公开(公告)号：WO2019096644A1

公开(公告)日：2019-05-23

申请号：PCT/EP2018/080433

申请日：2018-11-07

Applicant: ASML NETHERLANDS B.V.

Inventor： HUANG, Yang-Shan ,  DE JAGER, Pieter, Cornelis, Johan ,  REILINK, Rob ,  VALENTIN, Christiaan, Louis ,  SCHOLTEN, Jasper, Leonardus, Johannes ,  VERWEIJ, Antonie, Hendrik ,  VAN HORNE, Edwin

IPC: G03F7/20 ,  F16C32/06 ,  F16C33/74

CPC classification number: G03F7/70908 ,  F16C29/025 ,  F16C32/06 ,  F16C33/748 ,  G03F7/70716 ,  G03F7/70816

Abstract: An object stage bearing system can include an object stage, a hollow shaft coupled to the object stage, and an in-vacuum gas bearing assembly coupled to the hollow shaft and the object stage. The in-vacuum gas bearing assembly can include a gas bearing, a scavenging groove, and a vacuum groove. The gas bearing is disposed along an inner wall of the in-vacuum gas bearing assembly and along an external wall of the hollow shaft. The scavenging groove is disposed along the inner wall such that the scavenging groove is isolated from the gas bearing. The vacuum groove is disposed along the inner wall such that the vacuum groove is isolated from the scavenging groove and the gas bearing.

公开(公告)号：WO2019096536A1

公开(公告)日：2019-05-23

申请号：PCT/EP2018/078579

申请日：2018-10-18

Applicant: ASML NETHERLANDS B.V.

Inventor： HUANG, Yang-Shan ,  RUTGERS, Petrus, Theodorus

IPC: G03F7/20 ,  H02K41/035

CPC classification number: G03F7/70758 ,  H02K7/11 ,  H02K41/033

Abstract: A method for positioning a substage (9), supported by a main stage (5), relative to a reference object, the substage moveable in a direction (7) between a first and second position relative to the main stage. The method includes positioning the first stage using a passive force system that is activated by positioning the main stage. The passive force system includes two magnet systems (119, 121), each magnet system being configured to apply a force in the direction to the first stage with respect to the second stage in a non-contact manner, the forces resulting in a resultant force applied to the first stage in the direction by the passive force system. A magnitude and/or a direction of the resultant force depends on the position of the first stage relative to the second stage, and the first stage has a zero-force position between the first and second position in which the resultant force is zero.

公开(公告)号：WO2019020445A1

公开(公告)日：2019-01-31

申请号：PCT/EP2018/069463

申请日：2018-07-18

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： NIENHUYS, Han-Kwang ,  ALBRIGHT, Ronald, Peter ,  BRINKERT, Jacob ,  HUANG, Yang-Shan ,  SCHIMMEL, Hendrikus, Gijsbertus ,  VERWEIJ, Antonie, Hendrik

IPC: G03F7/20

Abstract: Designs are provided to reduce the possibility of contaminant particles with a large range of sizes, materials, travel speeds and angles of incidence reaching a particle-sensitive environment. According to an aspect of the disclosure, there is provided an object stage comprising first and second chambers, a first structure having a first surface, and a second structure. The second structure is configured to support an object in the second chamber, movable relative to the first structure. The second structure comprises a second surface opposing the first surface of the first structure thereby defining a gap between the first structure and the second structure that extends between the first chamber and the second chamber. The second structure further comprises a third surface within the first chamber. The object stage further comprises a trap disposed on at least a portion of the third surface, the trap comprising a plurality of baffles.

公开(公告)号：WO2018233951A1

公开(公告)日：2018-12-27

申请号：PCT/EP2018/062980

申请日：2018-05-17

Applicant: ASML NETHERLANDS B.V.

Inventor： D'ACHARD VAN ENSCHUT, Johannes, Franciscus, Martinus ,  DRUZHININA, Tamara ,  KUMAR, Nitish ,  ROY, Sarathi ,  HUANG, Yang-Shan ,  NIENHUYS, Han-Kwang ,  DEN BOEF, Arie, Jeffrey ,  VAN ZWOL, Pieter-Jan ,  ROOBOL, Sander, Bas

IPC: G01N21/95 ,  H01L21/66 ,  G03F7/20 ,  G01B11/14 ,  G01B11/25 ,  G03F1/84

Abstract: Disclosed is a method and associated inspection apparatus for detecting variations on a surface of a substrate. The method comprises providing patterned inspection radiation to a surface of a substrate. The inspection radiation is patterned such that an amplitude of a corresponding enhanced field is modulated in a manner corresponding to the patterned inspection radiation. The scattered radiation resultant from interaction between the enhanced field and the substrate surface is received and variations on the surface of the substrate are detected based on the interaction between the enhanced field and the substrate surface. Also disclosed is a method of detecting any changes to at least one characteristic of received radiation, the said changes being induced by the generation of a surface plasmon at said surface of the optical element.

公开(公告)号：WO2015110240A1

公开(公告)日：2015-07-30

申请号：PCT/EP2014/078677

申请日：2014-12-19

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING NV

Inventor： HUANG, Yang-Shan ,  KIM, Minkyu ,  NIJSSE, Gerard, Johannes, Pieter

IPC: G03F7/20 ,  H02K41/03 ,  H02K1/14 ,  H02K3/18 ,  H02K1/20 ,  H02K3/24

CPC classification number: G03F7/70725 ,  G03F7/70758 ,  G03F7/70858 ,  G03F7/70875 ,  H01F7/10 ,  H02K3/24 ,  H02K3/48 ,  H02K9/005 ,  H02K9/19 ,  H02K41/031

Abstract: A coil assembly for an electromagnetic actuator or motor is described, the coil assembly including a magnetic core comprising at least one pair of slots; a coil, at least partly mounted inside the at least one pair of slots; and a cooling member, the cooling member being mounted to a surface of the coil.

