公开(公告)号：WO2021115765A1

公开(公告)日：2021-06-17

申请号：PCT/EP2020/082988

申请日：2020-11-20

Applicant: ASML NETHERLANDS B.V.

Inventor： STEUR, Michael, Marinus, Anna ,  TEN KATE, Nicolaas ,  TROMP, Siegfried, Alexander ,  WINKELS, Koen, Gerhardus ,  DE GROOT, Antonius, Franciscus, Johannes

IPC: G03F7/20 ,  H01L21/683

Abstract: The disclosure relates to substrate tables and methods of manufacturing substrate supports for substrate tables. In one arrangement, a plurality of holes are formed through a base member. A burl formation member is joined to the base member. A plurality of burl structures are formed in the burl formation member. Each burl structure comprises a distal surface that contacts, in use, a substrate being supported. Each burl structure comprises an opening to at least one of the holes formed through the base member.

公开(公告)号：WO2017137129A1

公开(公告)日：2017-08-17

申请号：PCT/EP2016/082484

申请日：2016-12-22

Applicant: ASML NETHERLANDS B.V.

Inventor： JEUNINK, Andre, Bernardus ,  MARTENS, Robby, Franciscus, Josephus ,  DE VOS, Youssef, Karel, Maria ,  VAN DORST, Ringo, Petrus, Cornelis ,  TEN BRINKE, Gerhard, Albert ,  SENDEN, Dirk, Jerome, Andre ,  BALTIS, Coen, Hubertus, Matheus ,  GERRITZEN, Justin, Johannes, Hermanus ,  KAMMINGA, Jelmer, Mattheüs ,  PACITTI, Evelyn, Wallis ,  POIESZ, Thomas ,  SCHEIBERLICH, Arie, Cornelis ,  SCHOLTEN, Bert, Dirk ,  SCHREUDER, André ,  SOETHOUDT, Abraham, Alexander ,  TROMP, Siegfried, Alexander ,  VAN DE VIJVER, Yuri, Johannes, Gabriël

IPC: G03F7/20 ,  H01L21/683 ,  H01L21/687

CPC classification number: H01L21/6838 ,  G03F7/707 ,  G03F7/70733 ,  H01L21/68742

Abstract: A method for unloading a substrate from a support table configured to support the substrate, the method comprising: supplying gas to a gap between a base surface of the support table and the substrate via a plurality of gas flow openings in the support table, wherein during an initial phase of unloading the gas is supplied through at least one gas flow opening in an outer region of the support table and not through any gas flow opening in a central region of the support table radially inward of the outer region, and during a subsequent phase of unloading the gas is supplied through at least one gas flow opening in the outer region and at least one gas flow opening in the central region.

Abstract translation: 一种用于从支撑所述基板的支撑台卸载基板的方法，所述方法包括：经由多个气流向所述支撑台的基座表面和所述基板之间的间隙供应气体 其中在卸载的初始阶段期间，气体通过支撑台的外部区域中的至少一个气体流动开口供应，并且不通过支撑台的中央区域中的任何气体流动开口， 外部区域，并且在随后的卸载阶段期间，通过外部区域中的至少一个气体流动开口和中央区域中的至少一个气体流动开口供应气体。

公开(公告)号：WO2016062540A1

公开(公告)日：2016-04-28

申请号：PCT/EP2015/073112

申请日：2015-10-07

Applicant: ASML NETHERLANDS B.V.

