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1.发明申请CONTROL SYSTEM, POSITIONING SYSTEM, LITHOGRAPHIC APPARATUS, CONTROL METHOD, DEVICE MANUFACTURING METHOD AND CONTROL PROGRAM 审中-公开控制系统，定位系统，平面设备，控制方法，设备制造方法和控制程序
公开(公告)号：WO2015150466A2
公开(公告)日：2015-10-08
申请号：PCT/EP2015/057199
申请日：2015-04-01
Applicant: ASML NETHERLANDS B.V.
Inventor： VAN DE WAL, Marinus, Maria, Johannes , AANGENENT, Wilhelmus, Henricus, Theodorus, Maria , DE BEST, Jeroen, Johannes, Theodorus, Hendrikus , VAN EIJK, Jan
IPC: G03F7/00
CPC classification number: G03F7/70775 , G03F7/70725 , G03F7/70783 , G03F7/709
Abstract: A control system for a positioning system, for positioning a driven object, e.g. a lithographic apparatus, in N dimension has M sensors, where M>N. A transformation module converts the M measurements pointed by the sensors into a positional estimate in N dimensions taking into account compliance of the driven object.
Abstract translation: 一种用于定位系统的控制系统，用于定位被驱动物体，例如， 在N维中具有M个传感器的光刻设备，其中M> N。 转换模块将传感器指向的M个测量值转换为N维度的位置估计值，同时考虑驱动对象的顺应性。
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公开(公告)号：WO2016155935A1
公开(公告)日：2016-10-06
申请号：PCT/EP2016/053120
申请日：2016-02-15
Applicant: ASML NETHERLANDS B.V.
Inventor： HUANG, Yang-Shan , AKKERMANS, Johannes, Antonius, Gerardus , BEERENS, Ruud , VAN EIJK, Jan
IPC: G03F7/20
CPC classification number: G03F7/70358 , G03F7/70425
Abstract: During a scanning exposure a support structure is moveable relative to a beam of radiation conditioned by an illuminator along a scanning path, and a substrate table is movable relative to the patterned radiation beam along a scanning path. An image transformation optic is arranged between the support structure and the substrate table. The image transformation optic is movable so as to control the characteristics of the image formed on the substrate such that the image can be transformed between a first configuration and a second configuration, the second configuration being inverted relative to the first configuration in a direction along the scanning path.
Abstract translation: 在扫描曝光期间，支撑结构可相对于沿着扫描路径由照明器调节的辐射光束移动，并且衬底台可相对于沿着扫描路径的图案化辐射束移动。 在支撑结构和衬底台之间布置图像变换光学元件。 图像变换光学元件是可移动的，以便控制在基板上形成的图像的特性，使得图像能够在第一配置和第二配置之间变换，第二配置相对于第一配置在沿着 扫描路径。
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3.发明申请SENSOR, OBJECT POSITIONING SYSTEM, LITHOGRAPHIC APPARATUS AND DEVICE DEVICE MANUFACTURING METHOD 审中-公开传感器，对象定位系统，平面设备和设备设备制造方法
公开(公告)号：WO2016034320A1
公开(公告)日：2016-03-10
申请号：PCT/EP2015/066519
申请日：2015-07-20
Applicant: ASML NETHERLANDS B.V.
Inventor： AKKERMANS, Johannes, Antonius, Gerardus , BEERENS, Ruud, Antonius, Catharina, Maria , BROERS, Sander, Christiaan , DE BEST, Jeroen Johannes Theodorus Hendrikus , HEEREN, Adrianus, Marinus, Wouter , LEENKNEGT, George, Alois, Leonie , LENSSEN, Bo , SCHELLENS, Hendrikus, Johannes , VAN DER KRIEKEN, Peter , CADEE, Theodorus, Petrus, Maria , VAN EIJK, Jan , VAN LIESHOUT, Richard, Henricus, Adrianus
CPC classification number: G03F7/70775 , G01L1/16 , G01P15/0915 , G01P15/18 , G03F7/70716 , G03F7/70783 , G03F7/7085
Abstract: The invention relates to a sensor (SE) comprising two shear-mode piezoelectric transducers (TR1, TR2), wherein each piezoelectric transducer comprises a bottom surface (BS) and a top surface (TS), wherein the top surfaces of the piezoelectric transducers are rigidly connected to each other, and wherein the bottom surfaces are configured to be attached to an object (OB) to be measured.
