公开(公告)号：WO2016058822A1

公开(公告)日：2016-04-21

申请号：PCT/EP2015/072376

申请日：2015-09-29

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN ZWOL, Pieter-Jan ,  KUZNETSOV, Alexey, Sergeevich ,  OSORIO OLIVEROS, Edgar ,  STEVENS, Lucas

IPC: G21K1/06 ,  G03F7/20

CPC classification number: G21K1/062 ,  G03F7/70316 ,  G03F7/70916 ,  G03F7/70933 ,  G03F7/70958

Abstract: A multilayer optics is configured for reflection of radiation having a wavelength λ, the multilayer optics comprising a multilayer stack (300) of alternating layer pairs, wherein each pair thereof comprises a first/second layer of thickness d1/d2, wherein a periodic length p=d1+d2 of each pair of alternating layers satisfies: m λ = 2 p sinΘ, wherein m = 1, 2, 3, etc. is an integer representing the order of the Bragg diffraction peak and Θ is the angle between an incident radiation and a scattering plane of the multilayer optics; a protective region (310) comprising pairs of alternating protective layers, each pair thereof comprising a first/second protective layer of thickness ds1/ds2, wherein a periodic length ps=ds1+ds2 of each pair of alternating protective layers satisfies: m λ = 2 ps sinΘ and ps = p N, wherein N is an integer equal or larger than 2. The multilayer mirror may optionally be provided with a capping layer (320). There is further disclosed an apparatus for extreme ultraviolet lithography comprising: a vacuum container comprising an optical element having an optically active surface, a gas supply system comprising a source of an anti-blistering gaseous mixture, an exhauster configured to exhaust gas in said vacuum container; wherein the gas supply system is arranged to provide the anti-blistering gaseous mixture at the optically active surface of the optical element, and wherein the anti-blistering gaseous mixture comprises an oxygen containing gas compound at a partial pressure ranging from 5e-8 to 1e-4 mbar.

Abstract translation: 多层光学器件被配置用于反射具有波长λ的辐射，所述多层光学器件包括交替层对的多层堆叠（300），其中每对包括厚度为d1 / d2的第一/第二层，其中周期长度p 每对交替层的= d1 + d2满足：mλ= 2 psinθ，其中m = 1,2,3等是表示布拉格衍射峰的顺序的整数，Θ是入射辐射 和多层光学器件的散射面; 包括交替保护层对的保护区域（310），每对保护层包括厚度为ds1 / ds2的第一/第二保护层，其中每对交替保护层的周期长度ps = ds1 + ds2满足：mλ= 2pssinΘ和ps = p N，其中N是等于或大于2的整数。多层反射镜可以可选地设置有覆盖层（320）。 还公开了一种用于极紫外光刻的装置，包括：真空容器，其包括具有光学活性表面的光学元件，气体供应系统，其包括防起泡气体混合物源，排气器，其构造成在所述真空容器 ; 其中所述气体供应系统被布置成在所述光学元件的光学活性表面处提供所述防起泡气体混合物，并且其中所述防起泡气体混合物包含分压为5e-8至1e的含氧气体化合物 -4毫巴

公开(公告)号：WO2011160861A1

公开(公告)日：2011-12-29

申请号：PCT/EP2011/054057

申请日：2011-03-17

Applicant: ASML NETHERLANDS B.V. ,  YAKUNIN, Andrei ,  BANINE, Vadim ,  LOOPSTRA, Erik ,  VAN DER SCHOOT, Harmen ,  STEVENS, Lucas ,  VAN KAMPEN, Maarten

Inventor： YAKUNIN, Andrei ,  BANINE, Vadim ,  LOOPSTRA, Erik ,  VAN DER SCHOOT, Harmen ,  STEVENS, Lucas ,  VAN KAMPEN, Maarten

IPC: G03F7/20 ,  G21K1/06 ,  G03F1/14 ,  G02B5/20 ,  G02B5/08 ,  C01B31/04

CPC classification number: G03F1/64 ,  B82Y10/00 ,  B82Y40/00 ,  C01B32/20 ,  G02B5/0816 ,  G02B5/0891 ,  G02B5/204 ,  G02B5/208 ,  G02B27/0006 ,  G03B27/54 ,  G03F1/24 ,  G03F1/62 ,  G03F7/70058 ,  G03F7/702 ,  G03F7/70916 ,  G03F7/70958 ,  G03F7/70983 ,  G21K1/062 ,  G21K2201/061 ,  H01B1/04 ,  H01B1/24

