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公开(公告)号：WO2022144185A1
公开(公告)日：2022-07-07
申请号：PCT/EP2021/086152
申请日：2021-12-16
Applicant: ASML NETHERLANDS B.V.
Inventor： RAAYMAKERS, Jeroen, Arnoldus, Leonardus, Johannes , LOMANS, Bram, Antonius, Gerardus , DEN BOEF, Arie, Jeffrey , BUTLER, Hans
Abstract: The present disclosure relates to a metrology apparatus for measuring a parameter of interest of a targets on a substrate comprising: m x n detectors, wherein m≥1 and n≥1; a first frame; and (n-1) second frames; and (m-1) x n intermediate frames, wherein: each detector is connected to one of the intermediate or first or second frames via a primary positioning assembly; and each intermediate frame is connected to one of the first or second frames via a secondary positioning assembly.
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公开(公告)号：WO2020234045A1
公开(公告)日：2020-11-26
申请号：PCT/EP2020/063178
申请日：2020-05-12
Applicant: ASML NETHERLANDS B.V.
Inventor： BUTLER, Hans , JANSEN, Bas
Abstract: The invention relates to an actuator assembly comprising a first piezo actuator and a second piezo actuator. According to a first aspect the piezo actuator comprises a correction unit, configured to determine an output voltage difference representing a difference between a voltage at the output terminal of the first piezo actuator and a voltage at the output terminal of the second piezo actuator, and a first power correction for correcting the first power signal and/or a second power correction for correcting the second power signal, based on the output voltage difference. According to a second aspect a power unit, said power unit configured to generate a power signal for the first and second piezo actuator based on the set point, and to provide the power signal to the first terminal of the first piezo actuator and to the second terminal of the second piezo actuator.
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公开(公告)号：WO2019206595A1
公开(公告)日：2019-10-31
申请号：PCT/EP2019/058504
申请日：2019-04-04
Applicant: ASML NETHERLANDS B.V.
Inventor： BUTLER, Hans , DE BEER, Joep, Sander , DE HOON, Cornelius, Adrianus, Lambertus , STARREVELD, Jeroen, Pieter , VAN DUIJNHOVEN, Martinus , WIJCKMANS, Maurice, Willem, Jozef, Etiënne
IPC: G03F7/20
Abstract: The invention provides a lithographic apparatus or frame assembly, comprising: - a first and a second pneumatic support, being arranged to control a position of a frame, each of said pneumatic supports accommodating a pressure chamber, - a frame position control system, comprising: - a first position sensor device, configured to generate measurement data relating to the position of the frame, - a first pressure controller, configured to control the pressure in the pressure chamber of the first pneumatic support on the basis of the measurement data generated by the first position sensor device, - a pressure differential sensor device, configured to generate data relating to the difference between the pressure in the pressure chambers of the first pneumatic support and the second pneumatic support, - a second pressure controller, configured to control the pressure in the pressure chamber of the second pneumatic support on the basis of the measurement data from the pressure differential sensor device.
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公开(公告)号：WO2019206517A1
公开(公告)日：2019-10-31
申请号：PCT/EP2019/056650
申请日：2019-03-18
Applicant: ASML NETHERLANDS B.V.
Inventor： BUTLER, Hans , DE BEER, Joep, Sander , DE HOON, Cornelius, Adrianus, Lambertus , STARREVELD, Jeroen, Pieter , VAN DUIJNHOVEN, Martinus , WIJCKMANS, Maurice, Willem, Jozef, Etiënne
IPC: G03F7/20
Abstract: The invention provides a pneumatic support device for a lithographic apparatus and a lithographic apparatus with such support device. The support device comprises a gas spring. The gas spring comprises a suspending part, a suspended part, and a pressure chamber configured for supporting the suspended part relative to the suspending part. The support device further comprises an actuator configured for positioning the suspended part relative to the suspending part, an acceleration sensor configured for generating a first sensor signal representative for the acceleration of the suspending part, a pressure sensor configured for generating a second sensor signal representative for the pressure in the pressure chamber, and a control unit. The control unit is configured to: receive the first sensor signal, receive the second sensor signal, filter the first sensor signal in a low-pass filter, filter the second sensor signal in a high-pass filter, determine, based on the filtered first sensor signal and filtered second sensor signal, a force exerted by the suspending part on the suspended part, and generate, based on said force, a control signal for the actuator.
