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公开(公告)号:US20210263424A1
公开(公告)日:2021-08-26
申请号:US17315650
申请日:2021-05-10
Applicant: ASML NETHERLANDS B.V.
Inventor: Pepijn VAN DEN EIJNDEN , Cornelius Maria ROPS , Theodorus Wilhelmus POLET , Floor Lodewijk KEUKENS , Gheorghe TANASA , Rogier Hendrikus Magdalena CORTIE , Koen CUYPERS , Harold Sebastiaan BUDDENBERG , Giovanni Luca GATTOBIGIO , Evert VAN VLIET , Nicolaas TEN KATE , Mark Johannes Hermanus FRENCKEN , Jantien Laura VAN ERVE , Marcel Maria Cornelius Franciscus TEUNISSEN
IPC: G03F7/20
Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.
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公开(公告)号:US20230053840A1
公开(公告)日:2023-02-23
申请号:US17952119
申请日:2022-09-23
Applicant: ASML NETHERLANDS B.V.
Inventor: Pepijn VAN DEN EIJNDEN , Cornelius Maria ROPS , Theodorus Wilhelmus POLET , Floor Lodewijk KEUKENS , Gheorghe TANASA , Rogier Hendrikus Magdalena CORTIE , Koen CUYPERS , Harold Sebastiaan BUDDENBERG , Giovanni Luca GATTOBIGIO , Evert VAN VLIET , Nicolaas TEN KATE , Mark Johannes Hermanus FRENCKEN , Jantien Laura VAN ERVE , Marcel Maria Cornelius Franciscus TEUNISSEN
IPC: G03F7/20
Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.
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3.
公开(公告)号:US20170108781A1
公开(公告)日:2017-04-20
申请号:US15317386
申请日:2015-05-12
Applicant: ASML NETHERLANDS B.V.
Inventor: Aart Adrianus VAN BEUZEKOM , Jozef Augustinus Maria ALBERTI , Hubert Marie SEGERS , Ronald VAN DER HAM , Francis FAHRNI , Ruud OLIESLAGERS , Gerben PIETERSE , Cornelius Maria ROPS , Pepijn VAN DEN EIJNDEN , Paul VAN DONGEN , Bas WILLEMS
IPC: G03F7/20
CPC classification number: G03F7/7075 , G03F7/70341 , G03F7/70991 , H01L21/52 , H01L21/67034 , H01L21/6704 , H01L21/67178 , H01L21/67207 , H01L21/67225
Abstract: A lithographic apparatus includes a substrate table, a post-exposure handling module, a substrate handling robot and a drying station. The substrate table is configured to support a substrate for an exposure process. The post-exposure handling module is configured to handle the substrate post-exposure. The substrate handling robot is configured to transfer the substrate from the substrate table along a substrate unloading path into the post-exposure handling module. The drying station is configured to actively remove liquid from a surface of the substrate. The drying station is located in the substrate unloading path. The drying station is located in the post-exposure handling module. The post-exposure handling module may be a substrate handler.
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