SUBSTRATE SUPPORT, LITHOGRAPHIC APPARATUS AND LOADING METHOD
    1.
    发明申请
    SUBSTRATE SUPPORT, LITHOGRAPHIC APPARATUS AND LOADING METHOD 审中-公开
    基板支撑,光刻设备和加载方法

    公开(公告)号:WO2017182216A1

    公开(公告)日:2017-10-26

    申请号:PCT/EP2017/056644

    申请日:2017-03-21

    CPC classification number: G03F7/70708 G03F7/70691 G03F7/707 G03F7/70733

    Abstract: The invention relates to a substrate support (WT) for supporting a substrate (W). The substrate support comprises the main body (MB), a clamping device (VC; VSO) and a dither device (DD). The main body comprises the support surface (S) for supporting the substrate (W). The clamping device is arranged to provide the clamping force to clamp the substrate on the support surface. The dither device is configured to dither the clamping force. The dither device may be configured to dither the clamping force while the substrate W is being loaded onto the support surface.

    Abstract translation: 本发明涉及用于支撑衬底(W)的衬底支撑件(WT)。 基板支架包括主体(MB),夹紧装置(VC; VSO)和抖动装置(DD)。 主体包括用于支撑基板(W)的支撑表面(S)。 夹紧装置布置成提供夹紧力以将基底夹紧在支撑表面上。 抖动装置被配置为抖动夹紧力。 抖动装置可以被配置为在衬底W被加载到支撑表面上时抖动夹紧力。

    A POSITIONING SYSTEM, METHOD TO POSITION, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    2.
    发明申请
    A POSITIONING SYSTEM, METHOD TO POSITION, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
    定位系统,定位方法,光刻设备和装置制造方法

    公开(公告)号:WO2018024416A1

    公开(公告)日:2018-02-08

    申请号:PCT/EP2017/066101

    申请日:2017-06-29

    Abstract: The invention relates to a positioning system comprising: - a first body; - a second body; - an actuator arranged between the first body and the second body to position the first body relative to the second body; and wherein the actuator comprises a first piezoelectric actuator and a second piezoelectric actuator arranged in series, wherein the first piezoelectric actuator has a first hysteresis, wherein the second piezoelectric actuator has a second hysteresis smaller than the first hysteresis, wherein the second piezoelectric actuator has a positioning range at least equal to the first hysteresis.

    Abstract translation: 定位系统技术领域本发明涉及一种定位系统,其包括:第一主体; - 第二个机构; - 布置在第一主体和第二主体之间以将第一主体相对于第二主体定位的致动器; 且其中所述致动器包括串联布置的第一压电致动器和第二压电致动器,其中所述第一压电致动器具有第一滞后,其中所述第二压电致动器具有小于所述第一滞后的第二滞后,其中所述第二压电致动器具有 定位范围至少等于第一次滞后。

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