公开(公告)号：US20210096471A1

公开(公告)日：2021-04-01

申请号：US16464361

申请日：2017-11-01

Applicant: ASML NETHERLANDS B.V.

Inventor： Erik Henricus Egidius Catharina EUMMELEN ,  Frank DEBOUGNOUX ,  Koen CUYPERS ,  Han Henricus Aldegonda LEMPENS ,  Theodoras Wilhelmus POLET ,  Jorge Alberto VIEYRA SALAS ,  John Maria BOMBEECK ,  Johannes Cornelis Paulus MELMAN ,  Giovanni Luca GATTOBIGIO

IPC: G03F7/20

Abstract: An immersion lithography apparatus controller configured to control a positioner to move a support table to follow an exposure route and to control a liquid confinement structure, the controller configured to: predict whether liquid will be lost from an immersion space during at least one motion of the route in which an edge of the object passes under an edge of the immersion space, and if liquid loss from the immersion space is predicted, modify the fluid flow such that a first fluid flow rate into or out of an opening at a leading edge of the liquid confinement structure is different to a second fluid flow rate into or out of an opening at a trailing edge of the liquid confinement structure during the motion of predicted liquid loss or a motion of the route subsequent to the motion of predicted liquid loss.

公开(公告)号：US20200150545A1

公开(公告)日：2020-05-14

申请号：US16604324

申请日：2018-03-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Giovanni Luca GATTOBIGIO ,  Nirupam BANERJEE ,  Johan Franciscus Maria BECKERS ,  Erik Henricus Egidius Catharina EUMMELEN ,  Ronald Frank KOX ,  Theodoras Wilhelmus POLET ,  Cornelius Maria ROPS ,  Mike Paulus Johannes VAN GILS ,  Wouterus Jozephus Johannes VAN SLUISVELD ,  Rik VANGHELUWE

IPC: G03F7/20

Abstract: A method of performance testing working parameters of a fluid handing structure in an immersion lithographic apparatus, the method including: placing a test substrate having an upper surface with a first portion with a resist defining the upper surface and a second portion with a material different from the resist defining the rest of the upper surface on a table in the immersion lithographic apparatus, confining liquid on a region of an upper surface of the table and/or the upper surface of the test substrate by operating the fluid handing structure using the associated working parameters, moving the table such that the region moves from the second portion to the first portion, and detecting change to and/or residue on the first portion as a result of liquid being left behind on the first portion during the moving.