公开(公告)号：WO2017137129A1

公开(公告)日：2017-08-17

申请号：PCT/EP2016/082484

申请日：2016-12-22

Applicant: ASML NETHERLANDS B.V.

Inventor： JEUNINK, Andre, Bernardus ,  MARTENS, Robby, Franciscus, Josephus ,  DE VOS, Youssef, Karel, Maria ,  VAN DORST, Ringo, Petrus, Cornelis ,  TEN BRINKE, Gerhard, Albert ,  SENDEN, Dirk, Jerome, Andre ,  BALTIS, Coen, Hubertus, Matheus ,  GERRITZEN, Justin, Johannes, Hermanus ,  KAMMINGA, Jelmer, Mattheüs ,  PACITTI, Evelyn, Wallis ,  POIESZ, Thomas ,  SCHEIBERLICH, Arie, Cornelis ,  SCHOLTEN, Bert, Dirk ,  SCHREUDER, André ,  SOETHOUDT, Abraham, Alexander ,  TROMP, Siegfried, Alexander ,  VAN DE VIJVER, Yuri, Johannes, Gabriël

IPC: G03F7/20 ,  H01L21/683 ,  H01L21/687

CPC classification number: H01L21/6838 ,  G03F7/707 ,  G03F7/70733 ,  H01L21/68742

Abstract: A method for unloading a substrate from a support table configured to support the substrate, the method comprising: supplying gas to a gap between a base surface of the support table and the substrate via a plurality of gas flow openings in the support table, wherein during an initial phase of unloading the gas is supplied through at least one gas flow opening in an outer region of the support table and not through any gas flow opening in a central region of the support table radially inward of the outer region, and during a subsequent phase of unloading the gas is supplied through at least one gas flow opening in the outer region and at least one gas flow opening in the central region.

Abstract translation: 一种用于从支撑所述基板的支撑台卸载基板的方法，所述方法包括：经由多个气流向所述支撑台的基座表面和所述基板之间的间隙供应气体 其中在卸载的初始阶段期间，气体通过支撑台的外部区域中的至少一个气体流动开口供应，并且不通过支撑台的中央区域中的任何气体流动开口， 外部区域，并且在随后的卸载阶段期间，通过外部区域中的至少一个气体流动开口和中央区域中的至少一个气体流动开口供应气体。

公开(公告)号：WO2016020121A1

公开(公告)日：2016-02-11

申请号：PCT/EP2015/064793

申请日：2015-06-30

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DEN NIEUWELAAR, Norbertus, Josephus, Martinus ,  BLANCO CARBALLO, Victor, Manuel ,  DE GROOT, Casper, Roderik ,  CUSTERS, Rolf, Hendrikus, Jacobus ,  PHILLIPS, David, Merritt ,  VAN DER ZANDEN, Frederik, Antonius ,  GUNTER, Pieter, Lein, Joseph ,  EUMMELEN, Erik, Henricus, Egidius, Catharina ,  VAN DE VIJVER, Yuri, Johannes, Gabriël ,  SCHOLTEN, Bert, Dirk ,  WOUTERS, Marijn ,  KOX, Ronald, Frank ,  VIEYRA SALAS, Jorge, Alberto

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G02B27/0043 ,  G03F7/2043 ,  G03F7/70358 ,  G03F7/70725 ,  G03F7/70858 ,  G03F7/70925

Abstract: An immersion lithography apparatus has a controller (500) configured to control a substrate table (WT) to move along an exposure route including in order: an entry motion (R2) in which the substrate moves from an off-substrate position at which the immersion space (10) does not overlap the substrate (W) to an on-substrate position at which the immersion space at least partially overlaps the substrate, a transfer motion (R3, R4) in which the substrate table changes speed and/or direction and moves for at least a transfer time after the substrate moves to the on-substrate position, and an expose motion in which the substrate is scanned and the patterned beam is projected onto the substrate, wherein throughout the transfer motion at least a part of the immersion space overlaps the substrate and wherein the patterned bean is not projected onto the substrate during the entry motion and the transfer motion.