Abstract translation: 本发明涉及包括两个剪切模式压电换能器（TR1，TR2）的传感器（SE），其中每个压电换能器包括底表面（BS）和顶表面（TS），其中压电换能器的顶表面 彼此刚性地连接，并且其中底表面被配置为附接到待测量的物体（OB）。
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公开(公告)号：WO2016012174A1
公开(公告)日：2016-01-28
申请号：PCT/EP2015/064106
申请日：2015-06-23
Applicant: ASML NETHERLANDS B.V.
Inventor： HUANG, Yang-Shan , VAN BERKEL, Koos , VAN DIJSSELDONK, Antonius, Johannes, Josephus , VAN EIJK, Jan , VAN SCHOOT, Jan, Bernard, Plechelmus , VERMEULEN, Johannes, Petrus, Martinus, Bernardus
CPC classification number: G03F7/70733 , G03F1/60 , G03F7/70716
Abstract: A lithographic apparatus is described, the apparatus comprising: n illumination system configured to condition a radiation beam; otary drive adapted to move a flexible patterning device along a closed loop trajectory, the closed loop trajectory having a straight portion and a curved portion, a curvature of the flexible patterning device substantially corresponding to a curvature of the closed loop trajectory; a substrate table constructed to hold a substrate; wherein the rotary drive comprises a pulley assembly configured to: engage, during use, the flexible patterning device, and maintain, during use, a portion of the flexible patterning device that is situated along the straight portion of the trajectory substantially flat, the substantially flat portion of the patterning device being configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and; a projection system configured to project the patterned radiation beam onto a target portion of the substrate.
Abstract translation: 描述了一种光刻设备，该设备包括：n个照明系统，被配置为调节辐射束; 适于沿着闭环轨迹移动柔性图案形成装置的闭合驱动装置，闭环轨迹具有直线部分和弯曲部分，柔性图案形成装置的曲率基本上对应于闭环轨迹的曲率; 构造成保持基板的基板台; 其中所述旋转驱动器包括滑轮组件，所述滑轮组件构造成：在使用期间，所述柔性图案形成装置接合并且在使用期间保持所述柔性图案形成装置的沿所述轨迹的直线部分基本上平坦的部分， 所述图案形成装置的一部分被配置为使辐射束在其横截面上具有图案以形成图案化的辐射束， 投影系统，被配置为将图案化的辐射束投影到基板的目标部分上。
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公开(公告)号：EP3100115B1
公开(公告)日：2019-11-27
申请号：EP15702165.0
申请日：2015-01-20
Applicant: ASML Netherlands B.V.
Inventor： AANGENENT, Wilhelmus Henricus Theodorus Maria , KOORNEEF, Lucas Franciscus , RUIJL, Theo Anjes Maria , VAN DEN BERG, Stanley Constant Johannes Martinus , VAN DER MEULEN, Stan Henricus , VAN EIJK, Jan , WULLMS, Pieter Hubertus Godefrida , VAN LIESHOUT, Richard Henricus Adrianus
IPC: G03F7/20
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Patent Agency Ranking6.发明公开SENSOR, OBJECT POSITIONING SYSTEM, LITHOGRAPHIC APPARATUS AND DEVICE DEVICE MANUFACTURING METHOD 有权传感器，物件定位系统，光刻装置及装置装置制造方法
公开(公告)号：EP3189377A1
公开(公告)日：2017-07-12
申请号：EP15736849.9
申请日：2015-07-20
Applicant: ASML Netherlands B.V.
Inventor： AKKERMANS, Johannes, Antonius, Gerardus , BEERENS, Ruud, Antonius, Catharina, Maria , BROERS, Sander, Christiaan , DE BEST, Jeroen Johannes Theodorus Hendrikus , HEEREN, Adrianus, Marinus, Wouter , LEENKNEGT, George, Alois, Leonie , LENSSEN, Bo , SCHELLENS, Hendrikus, Johannes , VAN DER KRIEKEN, Peter , CADEE, Theodorus, Petrus, Maria , VAN EIJK, Jan , VAN LIESHOUT, Richard, Henricus, Adrianus
CPC classification number: G03F7/70775 , G01L1/16 , G01P15/0915 , G01P15/18 , G03F7/70716 , G03F7/70783 , G03F7/7085
Abstract: A sensor includes two shear-mode piezoelectric transducers, wherein each piezoelectric transducer has a bottom surface and a top surface, wherein the top surfaces of the piezoelectric transducers are rigidly connected to each other, and wherein the bottom surfaces of the piezoelectric transducers are configured to be attached to an object to be measured.
