant: ASML NETHERLANDS B.V.
Inventor： Maxim Pisarenco , Markus Gerardus Martinus Maria Van Kraaij , Sebastianus Adrianus Goorden
IPC: G06F17/50 , G03F7/20 , G01N21/47 , G01N21/88 , G01N21/956
Abstract: Methods and apparatuses for estimation of at least one parameter of interest of a feature fabricated on a substrate, the feature having a plurality of structure parameters, the structure parameters including the at least one parameter of interest and one or more nuisance parameters. A receiver receives radiation scattered from one or more measured features on the substrate. A pupil generator generates an unprocessed pupil representation of the received radiation. A matrix multiplier multiplies a transformation matrix with intensities of each of a plurality of pixels of the unprocessed pupil representation to determine a post-processed pupil representation in which effects of the one or more nuisance parameters are mitigated or removed. A parameter estimator estimates the at least one parameter of interest based on the post-processed pupil representation.
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公开(公告)号：US09939250B2
公开(公告)日：2018-04-10
申请号：US15036471
申请日：2014-11-04
Applicant: ASML Netherlands B.V.
Inventor： Maxim Pisarenco , Irwan Dani Setija
CPC classification number: G01B11/02 , G03F7/705 , G03F7/70625 , G03F7/70633
Abstract: In scatterometry, a merit function including a regularization parameter is used in an iterative process to find values for the scattering properties of the measured target. An optimal value for the regularization parameter is obtained for each measurement target and in each iteration of the iterative process. Various methods can be used to find the value for the regularization parameter, including the Discrepancy Principle, the chi-squared method and novel modifications of the Discrepancy Principle and the chi-squared method including a merit function.
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公开(公告)号：US11378891B2
公开(公告)日：2022-07-05
申请号：US17023474
申请日：2020-09-17
Applicant: ASML NETHERLANDS B.V.
Inventor： Davit Harutyunyan , Fei Jia , Frank Staals , Fuming Wang , Hugo Thomas Looijestijn , Cornelis Johannes Rijnierse , Maxim Pisarenco , Roy Werkman , Thomas Theeuwes , Tom Van Hemert , Vahid Bastani , Jochem Sebastiaan Wildenberg , Everhardus Cornelis Mos , Erik Johannes Maria Wallerbos
Abstract: A method, system and program for determining a fingerprint of a parameter. The method includes determining a contribution from a device out of a plurality of devices to a fingerprint of a parameter. The method includes obtaining parameter data and usage data, wherein the parameter data is based on measurements for multiple substrates having been processed by the plurality of devices, and the usage data indicates which of the devices out of the plurality of the devices were used in the processing of each substrate; and determining the contribution using the usage data and parameter data.
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公开(公告)号：US10607334B2
公开(公告)日：2020-03-31
申请号：US15533614
申请日：2015-11-13
Applicant: ASML Netherlands B.V.
Inventor： Scott Anderson Middlebrooks , Markus Gerardus Martinus Maria Van Kraaij , Maxim Pisarenco , Adrianus Cornelis Matheus Koopman , Stefan Hunsche , Willem Marie Julia Marcel Coene
Abstract: A method and apparatus of detection, registration and quantification of an image. The method may include obtaining an image of a lithographically created structure, and applying a level set method to an object, representing the structure, of the image to create a mathematical representation of the structure. The method may include obtaining a first dataset representative of a reference image object of a structure at a nominal condition of a parameter, and obtaining second dataset representative of a template image object of the structure at a non-nominal condition of the parameter. The method may further include obtaining a deformation field representative of changes between the first dataset and the second dataset. The deformation field may be generated by transforming the second dataset to project the template image object onto the reference image object. A dependence relationship between the deformation field and change in the parameter may be obtained.
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Patent Agency Ranking
公开(公告)号：US12259659B2
公开(公告)日：2025-03-25
申请号：US17963063
申请日：2022-10-10
Applicant: ASML Netherlands B.V.