Abstract translation: 浸没式光刻设备具有控制器（500），其被配置为控制衬底台（WT）沿着包括以下顺序的曝光路线移动：进入运动（R2），其中衬底从浸没 空间（10）不与衬底（W）重叠到浸没空间至少部分地与衬底重叠的衬底上位置，衬底台改变速度和/或方向的转移运动（R3，R4）和 在基板移动到基板上位置之后移动至少一个传送时间，以及曝光动作，其中基板被扫描并且图案化的光束投影到基板上，其中贯穿整个传送运动至少一部分浸没 空间与衬底重叠，并且其中图案化的豆在进入运动和转移运动期间不投影到衬底上。

公开(公告)号：WO2018224303A1

公开(公告)日：2018-12-13

申请号：PCT/EP2018/063447

申请日：2018-05-23

Applicant: ASML NETHERLANDS B.V.

Inventor： GUAN, Tiannan ,  LINDEIJER, Tjarco ,  SCHOLTEN, Bert, Dirk ,  SCHREUDER, Andre

IPC: G03F7/20

Abstract: A system for cleaning a substrate support comprising a plurality of projections extending in a first direction each with a terminal surface arranged to be in contact with the substrate, the system comprising: a treatment tool arranged for relative movement in a second direction orthogonal to the first direction and a third direction orthogonal to the first direction and the second direction over the terminal surfaces of the projections thereby to remove matter from the substrate support; a controller adapted to control the treatment tool dependent upon a position in the second and third directions of the treatment tool relative to the substrate support such that the removal amount from each of the plurality of projections is maintained substantially constant from one projection to another.

公开(公告)号：WO2020020568A1

公开(公告)日：2020-01-30

申请号：PCT/EP2019/067224

申请日：2019-06-27

Applicant: ASML NETHERLANDS B.V.

Inventor： SCHOLTEN, Bert, Dirk ,  BILLEKENS, Peter, Andreas, Maria ,  GUAN, Tiannan ,  LINDEIJER, Tjarco ,  MEHAGNOUL, Harold, Anton ,  VAN DE WINKEL, Jimmy, Matheus, Wilhelmus ,  VAN NUENEN, Cas, Johannes, Petrus, Maria ,  VAN VERSEVELD, Hendrikus, Theodorus, Jacobus, Franciscus ,  VERMEULEN, Marcus, Martinus, Petrus, Adrianus

IPC: G03F7/20 ,  B24B37/14 ,  B24B37/12 ,  B24B37/16 ,  H01L21/687

Abstract: A tool (1) for modifying substrate support elements (21) of a substrate holder (20), the substrate support elements having support surfaces (22) for supporting a substrate, said tool comprising a main body (2) having a main body surface (3), wherein the tool comprises multiple protrusions (4) from the main body surface, the multiple protrusions having distal ends (5) configured to contact the support surfaces and to modify the substrate support elements. Furthermore, a lithographic apparatus and a method comprising such a tool are disclosed.

公开(公告)号：WO2019154630A1

公开(公告)日：2019-08-15

申请号：PCT/EP2019/051767

申请日：2019-01-24

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： SCHOLTEN, Bert, Dirk ,  ACHANTA, Satish ,  AKCHURIN, Aydar ,  ANTONOV, Pavlo ,  BALTIS, Coen, Hubertus, Matheus ,  BOUWKNEGT, Jeroen ,  FARLE, Ann-Sophie M. ,  MASON, Christopher, John ,  PALERMO, Ralph, Nicholas ,  VAN DE VIJVER, Yuri, Johannes, Gabriël ,  VAN DE WINKEL, Jimmy, Matheus, Wilhelmus

IPC: G03F7/20 ,  B24B37/04 ,  B24B37/14 ,  H01L21/687

Abstract: An improved treatment tool (100) for reconditioning the top surfaces of a plurality of projections (20) of a substrate support (60) in a lithographic tool. The improved treatment tool includes a reconditioning surface which is rough relative to the smoothed top surfaces of the projections and which reconditioning surface has material harder than that of the material of the top surfaces of the projections. There is also provided a reconditioning method, the reconditioning method causing an interaction between the reconditioning surface of the improved treatment tool and the top surfaces of the projections of the substrate support, so as to leave these top surfaces rougher than they were prior to the interaction.