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5.发明申请
公开(公告)号：WO2019134776A1
公开(公告)日：2019-07-11
申请号：PCT/EP2018/082983
申请日：2018-11-29
Applicant: ASML NETHERLANDS B.V.
Inventor： SIMONS, Wilhelmus, Franciscus, Johannes , BRAAKSMA, Dave , BUTLER, Hans , COX, Hendrikus, Herman, Marie , LEENAARS, Rene Wilhelmus Antonius Hubertus , LIBOUREL, Stephan, Christiaan, Quintus , VAN DUIJNHOVEN, Martinus , WIJCKMANS, Maurice, Willem, Jozef, Etiënne
CPC classification number: G03F7/70766 , G03F7/70725 , G03F7/70758 , G03F7/709 , H01L21/682
Abstract: The present invention relates to a positioning system, comprising: a first actuator to exert an actuation force on a moveable body, the first actuator being coupled to a balance mass configured to absorb a reaction force resulting from the actuation force, the actuation force providing an acceleration of the moveable body and the reaction force providing an acceleration of the balance mass, wherein a force resulting from the acceleration of the moveable body together with a force resulting from the acceleration of the balance mass result in a balance mass torque; a balance mass support to support the balance mass onto a frame, which balance mass support engages the frame at a support position; and a torque compensator; wherein the torque compensator exerts a compensation force to compensate the balance mass torque, and wherein the torque compensator exerts the compensation force on the frame at the support position.
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Patent Agency Ranking
公开(公告)号：WO2019048198A1
公开(公告)日：2019-03-14
申请号：PCT/EP2018/072048
申请日：2018-08-14
Applicant: ASML NETHERLANDS B.V.
Inventor： BUTLER, Hans , VAN LEEUWEN, Robbert, Edgar
Abstract: A lithographic apparatus comprising an illumination system for providing a beam of radiation, a support structure for supporting a patterning device, the patterning device serving to impart the radiation beam with a pattern in its cross-section, a substrate table for holding a substrate, a projection system for projecting the patterned radiation beam onto a target portion of the substrate, and a wavelength modulator configured to vary a wavelength of the radiation beam across the cross-section of the radiation beam.
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公开(公告)号：WO2017144236A1
公开(公告)日：2017-08-31
申请号：PCT/EP2017/051877
申请日：2017-01-30
Applicant: ASML NETHERLANDS B.V.
Inventor： VAN LEEUWEN, Robbert, Edgar , BUTLER, Hans
CPC classification number: G03F7/7085 , G01B9/02015 , G01B9/02049 , G03F7/70733 , G03F7/70758 , G03F7/70775
Abstract: An actuator system (AS) is configured to position an object (OJ), the actuator system comprises a piezo actuator (PA) comprising an actuator contact surface (ACS). The piezo actuator is configured to exert a force (F) via the actuator contact surface onto the object. The actuator system further comprises an optical position sensor (OPS) configured to measure a position of the actuator contact surface. The piezo actuator comprises a transparent piezo material. The optical position sensor is configured to transmit an optical beam (OB) through the transparent piezo material to the actuator contact surface. The transparent piezo material may be LJNB03. The optical position sensor may form an interferometer.