Inventor： TROMP, Siegfried, Alexander ,  VERWEIJ, Antonie, Hendrik ,  SOETHOUDT, Abraham, Alexander ,  VAN DE POEL, Jan, Pieter ,  BAGGEN, Mark, Constant, Johannes

IPC: G03F7/20 ,  F16C32/06

CPC classification number: F16C32/0611 ,  F16C29/025 ,  F16C32/0607 ,  G03F7/20 ,  G03F7/707 ,  G03F7/708

Abstract: There are disclosed a support table for a lithographic apparatus, a method of loading a substrate, a lithographic apparatus and a method for manufacturing a device using a lithographic apparatus. In one arrangement, a support table (100) is configured to support a substrate (W). The support table comprises a base surface (101). The base surface faces a bottom surface (103) of the substrate when the substrate is supported by the support table. One or more gas cushion members (102) are provided above the base surface. Each of the gas cushion members comprises a recess (108). The recess is shaped and configured such that a lowering of the substrate into a position on the support table at which the substrate is supported by the support table causes a localised build-up of pressure within the recess. The localised build-up of pressure provides a localised gas cushioning effect during the lowering of the substrate.

Abstract translation: 公开了一种用于光刻设备的支撑台，装载基板的方法，光刻设备以及使用光刻设备制造设备的方法。 在一种布置中，支撑台（100）构造成支撑基板（W）。 支撑台包括基面（101）。 当基板由支撑台支撑时，基部表面面向基板的底表面（103）。 一个或多个气垫构件（102）设置在基面的上方。 每个气垫构件包括凹部（108）。 凹部的形状和构造使得将基底降低到支撑台上的由支撑台支撑基板的位置导致凹陷内的压力的局部积聚。 压力的局部积聚提供了在降低衬底期间的局部气体缓冲效应。

公开(公告)号：WO2022223277A1

公开(公告)日：2022-10-27

申请号：PCT/EP2022/058898

申请日：2022-04-04

Applicant: ASML NETHERLANDS B.V.

Inventor： AZIMI, Monim ,  LINDEIJER, Tjarco ,  DIJKSTRA, Michel ,  TROMP, Siegfried, Alexander ,  SRIDHAR, Ashwin

IPC: G03F7/20 ,  B24B37/14 ,  B24B37/16 ,  H01L21/687

Abstract: A surface treatment device for treating a surface of a substrate support, wherein the surface treatment device comprises a contacting surface that is configured to contact the surface of the substrate support. The contacting surface is configured with at least a first contour with a first centre of curvature and a second contour with a second centre of curvature, wherein the first centre of curvature and the second centre of curvature are non-coincident points.

公开(公告)号：WO2021122065A1

公开(公告)日：2021-06-24

申请号：PCT/EP2020/084671

申请日：2020-12-04

Applicant: ASML NETHERLANDS B.V.

Inventor： BECKERS, Johan, Franciscus, Maria ,  DAVIES, Dylan John David ,  KOEVOETS, Adrianus, Hendrik ,  VAN HAL, Paulus, Albertus ,  SEOANE DE LA CUESTA, Beatriz ,  STEL, Bart, Willem ,  STEVENS, Lucas, Henricus, Johannes ,  TROMP, Siegfried, Alexander ,  ACHANTA, Satish ,  VAN KUILENBURG, Julien

IPC: G03F7/16 ,  G03F7/20 ,  H01L21/687 ,  G03F7/165 ,  G03F7/707 ,  G03F7/70783 ,  G03F7/7095 ,  H01L21/6875 ,  H01L21/68757

Abstract: The present invention relates to methods for reducing wafer load grid and flatness degradation of a substrate holder, such as a wafertable, of a lithographic apparatus. The present invention also relates to systems comprising lithography substrate holders, such as wafertables, with improved resistance to wafer load grid and flatness degradation, and to methods of fabricating devices, e.g. integrated circuits, using such systems. The present invention also relates to substrates, such as wafers, with backsides configured to protect substrate holders, such as wafertables, from wafer load grid and flatness degradation when used in lithography, and to methods of removing hydrophobic coatings from such substrates, such as wafers. The present invention has particular use in connection with lithographic apparatus for fabricating devices, for example integrated circuits.

公开(公告)号：WO2017060028A1

公开(公告)日：2017-04-13

申请号：PCT/EP2016/071139

申请日：2016-09-08

Applicant: ASML NETHERLANDS B.V.

