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    LITHOGRAPHIC METHOD AND APPARATUS
    1.
    发明申请
    LITHOGRAPHIC METHOD AND APPARATUS 审中-公开
    光刻方法和装置

    公开(公告)号：WO2015074796A1

    公开(公告)日：2015-05-28

    申请号：PCT/EP2014/071182

    申请日：2014-10-02

    Applicant: ASML NETHERLANDS B.V.

    Inventor： BORGES NICOLAU, Jaqueline ,  NOBLE, Hannah ,  BASELMANS, Johannes, Jacobus, Matheus ,  SMEETS, Bart ,  VAN ADRICHEM, Paulus, Jacobus, Maria

    IPC: G03F7/20

    CPC classification number: G03F7/2026 ,  G03F7/70258 ,  G03F7/70425 ,  G03F7/70433 ,  G03F7/705 ,  G03F7/70566 ,  G03F7/706 ,  G06T5/00

    Abstract: A method of correcting an optical image formed by an optical system, the method including obtaining a map indicative of a polarization dependent property of the optical system across a pupil plane of the optical system for each spatial position in an image plane of the optical system, combining the map indicative of the polarization dependent property of the optical system with a radiation map of the intensity and polarization of an input radiation beam to form an image map, and using the image map to correct an optical image formed by directing the input radiation beam through the optical system.

    Abstract translation: 一种校正由光学系统形成的光学图像的方法，所述方法包括：在光学系统的图像平面中，为每个空间位置获得指示光学系统的光学系统的光瞳面的偏振度相关特性的映射， 将表示光学系统的偏振相关属性的映射与输入辐射束的强度和偏振的辐射图组合以形成图像映射，并且使用图像映射来校正通过引导输入辐射束形成的光学图像 通过光学系统。

    IMMERSION LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    2.
    发明申请
    IMMERSION LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
    倾斜平面设备和设备制造方法

    公开(公告)号：WO2016012193A1

    公开(公告)日：2016-01-28

    申请号：PCT/EP2015/064500

    申请日：2015-06-26

    Applicant: ASML NETHERLANDS B.V.

    Inventor： POLET, Theodorus, Wilhelmus ,  BASELMANS, Johannes, Jacobus, Matheus ,  BOUMAN, Willem, Jan ,  LEMPENS, Han, Henricus, Aldegonda ,  MODDERMAN, Theodorus, Marinus ,  ROPS, Cornelius, Maria ,  SMEETS, Bart ,  STEFFENS, Koen ,  VAN DER HAM, Ronald

    IPC: G03F7/20

    CPC classification number: G03F7/70866 ,  G03F7/70341 ,  G03F7/7095

    Abstract: Lithographic apparatus and device manufacturing methods are disclosed. In one arrangement there is provided an immersion lithographic apparatus comprising a projection system (PS). The projection system is configured to project a patterned radiation beam through an immersion liquid onto a target portion of a substrate. An external surface of the projection system comprises a first surface (102). The first surface has a non-planar shape. An element (106) is attached to the first surface and positioned so that at least a portion of the element contacts the immersion liquid in use. The element comprises a closed loop of continuously integral material in a preformed state and conforming to the non-planar shape of the first surface.

    Abstract translation: 公开了平版印刷设备和设备制造方法。 在一种布置中，提供了包括投影系统（PS）的浸没式光刻设备。 投影系统被配置为将图案化的辐射束通过浸没液投影到基板的目标部分上。 投影系统的外表面包括第一表面（102）。 第一表面具有非平面形状。 元件（106）附接到第一表面并且定位成使得至少一部分元件在使用中接触浸没液体。 该元件包括处于预成型状态并与第一表面的非平面形状一致的连续整体材料的闭环。

    LITHOGRAPHIC APPARATUS AND METHOD
    4.
    发明申请
    LITHOGRAPHIC APPARATUS AND METHOD 审中-公开
    LITHOGRAPHIC设备和方法

    公开(公告)号：WO2015197260A1

    公开(公告)日：2015-12-30

    申请号：PCT/EP2015/060618

    申请日：2015-05-13

    Applicant: ASML NETHERLANDS B.V.