公开(公告)号：WO2018215172A1

公开(公告)日：2018-11-29

申请号：PCT/EP2018/061063

申请日：2018-05-01

Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

Inventor： LIPSON, Matthew ,  MASON, Christopher, John ,  SOHRABIBABAHEIDARY, Damoon ,  VAN DE WINKEL, Jimmy, Matheus, Wilhelmus ,  SCHOLTEN, Bert, Dirk

IPC: G03F7/20 ,  G02B27/00

Abstract: A method of dislodging contamination from a part of an apparatus used in a patterning process, the method including: providing a cleaning substrate into contact with the part of the apparatus while the part is attached to the apparatus, the cleaning substrate comprising a material configured to chemically react with the contamination; and dislodging contamination on the part of the apparatus by chemical reaction between the material and the contamination.

公开(公告)号：WO2018001709A1

公开(公告)日：2018-01-04

申请号：PCT/EP2017/064265

申请日：2017-06-12

Applicant: ASML NETHERLANDS B.V.

Inventor： JANSSENS, Stef, Marten, Johan ,  SCHOLTEN, Bert, Dirk ,  DONDERS, Sjoerd, Nicolaas, Lambertus ,  VAN DAM, Teunis ,  OVERSCHIE, Peter ,  SPAAN-BURKE, Theresa, Mary ,  TROMP, Siegfried, Alexander

IPC: G03F7/20 ,  H01L21/683

Abstract: The present invention relates to a system for positioning, a stage system, a lithographic apparatus, a method for positioning and a method for manufacturing a device in which use is made of a stage system. In accordance with the invention, a plurality of air bearing devices is provided. Each air bearing device comprises: - an air bearing body, which has a free surface, - a primary channel which extends through the air bearing body and has an inlet opening in the free surface, - a secondary channel system which extends through the air bearing body and which has a plurality of discharge openings in the free surface. The flow resistance in the secondary channel system is higher than the flow resistance in the primary channel.

Abstract translation: 本发明涉及用于定位的系统，平台系统，光刻设备，用于定位的方法以及用于制造其中使用平台系统的设备的方法。 根据本发明，提供了多个空气轴承装置。 每个空气轴承装置包括：空气轴承体，其具有自由表面;主要通道，其延伸穿过空气轴承体并且在自由表面中具有入口开口;次要通道系统，其延伸穿过空气轴承 并且在自由表面中具有多个排出口。 次通道系统中的流阻高于主通道中的流阻。

公开(公告)号：WO2017102162A1

公开(公告)日：2017-06-22

申请号：PCT/EP2016/076357

申请日：2016-11-02

Applicant: ASML NETHERLANDS B.V.

Inventor： NAKIBOGLU, Günes ,  BALTIS, Coen, Hubertus, Matheus ,  TROMP, Siegfried, Alexander ,  VAN DE VIJVER, Yuri, Johannes, Gabriël ,  SCHOLTEN, Bert, Dirk ,  VAN SOMMEREN, Daan, Daniel, Johannes, Antonius ,  FRENCKEN, Mark, Johannes, Hermanus

IPC: G03F7/20 ,  H01L21/683

CPC classification number: G03F7/707 ,  G03F7/70341 ,  H01L21/68735 ,  H01L21/6875

Abstract: A substrate holder (WT) for use in a lithographic apparatus and configured to support a substrate (W), the substrate holder comprising: • a main body (21) having a main body surface (22); • a plurality of burls (20) projecting from the main body surface to support the substrate spaced apart from the main body surface; and • a liquid control structure (200) provided in a peripheral region (22a) of the main body surface and configured to cause liquid to preferentially flow toward the periphery of the main body surface.

Abstract translation: 一种用于光刻设备中并构造成支撑衬底（W）的衬底支架（WT），所述衬底支架包括：具有主体表面（22）的主体（21） ; ·从所述主体表面突出以支撑与所述主体表面间隔开的所述衬底的多个突起（20） 和设置在所述主体表面的外围区域（22a）中的液体控制结构（200），所述液体控制结构（200）被配置为使液体优先流向所述主体表面的周边。

公开(公告)号：EP3479173A1

公开(公告)日：2019-05-08

申请号：EP17728576.4

申请日：2017-06-12

Applicant: ASML Netherlands B.V.

Inventor： JANSSENS, Stef, Marten, Johan ,  SCHOLTEN, Bert, Dirk ,  DONDERS, Sjoerd, Nicolaas, Lambertus ,  VAN DAM, Teunis ,  OVERSCHIE, Peter ,  SPAAN-BURKE, Theresa, Mary ,  TROMP, Siegfried, Alexander

IPC: G03F7/20 ,  H01L21/683