LITHOGRAPHIC METHOD AND APPARATUS
    1.
    发明申请
    LITHOGRAPHIC METHOD AND APPARATUS 审中-公开
    光刻方法和装置

    公开(公告)号:WO2015074796A1

    公开(公告)日:2015-05-28

    申请号:PCT/EP2014/071182

    申请日:2014-10-02

    Abstract: A method of correcting an optical image formed by an optical system, the method including obtaining a map indicative of a polarization dependent property of the optical system across a pupil plane of the optical system for each spatial position in an image plane of the optical system, combining the map indicative of the polarization dependent property of the optical system with a radiation map of the intensity and polarization of an input radiation beam to form an image map, and using the image map to correct an optical image formed by directing the input radiation beam through the optical system.

    Abstract translation: 一种校正由光学系统形成的光学图像的方法,所述方法包括:在光学系统的图像平面中,为每个空间位置获得指示光学系统的光学系统的光瞳面的偏振度相关特性的映射, 将表示光学系统的偏振相关属性的映射与输入辐射束的强度和偏振的辐射图组合以形成图像映射,并且使用图像映射来校正通过引导输入辐射束形成的光学图像 通过光学系统。

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