Abstract: A method for determining an optimized weighting of an encoder and decoder network; the method comprising: for each of a plurality of test weightings, performing the following steps with the encoder and decoder operating using the test weighting: (a) encoding, using the encoder, a reference image and a distorted image into a latent space to form an encoding; (b) decoding the encoding, using the decoder, to form a distortion map indicative of a difference between the reference image and a distorted image; (c) spatially transforming the distorted image by the distortion map to obtain an aligned image; (d) comparing the aligned image to the reference image to obtain a similarity metric; and (e) determining a loss function which is at least partially defined by the similarity metric; wherein the optimized weighting is determined to be the test weighting which has an optimized loss function.
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公开(公告)号：US10816904B2
公开(公告)日：2020-10-27
申请号：US16461044
申请日：2018-05-23
Applicant: ASML NETHERLANDS B.V.
Inventor： Davit Harutyunyan , Fei Jia , Frank Staals , Fuming Wang , Hugo Thomas Looijestijn , Cornelis Johannes Rijnierse , Maxim Pisarenco , Roy Werkman , Thomas Theeuwes , Tom Van Hemert , Vahid Bastani , Jochem Sebastiaan Wildenberg , Everhardus Cornelis Mos , Erik Johannes Maria Wallerbos
Abstract: A method, system and program for determining a fingerprint of a parameter. The method includes determining a contribution from a device out of a plurality of devices to a fingerprint of a parameter. The method including: obtaining parameter data and usage data, wherein the parameter data is based on measurements for multiple substrates having been processed by the plurality of devices, and the usage data indicates which of the devices out of the plurality of the devices were used in the processing of each substrate; and determining the contribution using the usage data and parameter data.
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公开(公告)号：US10444638B2
公开(公告)日：2019-10-15
申请号：US16042302
申请日：2018-07-23
Applicant: ASML Netherlands B.V.
Inventor： Nitesh Pandey , Maxim Pisarenco , Alessandro Polo
IPC: G01N21/00 , G03F7/20 , G01N21/956 , G01N29/06
Abstract: A method and apparatus to measure overlay from images of metrology targets, images obtained using acoustic waves, for example images obtained using an acoustic microscope. The images of two targets are obtained, one image using acoustic waves and one image using optical waves, the edges of the images are determined and overlay between the two targets is obtained as the difference between the edges of the two images.
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公开(公告)号：US20180164229A1
公开(公告)日：2018-06-14
申请号：US15839299
申请日：2017-12-12
Applicant: ASML Netherlands B.V.
Inventor： Maxim Pisarenco , Frank Stefan Schneider , Markus Gerardus Martinus Maria Van Kraaij , Martijn Constant Van Beurden
IPC: G01N21/956 , G03F7/20 , G01N21/95
CPC classification number: G01N21/95607 , G01N21/9501 , G03F7/705 , G03F7/70625
Abstract: Disclosed is a method for reconstructing a parameter of a lithographic process. The method comprises the step of designing a preconditioner suitable for an input system comprising the difference of a first matrix and a second matrix, the first matrix being arranged to have a multi-level structure of at least three levels whereby at least two of said levels comprise a Toeplitz structure. One such preconditioner is a block-diagonal matrix comprising a BTTB structure generated from a matrix-valued inverse generating function. A second such preconditioner is determined from an approximate decomposition of said first matrix into one or more Kronecker products.
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公开(公告)号：US12271114B2
公开(公告)日：2025-04-08
申请号：US17441729
申请日：2020-03-26
Applicant: ASML NETHERLANDS B.V.
Inventor： Scott Anderson Middlebrooks , Adrianus Cornelis Matheus Koopman , Markus Gerardus Martinus Maria Van Kraaij , Maxim Pisarenco , Stefan Hunsche
Abstract: A method for training a machine learning model configured to predict a substrate image corresponding to a printed pattern of a substrate as measured via a metrology tool. The method involves obtaining a training data set including (i) metrology data of the metrology tool used to measure the printed pattern of the substrate, and (ii) a representation of a mask pattern employed for imaging the printed pattern on the substrate; and training, based on the training data set, a machine learning model to predict the substrate image of the substrate as measured by the metrology tool such that a cost function is improved, wherein the cost function includes a relationship between the predicted substrate image and the metrology data.
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