Abstract translation: 描述了用于电磁致动器或电动机的线圈组件，线圈组件包括包含至少一对槽的磁芯; 至少部分地安装在所述至少一对槽中的线圈; 以及冷却部件，所述冷却部件安装在所述线圈的表面。

公开(公告)号：WO2020035203A1

公开(公告)日：2020-02-20

申请号：PCT/EP2019/067113

申请日：2019-06-27

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DE VEN, Bastiaan, Lambertus, Wilhelmus, Marinus ,  KAUR, Chanpreet ,  VAN DE WIJDEVEN, Jeroen, Johan, Maarten ,  HUANG, Yang-Shan ,  JEUNINK, Andre, Bernardus ,  DRUZHININA, Tamara ,  VORONINA, Victoria

IPC: G03F9/00

Abstract: Disclosed is an apparatus for processing at least a first substrate in a lithographic process, which first substrate comprises a mask layer and one or more marks arranged below said mask layer, the apparatus comprising a first substrate support configured to hold the first substrate, a clearing tool configured to clear at least one of the marks by clearing an area of the mask layer above said mark while the first substrate is arranged on the first substrate support, and a measurement tool configured to determine a position of at least one of the cleared marks while the first substrate is arranged on the first substrate support.

公开(公告)号：WO2019037964A1

公开(公告)日：2019-02-28

申请号：PCT/EP2018/069601

申请日：2018-07-19

Applicant: ASML NETHERLANDS B.V.

Inventor： HUANG, Yang-Shan ,  JEUNINK, Andre, Bernardus ,  VAN DE VEN, Bastiaan, Lambertus, Wilhelmus, Marinus ,  VORONINA, Victoria

IPC: G03F7/20

Abstract: A clear-out tool is described, the clear-out tool being configured to at least partially remove a masking layer from a target area of an object using a laser beam. The clear-out tool comprising a barrier member configured to be arranged above a surface of the object containing the target area and configured to contain a liquid in a space next to the target area or surrounding the target area.

公开(公告)号：WO2019020443A1

公开(公告)日：2019-01-31

申请号：PCT/EP2018/069459

申请日：2018-07-18

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： HUANG, Yang-Shan ,  BURBANK, Daniel, Nathan ,  STAVENGA, Marco, Koert

IPC: G03F7/20

Abstract: An object stage can include a first structure and a second structure movable relative to the first structure. The second structure is configured to support an object. The object stage also includes a seal plate movably coupled to the first structure or the second structure, but not both. And the object stage includes at least one actuator configured to move the seal plate such that a substantially constant gap is defined between the seal plate and the first structure or the second structure that is not coupled to the seal plate.

公开(公告)号：WO2017194286A1

公开(公告)日：2017-11-16

申请号：PCT/EP2017/059391

申请日：2017-04-20

Applicant: ASML NETHERLANDS B.V.

Inventor： HUANG, Yang-Shan ,  POLYAKOV, Alexey, Olegovich ,  VERSCHUREN, Coen, Adrianus ,  DE JAGER, Pieter, Willem, Herman

IPC: H01L21/67

CPC classification number: H01L21/67144 ,  H01L21/67011 ,  H01L21/6838

Abstract: A pick-and-place tool including a plurality of movable holder structures, and a plurality of pick- and-place structures, each holder structure accommodating two or more of the pick-and-place structures, wherein at least one of the two or more pick-and-place structures of a respective holder structure is able to move along a respective holder structure independently from another at least one of the two or more pick- and-place structures of the respective holder structure, and wherein each pick-and-place structure includes a pick-up element configured to pick up a donor component at a donor structure and place the donor component an acceptor structure.

Abstract translation: 包括多个可移动保持器结构和多个拾放结构的拾放工具，每个保持器结构容纳两个或更多个拾放结构， 其中相应保持器结构的所述两个或更多个拾放结构中的至少一个能够沿着相应的保持器结构独立于所述相应保持器的所述两个或更多个拾取和放置结构中的至少一个移动 结构，并且其中每个拾放结构包括拾取元件，该拾取元件被配置成在供体结构处拾取供体组分并且将供体组分放置为受体结构。

公开(公告)号：WO2016155935A1

公开(公告)日：2016-10-06

申请号：PCT/EP2016/053120

申请日：2016-02-15

Applicant: ASML NETHERLANDS B.V.

Inventor： HUANG, Yang-Shan ,  AKKERMANS, Johannes, Antonius, Gerardus ,  BEERENS, Ruud ,  VAN EIJK, Jan

IPC: G03F7/20

CPC classification number: G03F7/70358 ,  G03F7/70425

Abstract: During a scanning exposure a support structure is moveable relative to a beam of radiation conditioned by an illuminator along a scanning path, and a substrate table is movable relative to the patterned radiation beam along a scanning path. An image transformation optic is arranged between the support structure and the substrate table. The image transformation optic is movable so as to control the characteristics of the image formed on the substrate such that the image can be transformed between a first configuration and a second configuration, the second configuration being inverted relative to the first configuration in a direction along the scanning path.

Abstract translation: 在扫描曝光期间，支撑结构可相对于沿着扫描路径由照明器调节的辐射光束移动，并且衬底台可相对于沿着扫描路径的图案化辐射束移动。 在支撑结构和衬底台之间布置图像变换光学元件。 图像变换光学元件是可移动的，以便控制在基板上形成的图像的特性，使得图像能够在第一配置和第二配置之间变换，第二配置相对于第一配置在沿着 扫描路径。