公开(公告)号：WO2022253501A1

公开(公告)日：2022-12-08

申请号：PCT/EP2022/061665

申请日：2022-05-02

Applicant: ASML NETHERLANDS B.V.

Inventor： ZHOU, Zili ,  SWINKELS, Daan ,  LIAN, Jin

IPC: G03F7/20

Abstract: Disclosed is a method of measuring an overlay or focus parameter from a target and associated metrology apparatus. The method comprises configuring measurement radiation to obtain a configured measurement spectrum of said measurement radiation by: imposing an intensity weighting on individual wavelength bands of said measurement radiation such that said individual wavelength bands have an intensity according to said intensity weighting, the intensity weighting being such that a measured value for the overlay or focus parameter is at least partially corrected for the effect of target imperfections; and/or imposing a modulation on a measurement spectrum of said measurement radiation. The configured measurement radiation is used to measure the target. A value for the overlay or focus parameter is determined from scattered radiation resultant from measurement of the target.

公开(公告)号：EP4187321A1

公开(公告)日：2023-05-31

申请号：EP21210123.2

申请日：2021-11-24

Applicant: ASML Netherlands B.V.

Inventor： ZHOU, Zili ,  SWINKELS, Daan ,  LIAN, Jin

IPC: G03F7/20

Abstract: Disclosed is a method of measuring an overlay or focus parameter from a target and associated metrology apparatus. The method comprises configuring measurement radiation to obtain a configured measurement spectrum of said measurement radiation by: imposing an intensity weighting on individual wavelength bands of said measurement radiation such that said individual wavelength bands have an intensity according to said intensity weighting, the intensity weighting being such that a measured value for the overlay or focus parameter is at least partially corrected for the effect of target imperfections; and/or imposing a modulation on a measurement spectrum of said measurement radiation. The configured measurement radiation is used to measure the target. A value for the overlay or focus parameter is determined from scattered radiation resultant from measurement of the target.