    Inventor： BASELMANS, Johannes, Jacobus, Matheus ,  BUTLER, Hans ,  HOOGENDAM, Christiaan, Alexander ,  KERSSEMAKERS, Sander ,  SMEETS, Bart ,  VAN BALLEGOIJ, Robertus, Nicodemus, Jacobus ,  VAN BUSSEL, Hubertus, Petrus, Leonardus, Henrica

    IPC: G03F7/20 ,  G02B13/14

    CPC classification number: G03F7/70258 ,  G03F7/70066 ,  G03F7/70141 ,  G03F7/70641

    Abstract: A method of modifying a lithographic apparatus comprising an illumination system for providing a radiation beam, a support structure for supporting a patterning device to impart the radiation beam with a pattern in its cross-section, a first lens for projecting the radiation beam at the patterning device with a first magnification, a substrate table for holding a substrate, and a first projection system for projecting the patterned radiation beam at a target portion of the substrate with a second magnification. The first lens and the first projection system together provide a third magnification. The method comprises reducing by a first factor the first magnification to provide a second lens for projecting the radiation beam with a fourth magnification; and increasing by the first factor the second magnification to provide a second projection system for projecting the patterned radiation beam at the target portion of the substrate with a fifth magnification.

    Abstract translation: 一种修改包括用于提供辐射束的照明系统的光刻设备的方法，用于支撑图案形成装置以将辐射束赋予其横截面图案的支撑结构，用于将辐射束投射在图案化处的第一透镜 具有第一放大率的装置，用于保持基板的基板台，以及用于以第二倍率将图案化的辐射束投影在基板的目标部分的第一投影系统。 第一透镜和第一投影系统一起提供第三放大率。 该方法包括以第一因子减小第一倍率以提供用于以第四放大率投影辐射束的第二透镜; 并且通过第一因子增加第二倍率以提供第二投影系统，用于以第五放大率将图案化的辐射束投影到基板的目标部分。

    LITHOGRAPHIC APPARATUS AND METHOD
    5.
    发明申请
    LITHOGRAPHIC APPARATUS AND METHOD 审中-公开

    公开(公告)号：WO2018228820A1

    公开(公告)日：2018-12-20

    申请号：PCT/EP2018/064330

    申请日：2018-05-31

    Applicant: ASML NETHERLANDS B.V.

    Inventor： BASELMANS, Johannes, Jacobus, Matheus ,  SMEETS, Bart ,  TOMA, Cristina, Ioana

    IPC: G03F7/20

    Abstract: A method for quantifying the effect of pupil function variations on a lithographic effect within a lithographic apparatus is disclosed. The method comprises: determining a discrete, two-dimensional sensitivity map in a pupil plane of the lithographic apparatus, wherein the lithographic effect is given by the inner product of said sensitivity map with a discrete, two-dimensional pupil function variation map of a radiation beam in the pupil plane. The pupil plane of a lithographic apparatus generally refers to the exit pupil of a projection system of the lithographic apparatus. Pupil function variations may comprise: relative phase variations within the pupil plane and/or relative intensity variations within the pupil plane.

    A LITHOGRAPHIC APPARATUS AND A METHOD OF MANUFACTURING A LITHOGRAPHIC APPARATUS
    6.
    发明申请
    A LITHOGRAPHIC APPARATUS AND A METHOD OF MANUFACTURING A LITHOGRAPHIC APPARATUS 审中-公开
    一种平面设备和一种制造光刻设备的方法

    公开(公告)号：WO2016000903A1

    公开(公告)日：2016-01-07

    申请号：PCT/EP2015/062525

    申请日：2015-06-04

    Applicant: ASML NETHERLANDS B.V.