Abstract: A lithographic apparatus includes a radiation source configured to produce a radiation beam, and a support configured to support a patterning device. The patterning device is configured to impart the radiation beam with a pattern to form a patterned radiation beam. A chamber is located between the radiation source and patterning device. The chamber contains at least one optical component configured to reflect the radiation beam, and is configured to permit radiation from the radiation source to pass therethrough. A membrane (44) is configured to permit the passage of the radiation beam, and to prevent the passage of contamination particles (54) through the membrane. A particle trapping structure (52) is configured to permit gas to flow along an indirect path from inside the chamber to outside the chamber. The indirect path is configured to substantially prevent the passage of contamination particles (58) from inside the chamber to outside the chamber.

Abstract translation: 光刻设备包括被配置为产生辐射束的辐射源和被配置为支撑图案形成装置的支撑件。 图案形成装置被配置为使辐射束具有图案以形成图案化的辐射束。 腔室位于辐射源和图案形成装置之间。 所述腔室包括被配置为反射辐射束的至少一个光学部件，并且被配置为允许来自辐射源的辐射通过。 膜（44）构造成允许辐射束的通过，并且防止污染颗粒（54）通过膜。 颗粒捕获结构（52）被配置为允许气体沿着室内的间接路径流动到室外。 间接路径构造成基本上防止污染颗粒（58）从腔室内部通过到室外。

公开(公告)号：WO2013023874A1

公开(公告)日：2013-02-21

申请号：PCT/EP2012/064270

申请日：2012-07-20

Applicant: ASML Netherlands B.V. ,  DE JAGER, Pieter ,  BANINE, Vadim ,  BLEEKER, Arno ,  VAN DER SCHOOT, Harmen ,  STEVENS, Lucas ,  VERMEULEN, Johannes ,  WUISTER, Sander

Inventor： DE JAGER, Pieter ,  BANINE, Vadim ,  BLEEKER, Arno ,  VAN DER SCHOOT, Harmen ,  STEVENS, Lucas ,  VERMEULEN, Johannes ,  WUISTER, Sander

IPC: G03F7/20

CPC classification number: B41C1/1091 ,  C23C14/28 ,  G03F7/70375 ,  G03F7/70383

Abstract: In an embodiment, a lithographic apparatus is disclosed that includes a modulator (102, 112) to modulate a plurality of beams according to a desired pattern and a donor structure (208) on to which the modulated beams impinge. The donor structure configured such that the impinging modulated beams cause a donor material to be transferred from the donor structure to a substrate (114).

Abstract translation: 在一个实施例中，公开了一种光刻设备，其包括根据期望的图案调制多个光束的调制器（102,112）和被调制的光束照射到的施主结构（208）。 供体结构被配置成使得入射的调制光束使施主材料从施主结构转移到衬底（114）。

公开(公告)号：WO2012136434A2

公开(公告)日：2012-10-11

申请号：PCT/EP2012/053918

申请日：2012-03-07

Applicant: ASML NETHERLANDS B.V. ,  DE JAGER, Pieter ,  BANINE, Vadim ,  ONVLEE, Johannes ,  STEVENS, Lucas ,  WUISTER, Sander ,  IOSAD, Nikolay

Inventor： DE JAGER, Pieter ,  BANINE, Vadim ,  ONVLEE, Johannes ,  STEVENS, Lucas ,  WUISTER, Sander ,  IOSAD, Nikolay

IPC: G02F1/29

CPC classification number: G03F7/70191 ,  G02F1/1303 ,  G02F1/29 ,  G03F7/704

Abstract: In an embodiment, a lithographic apparatus is disclosed that includes a modulator configured to expose an exposure area of the substrate to a plurality of beams modulated according to a desired pattern and a projection system configured to project the modulated beams onto the substrate. The modulator includes a deflector to displace the plurality of beams with respect to an exposure area.

Abstract translation: 在一个实施例中，公开了一种光刻设备，该光刻设备包括：调制器，被配置为将衬底的曝光区域暴露于根据期望的图案调制的多个束;以及投影系统，配置为将调制的 光束照射到基底上。 调制器包括偏转器，以使多个光束相对于曝光区域移位。