Abstract translation: 致动器系统（AS）被配置为定位物体（OJ），致动器系统包括包括致动器接触表面（ACS）的压电致动器（PA）。 压电致动器构造成经由致动器接触表面施加力（F）到物体上。 致动器系统还包括配置成测量致动器接触表面的位置的光学位置传感器（OPS）。 压电致动器包括透明的压电材料。 该光学位置传感器被配置为通过透明压电材料将光束（OB）传输到致动器接触表面。 透明压电材料可以是LJNB03。 光学位置传感器可以形成干涉仪。
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公开(公告)号：WO2015062921A1
公开(公告)日：2015-05-07
申请号：PCT/EP2014/072590
申请日：2014-10-22
Applicant: ASML NETHERLANDS B.V.
Inventor： BUTLER, Hans , DE HOON, Cornelius, Adrianus, Lambertus , VAN DER WIJST, Marc, Wilhelmus, Maria , VERHEES, Thijs , KERSSEMAKERS, Sander
IPC: G03F7/20
CPC classification number: G03F7/70775 , G03F7/70766 , G03F7/70833 , G03F7/709
Abstract: A lithographic apparatus (300) includes: a base frame (50); an illumination system (310) configured to condition a radiation beam and supported by the base frame; a support (320) constructed to support a patterning device (350), the patterning device being capable of imparting the radiation beam with a pattern in its cross- section to form a patterned radiation beam; a substrate table (100.2, 100.3) constructed to hold a substrate (110); a projection system (340) configured to project the patterned radiation beam onto a target portion of the substrate; a positioning device (100) configured to position the substrate table, the positioning device being supported by the base frame; a sensor (395) configured to sense a vibration caused by a torque exerted on the base frame and, an actuator configured to exert a force on the illumination system or the base frame, in response to the sensed vibration, in order to at least partly dampen the vibration.
Abstract translation: 光刻设备（300）包括：基架（50）; 照明系统（310），被配置为调节辐射束并由所述基架支撑; 构造成支撑图案形成装置（350）的支撑件（320），所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 构造成保持衬底（110）的衬底台（100.2,100.3）; 投影系统（340），被配置为将所述图案化的辐射束投影到所述基板的目标部分上; 定位装置（100），其被配置为定位所述基板台，所述定位装置由所述基架支撑; 传感器（395），其被配置为感测由施加在所述基座框架上的扭矩引起的振动;以及致动器，其被配置为响应于所感测到的振动而对所述照明系统或所述基座框架施加力，以便至少部分地 抑制振动。
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公开(公告)号：WO2023280690A1
公开(公告)日：2023-01-12
申请号：PCT/EP2022/068210
申请日：2022-06-30
Applicant: ASML NETHERLANDS B.V.
Inventor： BUTLER, Hans
IPC: G03F7/20
Abstract: The invention provides a method of determining a motor-dependent commutation model for an electromagnetic motor, whereby the electromagnetic motor comprises a first member comprising a coil array comprising at least M coils, and a second member comprising a magnet array configured to generate a spatially alternating magnetic field, whereby the first member and the second member are configured to displace relative to each other in N degrees of freedom, N
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公开(公告)号：WO2022063508A1
公开(公告)日：2022-03-31
申请号：PCT/EP2021/073400
申请日：2021-08-24
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： BUTLER, Hans , DEN BOEF, Arie, Jeffrey , BAGGEN, Mark, Constant, Johannes , RAAYMAKERS, Jeroen, Arnoldus, Leonardus, Johannes , ZIMMERMAN, Richard, Carl
IPC: G03F7/20 , G01N21/956
Abstract: Described herein is a metrology tool. The metrology tool includes a substrate table (ST) to hold a substrate (S); a projection system (PS) configured to project a beam on a target portion (TP) of the substrate; an actuator (PEA) configured to adjust a position of the projection system relative to the substrate on the substrate table; a sensor configured to determine a position of the substrate table; and a one or more processors configured to: determine, based on the position of the substrate table, a position error of the substrate table with respect to a reference; and control, via the actuator, a position of the projection system to compensate for the position error of the substrate table so that the beam projects on the target portion of the substrate.
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