Abstract translation: 本发明涉及包括两个剪切模式压电换能器（TR1，TR2）的传感器（SE），其中每个压电换能器包括底表面（BS）和顶表面（TS），其中压电换能器的顶表面是 刚性地彼此连接，并且其中底部表面被构造成附接到待测量的物体（OB）。
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公开(公告)号：EP0772801B1
公开(公告)日：2003-07-16
申请号：EP96909310.3
申请日：1996-04-29
Applicant: ASML Netherlands B.V.
Inventor： VAN ENGELEN, Gerard , SPERLING, Frank, Bernhard , JANSSEN, Henricus, Wilhelmus, Aloysius , BOUWER, Adianus, Gerardus , VAN DIJK, Cornelis, Dionysius , VAN KIMMENADE, Johannes, Mathijs, Maria , VAN EIJK, Jan , VAN DER PAL, Adrianus
CPC classification number: G03F7/709 , G03F7/70358 , G03F7/70716 , G03F7/70775 , G03F7/70833 , G03F9/70
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8.发明授权SENSOR, OBJECT POSITIONING SYSTEM, LITHOGRAPHIC APPARATUS AND DEVICE DEVICE MANUFACTURING METHOD 有权传感器，物件定位系统，光刻装置及装置装置制造方法
公开(公告)号：EP3189377B1
公开(公告)日：2018-05-16
申请号：EP15736849.9
申请日：2015-07-20
Applicant: ASML Netherlands B.V.
Inventor： AKKERMANS, Johannes, Antonius, Gerardus , BEERENS, Ruud, Antonius, Catharina, Maria , BROERS, Sander, Christiaan , DE BEST, Jeroen Johannes Theodorus Hendrikus , HEEREN, Adrianus, Marinus, Wouter , LEENKNEGT, George, Alois, Leonie , LENSSEN, Bo , SCHELLENS, Hendrikus, Johannes , VAN DER KRIEKEN, Peter , CADEE, Theodorus, Petrus, Maria , VAN EIJK, Jan , VAN LIESHOUT, Richard, Henricus, Adrianus
CPC classification number: G03F7/70775 , G01L1/16 , G01P15/0915 , G01P15/18 , G03F7/70716 , G03F7/70783 , G03F7/7085
Abstract: A sensor includes two shear-mode piezoelectric transducers, wherein each piezoelectric transducer has a bottom surface and a top surface, wherein the top surfaces of the piezoelectric transducers are rigidly connected to each other, and wherein the bottom surfaces of the piezoelectric transducers are configured to be attached to an object to be measured.
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9.发明公开STAGE POSITIONING SYSTEM AND LITHOGRAPHIC APPARATUS 审中-公开LITHOGRAFISCHE VORRICHTUNG的STUFENPOSITIONIERUNGSSYSTEM
公开(公告)号：EP3100115A1
公开(公告)日：2016-12-07
申请号：EP15702165.0
申请日：2015-01-20
Applicant: ASML Netherlands B.V.
Inventor： AANGENENT, Wilhelmus Henricus Theodorus Maria , KOORNEEF, Lucas Franciscus , RUIJL, Theo Anjes Maria , VAN DEN BERG, Stanley Constant Johannes Martinus , VAN DER MEULEN, Stan Henricus , VAN EIJK, Jan , WULLMS, Pieter Hubertus Godefrida , VAN LIESHOUT, Richard Henricus Adrianus
IPC: G03F7/20
Abstract: A stage positioning system, includes a first body, a second body and a coupling arranged to couple the first body and the second body to each other. The coupling includes a visco-elastic element arranged to couple the first body and the second body to each other. The stage positioning system may further include a sensor to provide a signal representative of a position of the first body. The stage positioning system may further include an actuator to move the first body. The second body may be arranged to couple the actuator and the coupling to each other.
Abstract translation: 舞台定位系统包括第一主体，第二主体和布置成将第一主体和第二主体彼此联接的联接器。 联接器包括布置成将第一主体和第二主体彼此联接的粘弹元件。 舞台定位系统还可以包括传感器，以提供表示第一身体位置的信号。 舞台定位系统还可以包括用于移动第一身体的致动器。 第二主体可以布置成将致动器和联接器彼此联接。
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10.发明授权
公开(公告)号：EP0799439B2
公开(公告)日：2003-11-12
申请号：EP96912187.0
申请日：1996-05-17
Applicant: ASML Netherlands B.V.
CPC classification number: G03F7/707 , G03F7/70716 , G03F7/70833 , G03F7/709
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