Inventor： ACHANTA, Satish ,  GUAN, Tiannan ,  LAFARRE, Raymond, Wilhelmus, Louis ,  MALAKHOVSKY, Ilia ,  ROSET, Bas, Johannes, Petrus ,  TROMP, Siegfried, Alexander ,  VERMEULEN, Johannes, Petrus, Martinus, Bernardus

IPC: H01L21/687 ,  G03F7/20

CPC classification number: H01L21/68742 ,  G03F7/707 ,  G03F7/70733 ,  H01L21/6875

Abstract: The present invention provides a substrate table to support a substrate, comprising a main body, burls extending from the main body and having first upper ends, and support pins having second upper ends. The first upper ends define a support surface to support the substrate. The support pins are movable between a retracted position and an extended position. The support pins are arranged to support the substrate in the extended position. The support pins are arranged to be switched to a first stiffness mode and a second stiffness mode. In the first stiffness mode, the support pins have a first stiffness in a direction parallel to the support surface. In the second stiffness mode, the support pins have a second stiffness in the direction parallel to the support surface. The first stiffness is different from the second stiffness.

Abstract translation: 本发明提供了一种用于支撑基板的基板台，包括主体，从主体延伸并具有第一上端的凸起，以及具有第二上端的支撑销。 第一上端限定支撑表面以支撑衬底。 支撑销可在缩回位置和伸出位置之间移动。 支撑销布置成将基板支撑在延伸位置。 支撑销布置成切换到第一刚度模式和第二刚度模式。 在第一刚度模式中，支撑销在平行于支撑表面的方向上具有第一刚度。 在第二刚度模式中，支撑销在平行于支撑表面的方向上具有第二刚性。 第一刚度与第二刚度不同。

公开(公告)号：WO2021170320A1

公开(公告)日：2021-09-02

申请号：PCT/EP2021/051581

申请日：2021-01-25

Applicant: ASML NETHERLANDS B.V.

Inventor： BALTIS, Coen, Hubertus, Matheus ,  TEN KATE, Nicolaas ,  VERMEULEN, Marcus, Martinus, Petrus, Adrianus ,  TROMP, Siegfried, Alexander ,  VAN DEN BERKMORTEL, Frank, Pieter, Albert ,  ROSET, Niek, Jacobus, Johannes ,  KRAMER, Gijs ,  BRANTJES, Nicolaas, Petrus, Marcus ,  FONTEYN, Michiel, Theodorus, Jacobus

IPC: G03F7/20

Abstract: A substrate support for supporting a substrate in a lithographic apparatus, the substrate support comprising: a first support body configured to support the substrate; a main body separate from the first support body and configured to support the first support body, the main body comprising a thermal conditioner configured to thermally condition the main body, and/or the support body and/or the substrate; and an extractor body surrounding the main body and the support body, wherein the extractor body comprises a first extraction channel configured to extract fluid from near a peripheral part of the substrate.

公开(公告)号：WO2018001709A1

公开(公告)日：2018-01-04

申请号：PCT/EP2017/064265

申请日：2017-06-12

Applicant: ASML NETHERLANDS B.V.

Inventor： JANSSENS, Stef, Marten, Johan ,  SCHOLTEN, Bert, Dirk ,  DONDERS, Sjoerd, Nicolaas, Lambertus ,  VAN DAM, Teunis ,  OVERSCHIE, Peter ,  SPAAN-BURKE, Theresa, Mary ,  TROMP, Siegfried, Alexander

IPC: G03F7/20 ,  H01L21/683

Abstract: The present invention relates to a system for positioning, a stage system, a lithographic apparatus, a method for positioning and a method for manufacturing a device in which use is made of a stage system. In accordance with the invention, a plurality of air bearing devices is provided. Each air bearing device comprises: - an air bearing body, which has a free surface, - a primary channel which extends through the air bearing body and has an inlet opening in the free surface, - a secondary channel system which extends through the air bearing body and which has a plurality of discharge openings in the free surface. The flow resistance in the secondary channel system is higher than the flow resistance in the primary channel.

