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    METHOD AND APPARATUS FOR RETICLE OPTIMIZATION
    1.
    发明申请
    METHOD AND APPARATUS FOR RETICLE OPTIMIZATION 审中-公开
    方法和装置优化

    公开(公告)号：WO2016128190A1

    公开(公告)日：2016-08-18

    申请号：PCT/EP2016/051074

    申请日：2016-01-20

    Applicant: ASML NETHERLANDS B.V.

    Inventor： TEL, Wim, Tjibbo ,  JOCHEMSEN, Marinus ,  STAALS, Frank ,  PRENTICE, Christopher ,  DEPRE, Laurent, Michel, Marcel ,  BELTMAN, Johannes, Marcus, Maria ,  WERKMAN, Roy ,  WILDENBERG, Jochem, Sebastiaan ,  MOS, Everhardus, Cornelis

    IPC: G03F1/36 ,  G03F1/70

    CPC classification number: G03F1/70 ,  G03F1/22 ,  G03F1/36 ,  G06T7/0006 ,  G06T2207/30148

    Abstract: A method includes determining topographic information of a substrate for use in a lithographic imaging system, determining or estimating, based on the topographic information, imaging error information for a plurality of points in an image field of the lithographic imaging system, adapting a design for a patterning device based on the imaging error information. In an embodiment, a plurality of locations for metrology targets is optimized based on imaging error information for a plurality of points in an image field of a lithographic imaging system, wherein the optimizing involves minimizing a cost function that describes the imaging error information. In an embodiment, locations are weighted based on differences in imaging requirements across the image field.

    Abstract translation: 一种方法包括确定用于光刻成像系统的基板的地形信息，基于地形信息确定或估计平版印刷成像系统的图像场中的多个点的成像误差信息，使设计适于 基于成像误差信息的图案形成装置。 在一个实施例中，基于用于光刻成像系统的图像场中的多个点的成像误差信息优化用于度量目标的多个位置，其中所述优化涉及最小化描述成像误差信息的成本函数。 在一个实施例中，基于图像场的成像要求的差异对位置进行加权。

    LITHOGRAPHIC APPARATUS WITH DATA PROCESSING APPARATUS
    2.
    发明申请
    LITHOGRAPHIC APPARATUS WITH DATA PROCESSING APPARATUS 审中-公开
    具有数据处理设备的平面设备

    公开(公告)号：WO2015131969A1

    公开(公告)日：2015-09-11

    申请号：PCT/EP2014/078164

    申请日：2014-12-17

    Applicant: ASML NETHERLANDS B.V.

    Inventor： SCHMITT-WEAVER, Emil, Peter ,  HENKE, Wolfgang ,  PRENTICE, Christopher ,  STAALS, Frank ,  TEL, Wim, Tjibbo

    IPC: G03F9/00

    CPC classification number: G03F7/70641 ,  G03F7/70725 ,  G03F9/7019 ,  G03F9/7026 ,  G03F9/7092

    Abstract: A lithographic apparatus applies a pattern onto a substrate using an optical projection system. The apparatus includes an optical level sensor (LS) and an associated processor for obtaining a height map (h(x,y)) of the substrate surface prior to applying said pattern. A controller uses the height map to control focusing of the projection system when applying said pattern. The processor is further arranged to use information relating to processing previously applied to the substrate to define at least first and second regions of the substrate and to vary the manner in which said measurement signals are used to control focus, between the first and second regions. For example, algorithms (A(x,y)) for calculation of height values from optical measurement signals (S(x,y)) can be varied according to differences in known structure and/or materials. Measurements from certain regions can be selectively excluded from calculation of the height map and/or from use in focusing.

    Abstract translation: 光刻设备使用光学投影系统将图案施加到基板上。 该装置包括光学水平传感器（LS）和相关联的处理器，用于在施加所述图案之前获得衬底表面的高度图（h（x，y））。 当应用所述图案时，控制器使用高度图来控制投影系统的聚焦。 处理器还被布置为使用与先前施加到衬底上的处理相关的信息来限定衬底的至少第一和第二区域，并且改变在第一和第二区域之间使用所述测量信号来控制焦点的方式。 例如，用于计算光学测量信号（S（x，y））的高度值的算法（A（x，y））可以根据已知结构和/或材料的差异而变化。 可以从高度图的计算和/或聚焦中的使用中选择性地排除来自某些区域的测量。

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