    Inventor： PIETERSE, Gerben ,  POLET, Theodorus, Wilhelmus ,  BASELMANS, Johannes, Jacobus, Matheus ,  BOUMAN, Willem, Jan ,  MODDERMAN, Theodorus, Marinus ,  ROPS, Cornelius, Maria ,  SMEETS, Bart ,  STEFFENS, Koen ,  VAN DER HAM, Ronald

    IPC: G03F7/20

    CPC classification number: G03F7/70891 ,  G03F7/70341

    Abstract: An immersion lithographic apparatus comprising: a projection system for projecting a patterned radiation beam through an optically active part of a final lens element of the projection system towards a substrate supported by a substrate table, the final lens element having an exposed bottom surface; a liquid confinement structure configured to supply and confine immersion liquid to an immersion space between the final lens element of the projection system and a surface formed of at least one of the substrate and substrate table; and a passageway-former between the projection system and the liquid confinement structure, and a passageway between the passageway-former and the optically active part of the final lens element, the passageway being in liquid communication via an opening with the immersion space and extending radially outwardly with respect to an optical axis of the projection system at least to an edge of the exposed bottom surface of the final lens element and being constructed and configured such that in use it is filled with liquid from the immersion space by capillary action.

    Abstract translation: 一种浸没式光刻设备，包括：投影系统，用于将图案化的辐射束通过投影系统的最终透镜元件的光学活性部分朝向由衬底台支撑的衬底投射，最终透镜元件具有暴露的底表面; 液体限制结构，被配置为将浸没液体供应并限制在投影系统的最终透镜元件与由至少一个基板和基板台形成的表面之间的浸没空间中; 以及在所述投影系统和所述液体限制结构之间的通道形成器以及所述通道形成器和所述最终透镜元件的光学活性部分之间的通道，所述通道经由具有所述浸没空间的开口与所述浸没空间液体连通并且径向延伸 至少相对于最终透镜元件的暴露的底部表面的边缘而相对于投影系统的光轴向外侧并且被构造和构造使得在使用中通过毛细管作用从浸没空间填充液体。

    IMMERSION LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    8.
    发明公开
    IMMERSION LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
    浸没式光刻设备和器件制造方法

    公开(公告)号：EP3172624A1

    公开(公告)日：2017-05-31

    申请号：EP15734325.2

    申请日：2015-06-26

    Applicant: ASML Netherlands B.V.

    Inventor： POLET, Theodorus, Wilhelmus ,  BASELMANS, Johannes, Jacobus, Matheus ,  BOUMAN, Willem, Jan ,  LEMPENS, Han, Henricus, Aldegonda ,  MODDERMAN, Theodorus, Marinus ,  ROPS, Cornelius, Maria ,  SMEETS, Bart ,  STEFFENS, Koen ,  VAN DER HAM, Ronald

    IPC: G03F7/20

    Abstract: An immersion lithographic apparatus includes a projection system. The projection system is configured to project a patterned radiation beam through an immersion liquid onto a target portion of a substrate. An external surface of the projection system includes a first surface. The first surface has a non-planar shape. An element is attached to the first surface and positioned so that at least a portion of the element contacts the immersion liquid in use. The element includes a closed loop of continuously integral material in a preformed state and conforms to the non-planar shape of the first surface.

    Abstract translation: 公开了光刻设备和器件制造方法。 在一种布置中，提供了一种包括投影系统（PS）的浸没式光刻设备。 投影系统被配置成将图案化的辐射束通过浸没液体投影到衬底的目标部分上。 投影系统的外表面包括第一表面（102）。 第一个表面具有非平面形状。 元件（106）附接到第一表面并且被定位成使得元件的至少一部分在使用中接触浸没液体。 该元件包括处于预成型状态并且与第一表面的非平面形状一致的闭合的连续整体材料环。

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