Abstract translation: 本发明涉及用于定位的系统，平台系统，光刻设备，用于定位的方法以及用于制造其中使用平台系统的设备的方法。 根据本发明，提供了多个空气轴承装置。 每个空气轴承装置包括：空气轴承体，其具有自由表面;主要通道，其延伸穿过空气轴承体并且在自由表面中具有入口开口;次要通道系统，其延伸穿过空气轴承 并且在自由表面中具有多个排出口。 次通道系统中的流阻高于主通道中的流阻。

公开(公告)号：WO2017194247A1

公开(公告)日：2017-11-16

申请号：PCT/EP2017/058076

申请日：2017-04-05

Applicant: ASML NETHERLANDS B.V.

Inventor： KRAMER, Gijs ,  HOUBEN, Martijn ,  WATERSON, Nicholas, Peter ,  LAURENT, Thibault, Simon, Mathieu ,  VAN DE VIJVER, Yuri, Johannes, Gabriël ,  VERMEULEN, Marcus, Martinus, Petrus, Adrianus ,  RAVENSBERGEN, Simon, Karel ,  CLOOSTERMAN, Vincentius, Fransiscus ,  TROMP, Siegfried, Alexander ,  BALTIS, Coen, Hubertus, Matheus ,  GERRITZEN, Justin, Johannes, Hermanus ,  ROSET, Niek, Jacobus, Johannes

IPC: G03F7/20

CPC classification number: G03F7/2041 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70733

Abstract: An extraction body (67) is for a support apparatus (WT) of a lithographic apparatus. The support apparatus is configured to support an object (W). The extraction body is formed with an opening (91) at a surface (69) thereof. The opening extends within the extraction body forming a first passageway (90). The first passageway is configured to fluidly communicate an extraction channel (92) in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.

Abstract translation: 提取体（67）用于光刻设备的支撑设备（WT）。 支撑装置被构造成支撑物体（W）。 提取体在其表面（69）处形成有开口（91）。 该开口在提取体内延伸形成第一通道（90）。 第一通道被构造成将提取体中的提取通道（92）流体连通至表面与物体之间的液体。 萃取通道中的第一压力小于环境压力。 至少所述第一通道的一部分的大小和尺寸，使得当液体进入通过所述开口的第一通道，与液体的表面张力相关联的所述第一通道的第二压力比第一压力这样降低至少一个 部分液体保留在第一通道中。

公开(公告)号：WO2017102162A1

公开(公告)日：2017-06-22

申请号：PCT/EP2016/076357

申请日：2016-11-02

Applicant: ASML NETHERLANDS B.V.

Inventor： NAKIBOGLU, Günes ,  BALTIS, Coen, Hubertus, Matheus ,  TROMP, Siegfried, Alexander ,  VAN DE VIJVER, Yuri, Johannes, Gabriël ,  SCHOLTEN, Bert, Dirk ,  VAN SOMMEREN, Daan, Daniel, Johannes, Antonius ,  FRENCKEN, Mark, Johannes, Hermanus

IPC: G03F7/20 ,  H01L21/683

CPC classification number: G03F7/707 ,  G03F7/70341 ,  H01L21/68735 ,  H01L21/6875

Abstract: A substrate holder (WT) for use in a lithographic apparatus and configured to support a substrate (W), the substrate holder comprising: • a main body (21) having a main body surface (22); • a plurality of burls (20) projecting from the main body surface to support the substrate spaced apart from the main body surface; and • a liquid control structure (200) provided in a peripheral region (22a) of the main body surface and configured to cause liquid to preferentially flow toward the periphery of the main body surface.

Abstract translation: 一种用于光刻设备中并构造成支撑衬底（W）的衬底支架（WT），所述衬底支架包括：具有主体表面（22）的主体（21） ; ·从所述主体表面突出以支撑与所述主体表面间隔开的所述衬底的多个突起（20） 和设置在所述主体表面的外围区域（22a）中的液体控制结构（200），所述液体控制结构（200）被配置为使液体优先流向所述主体表面的周边。