公开(公告)号：US20220082949A1

公开(公告)日：2022-03-17

申请号：US17423325

申请日：2020-01-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Arnaud HUBAUX ,  Johan Franciscus Maria BECKERS ,  Dylan John David DAVIES ,  Johan Gertrudis Cornelis KUNNEN ,  Willem Richard PONGERS ,  Ajinkya Ravindra DAWARE ,  Chung-Hsun LI ,  Georgios TSIROGIANNIS ,  Hendrik Cornelis Anton BORGER ,  Frederik Eduard DEJONG ,  Juan Manuel GONZALEZ HUESCA ,  Andriy HLOD ,  Maxim PISARENCO

IPC: G03F7/20 ,  G03F1/70 ,  G06F30/392

Abstract: A method for categorizing a substrate subject to a semiconductor manufacturing process including multiple operations, the method including: obtaining values of functional indicators derived from data generated during one or more of the multiple operations on the substrate, the functional indicators characterizing at least one operation; applying a decision model including one or more threshold values to the values of the functional indicators to obtain one or more categorical indicators; and assigning a category to the substrate based on the one or more categorical indicators.

公开(公告)号：US20200166845A1

公开(公告)日：2020-05-28

申请号：US16061553

申请日：2016-12-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Christianus Wilhelmus Johannes BERENDSEN ,  Günes NAKIBOGLU ,  Daan Daniel Johannes Antonius VAN SOMMEREN ,  Gijsbert RISPENS ,  Johan Franciscus Maria BECKERS ,  Theodorus Johannes Antonius RENCKENS

IPC: G03F7/20 ,  G03F7/16

Abstract: A method of processing a substrate includes: providing a substrate with a layer of photosensitive material on a surface of the substrate; and removing at least part of the photosensitive material from around an outer edge of the layer of photosensitive material so as to generate an edge, having a radial width, around the layer of photosensitive material remaining on the surface of the substrate, wherein the photosensitive material varies in thickness forming a thickness profile across the radial width and the removing is controlled so as to generate variation in the thickness profile along the length of the edge, and/or wherein the removing is controlled so as to generate a rough edge around the layer of photosensitive material remaining on the surface of the substrate.

公开(公告)号：US20200150545A1

公开(公告)日：2020-05-14

申请号：US16604324

申请日：2018-03-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Giovanni Luca GATTOBIGIO ,  Nirupam BANERJEE ,  Johan Franciscus Maria BECKERS ,  Erik Henricus Egidius Catharina EUMMELEN ,  Ronald Frank KOX ,  Theodoras Wilhelmus POLET ,  Cornelius Maria ROPS ,  Mike Paulus Johannes VAN GILS ,  Wouterus Jozephus Johannes VAN SLUISVELD ,  Rik VANGHELUWE

IPC: G03F7/20

Abstract: A method of performance testing working parameters of a fluid handing structure in an immersion lithographic apparatus, the method including: placing a test substrate having an upper surface with a first portion with a resist defining the upper surface and a second portion with a material different from the resist defining the rest of the upper surface on a table in the immersion lithographic apparatus, confining liquid on a region of an upper surface of the table and/or the upper surface of the test substrate by operating the fluid handing structure using the associated working parameters, moving the table such that the region moves from the second portion to the first portion, and detecting change to and/or residue on the first portion as a result of liquid being left behind on the first portion during the moving.

公开(公告)号：US20220163896A1

公开(公告)日：2022-05-26

申请号：US17600631

申请日：2020-04-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Nirupam BANERJEE ,  Johan Franciscus Maria BECKERS ,  Peter BRAKHAGE ,  Arend Johannes DONKERBROEK ,  Daniel GRIMM ,  Tim RATHJE ,  Martin TILKE ,  Sandro WRICKE

IPC: G03F7/20 ,  C23C14/34 ,  C23C14/58 ,  C23C16/455

Abstract: An image sensor for immersion lithography, the image sensor including: a grating; an absorber layer on the grating, the absorber layer configured to absorb radiation; and a liquidphobic coating at an upper surface of the image sensor, wherein a protective layer is provided between the absorber layer and the liquidphobic layer, the protective layer being less reactive than the absorber layer to an immersion liquid.

公开(公告)号：US20210397100A1

公开(公告)日：2021-12-23

申请号：US17279133

申请日：2019-09-25

Applicant: ASML NETHERLANDS B.V.

Inventor： Andrey NIKIPELOV ,  Johan Franciscus Maria BECKERS

IPC: G03F7/20 ,  C23C14/08 ,  C23C16/40

Abstract: An object, such as a sensor for an immersion lithographic apparatus, has an outer layer which comes in contact with immersion liquid and wherein the outer layer has a composition including a rare earth element. There is also provided an immersion lithographic apparatus having such an object and a method for manufacturing such an object.

公开(公告)号：US20200064183A1

公开(公告)日：2020-02-27

申请号：US16488259

申请日：2018-02-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Joost André KLUGKIST ,  Vadim Yevgenyevich BANINE ,  Johan Franciscus Maria BECKERS ,  Madhusudhanan JAMBUNATHAN ,  Maxim Aleksandrovich NASALEVICH ,  Andrey NIKIPELOV ,  Roland Johannes Wilhelmus STAS ,  David Ferdinand VLES ,  Wilhelmus Jacobus Johannes WELTERS ,  Sandro WRICKE

IPC: G01J1/42

Abstract: A sensor mark including: a substrate having: a deep ultra violet (DUV) radiation absorbing layer including a first material which substantially absorbs DUV radiation; and a protecting layer including a second material, wherein: the DUV radiation absorbing layer has a through hole in it; the protecting layer is positioned, in plan, in the through hole and the protecting layer in the through hole has a patterned region having a plurality of through holes; and the second material is more noble than the first material.