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Patent Agency Ranking
公开(公告)号：US20220082943A1
公开(公告)日：2022-03-17
申请号：US17419360
申请日：2019-12-12
Applicant: ASML NETHERLANDS B.V.
IPC: G03F7/20
Abstract: A method for determining a component of optical characteristic of a patterning process. The method includes obtaining (i) a plurality of desired features, (ii) a plurality of simulated features based on the plurality of desired features and an optical characteristic of a patterning apparatus, and (iii) a performance metric (e.g., EPE) related to a desired feature of the plurality of desired features and an associated simulated feature of the plurality of simulated features; determining a set of optical sensitivities of the patterning process by computing a change in value of the performance metric based on a change in value of the optical characteristic; and identifying, based on the set of optical sensitivities, a set of components (e.g., principal components) of the optical characteristic that include dominant contributors in changing the value of the performance metric.
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2.发明申请公开(公告)号：US20200026182A1
公开(公告)日：2020-01-23
申请号：US16456878
申请日：2019-06-28
Applicant: ASML Netherlands B.V.
Inventor： Miguel GARCIA GRANDA , Steven Erik STEEN , Eric Jos Anton BROUWER , Bart Peter Bert SEGERS , Pierre-Yves Jerome Yvan GUITTET , Frank STAALS , Paulus Jacobus Maria VAN ADRICHEM
Abstract: Disclosed is a method of determining a characteristic of interest, in particular focus, relating to a structure on a substrate formed by a lithographic process, and an associated patterning device and lithographic system. The method comprises forming a modified substrate feature on the substrate using a corresponding modified reticle feature on a patterning device, the modified substrate feature being formed for a primary function other than metrology, more specifically for providing a support for a vertically integrated structure. The modified reticle feature is such that said modified substrate feature is formed with a geometry dependent on the characteristic of interest during formation. The modified substrate feature can be measured to determine said characteristic of interest.
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公开(公告)号：US20210165332A1
公开(公告)日：2021-06-03
申请号：US16769534
申请日：2018-12-17
Applicant: ASML NETHERLANDS B.V.
Inventor： Paulus Jacobus Maria VAN ADRICHEM , Ahmad Wasiem Ibrahim EL-SAID , Christoph Rene Konrad Cebulla HENNERKES , Johannes Christiaan Maria JASPER
IPC: G03F7/20
Abstract: A method involving: obtaining a process model of a patterning process that includes or accounts for an average optical aberration of optical systems of a plurality of apparatuses for use with a patterning process; and applying the process model to determine an adjustment to a parameter of the patterning process to account for the average optical aberration.
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公开(公告)号：US20180039180A1
公开(公告)日：2018-02-08
申请号：US15788860
申请日：2017-10-20
Applicant: ASML Netherlands B.V.
Inventor： Jaqueline BORGES NICOLAU , Hannah NOBLE , Johannes Jacobus Matheus BASELMANS , Bart SMEETS , Paulus Jacobus Maria VAN ADRICHEM
CPC classification number: G03F7/70425 , G03F7/2026 , G03F7/70258 , G03F7/70433 , G03F7/705 , G03F7/70566 , G03F7/706 , G06T5/00
Abstract: A method of correcting an optical image formed by an optical system, the method including obtaining a map indicative of a polarization dependent property of the optical system across a pupil plane of the optical system for each spatial position in an image plane of the optical system, combining the map indicative of the polarization dependent property of the optical system with a radiation map of the intensity and polarization of an input radiation beam to form an image map, and using the image map to correct an optical image formed by directing the input radiation beam through the optical system.
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公开(公告)号：US20160274462A1
公开(公告)日：2016-09-22
申请号：US15032245
申请日：2014-10-02
Applicant: ASML NETHERLANDS B.V.
Inventor： Jaqueline BORGES NICOLAU , Hannah NOBLE , Johannes Jacobus Matheus BASELMANS , Bart SMEETS , Paulus Jacobus Maria VAN ADRICHEM
CPC classification number: G03F7/70425 , G03F7/2026 , G03F7/70258 , G03F7/70433 , G03F7/705 , G03F7/70566 , G03F7/706 , G06T5/00
Abstract: A method of correcting an optical image formed by an optical system, the method including obtaining a map indicative of a polarization dependent property of the optical system across a pupil plane of the optical system for each spatial position in an image plane of the optical system, combining the map indicative of the polarization dependent property of the optical system with a radiation map of the intensity and polarization of an input radiation beam to form an image map, and using the image map to correct an optical image formed by directing the input radiation beam through the optical system.
Abstract translation: 一种校正由光学系统形成的光学图像的方法，所述方法包括在所述光学系统的图像平面中的每个空间位置获得指示所述光学系统的光瞳平面上的所述光学系统的偏振度相关特性的映射， 将表示光学系统的偏振相关属性的映射与输入辐射束的强度和偏振的辐射图组合以形成图像映射，并且使用图像映射来校正通过引导输入辐射束形成的光学图像 通过光学系统。
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