公开(公告)号：WO2018001709A1

公开(公告)日：2018-01-04

申请号：PCT/EP2017/064265

申请日：2017-06-12

Applicant: ASML NETHERLANDS B.V.

Inventor： JANSSENS, Stef, Marten, Johan ,  SCHOLTEN, Bert, Dirk ,  DONDERS, Sjoerd, Nicolaas, Lambertus ,  VAN DAM, Teunis ,  OVERSCHIE, Peter ,  SPAAN-BURKE, Theresa, Mary ,  TROMP, Siegfried, Alexander

IPC: G03F7/20 ,  H01L21/683

Abstract: The present invention relates to a system for positioning, a stage system, a lithographic apparatus, a method for positioning and a method for manufacturing a device in which use is made of a stage system. In accordance with the invention, a plurality of air bearing devices is provided. Each air bearing device comprises: - an air bearing body, which has a free surface, - a primary channel which extends through the air bearing body and has an inlet opening in the free surface, - a secondary channel system which extends through the air bearing body and which has a plurality of discharge openings in the free surface. The flow resistance in the secondary channel system is higher than the flow resistance in the primary channel.

Abstract translation: 本发明涉及用于定位的系统，平台系统，光刻设备，用于定位的方法以及用于制造其中使用平台系统的设备的方法。 根据本发明，提供了多个空气轴承装置。 每个空气轴承装置包括：空气轴承体，其具有自由表面;主要通道，其延伸穿过空气轴承体并且在自由表面中具有入口开口;次要通道系统，其延伸穿过空气轴承 并且在自由表面中具有多个排出口。 次通道系统中的流阻高于主通道中的流阻。

公开(公告)号：EP3479173A1

公开(公告)日：2019-05-08

申请号：EP17728576.4

申请日：2017-06-12

Applicant: ASML Netherlands B.V.

Inventor： JANSSENS, Stef, Marten, Johan ,  SCHOLTEN, Bert, Dirk ,  DONDERS, Sjoerd, Nicolaas, Lambertus ,  VAN DAM, Teunis ,  OVERSCHIE, Peter ,  SPAAN-BURKE, Theresa, Mary ,  TROMP, Siegfried, Alexander

IPC: G03F7/20 ,  H01L21/683