公开(公告)号：WO2016155935A1

公开(公告)日：2016-10-06

申请号：PCT/EP2016/053120

申请日：2016-02-15

Applicant: ASML NETHERLANDS B.V.

Inventor： HUANG, Yang-Shan ,  AKKERMANS, Johannes, Antonius, Gerardus ,  BEERENS, Ruud ,  VAN EIJK, Jan

IPC: G03F7/20

CPC classification number: G03F7/70358 ,  G03F7/70425

Abstract: During a scanning exposure a support structure is moveable relative to a beam of radiation conditioned by an illuminator along a scanning path, and a substrate table is movable relative to the patterned radiation beam along a scanning path. An image transformation optic is arranged between the support structure and the substrate table. The image transformation optic is movable so as to control the characteristics of the image formed on the substrate such that the image can be transformed between a first configuration and a second configuration, the second configuration being inverted relative to the first configuration in a direction along the scanning path.

Abstract translation: 在扫描曝光期间，支撑结构可相对于沿着扫描路径由照明器调节的辐射光束移动，并且衬底台可相对于沿着扫描路径的图案化辐射束移动。 在支撑结构和衬底台之间布置图像变换光学元件。 图像变换光学元件是可移动的，以便控制在基板上形成的图像的特性，使得图像能够在第一配置和第二配置之间变换，第二配置相对于第一配置在沿着 扫描路径。

公开(公告)号：WO2013029879A1

公开(公告)日：2013-03-07

申请号：PCT/EP2012/064452

申请日：2012-07-24

Applicant: ASML NETHERLANDS B.V. ,  BLEEKER, Arno ,  LOOPSTRA, Erik ,  VAN DER SCHOOT, Harmen ,  PHILIPS, Danny ,  BEERENS, Ruud

Inventor： BLEEKER, Arno ,  LOOPSTRA, Erik ,  VAN DER SCHOOT, Harmen ,  PHILIPS, Danny ,  BEERENS, Ruud

IPC: G03F7/20

CPC classification number: G03F7/70641 ,  G03F7/7005 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70308 ,  G03F7/70391 ,  G03F7/704 ,  G03F7/70825

Abstract: A lithographic apparatus having a programmable patterning device and a projection system. The programmable patterning device is configured to provide a plurality of radiation beams. The projection system has a lens group array configured to project the plurality of radiation beams onto a substrate. The projection system further includes a focus adjuster in an optical path corresponding to a lens group of the lens group array. The focus adjuster has an optical element having substantially zero optical power.

Abstract translation: 一种具有可编程图案形成装置和投影系统的光刻设备。 可编程图案形成装置被配置为提供多个辐射束。 投影系统具有配置成将多个辐射束投影到基板上的透镜组阵列。 投影系统还包括对应于透镜组阵列的透镜组的光路中的焦点调节器。 焦点调节器具有基本上为零光功率的光学元件。

公开(公告)号：WO2013098053A1

公开(公告)日：2013-07-04

申请号：PCT/EP2012/074507

申请日：2012-12-05

Applicant: ASML NETHERLANDS B.V.

Inventor： BUTLER, Hans ,  BLEEKER, Arno ,  HENNUS, Pieter ,  HOEKS, Martinus ,  HOL, Sven, Antoin, Johan ,  VAN DER SCHOOT, Harmen ,  SLAGHEKKE, Bernardus ,  TINNEMANS, Patricius ,  VAN DER WIJST, Marc ,  ZAAL, Koen ,  CADEE, Theodorus, Petrus, Maria ,  BEERENS, Ruud ,  FISCHER, Olof ,  AANGENENT, Wouter ,  BOSCH, Niels, Johannes, Maria

IPC: G03F7/20

CPC classification number: G03F7/70258 ,  G03F7/70275 ,  G03F7/70366 ,  G03F7/70391 ,  G03F7/704 ,  G03F7/70558 ,  G03F7/70816 ,  G03F7/709

Abstract: An exposure apparatus (1) including a projection system (12, 14) configured to project a plurality of radiation beams onto a target; a movable frame (8) that is at least rotatable around an axis (10); and an actuator system (11) configured to displace the movable frame to an axis away from an axis corresponding to the geometric center of the movable frame and to cause the frame to rotate around an axis through the center of mass of the frame.

Abstract translation: 一种曝光装置（1），包括被配置为将多个辐射束投影到目标上的投影系统（12,14） 至少可绕轴线（10）旋转的可移动框架（8）; 以及致动器系统（11），其构造成将可移动框架移动到远离与可移动框架的几何中心对应的轴线的轴线上，并使框架围绕通过框架的质心的轴线旋转。

公开(公告)号：WO2012013451A1

公开(公告)日：2012-02-02

申请号：PCT/EP2011/061206

申请日：2011-07-04

Applicant: ASML NETHERLANDS B.V. ,  TU EINDHOVEN ,  SORAMA ,  AANGENENT, Wouter ,  VERMEULEN, Johannes ,  BEERENS, Ruud ,  SCHOLTE, Rick ,  LOPEZ ARTEAGA, Ines

Inventor： AANGENENT, Wouter ,  VERMEULEN, Johannes ,  BEERENS, Ruud ,  SCHOLTE, Rick ,  LOPEZ ARTEAGA, Ines

IPC: G03F7/20 ,  G01H3/00

CPC classification number: G03F7/70775 ,  G03F7/70866 ,  G03F7/709

Abstract: A lithographic apparatus includes a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; a sensor array positioned and arranged to detect an acoustic wave from a movable part of the lithographic apparatus, a controller, the controller having a controller input connected to the sensor array so as to receive a sensor array output signal, and a controller output connected to at least one actuator arranged to act on the movable part, the controller being arranged to: calculate a movement of the movable part from the sensor array output signal, and drive via the controller output the at least one actuator in response to the calculated movement.

Abstract translation: 光刻设备包括构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予具有图案的辐射束以形成图案化的辐射束; 构造成保持基板的基板台; 投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上; 传感器阵列，其被布置成检测来自所述光刻设备的可移动部分的声波;控制器，所述控制器具有连接到所述传感器阵列的控制器输入，以便接收传感器阵列输出信号;以及控制器输出，连接到 至少一个致动器被布置成作用在所述可移动部件上，所述控制器被布置成：根据所述传感器阵列输出信号计算所述可移动部件的运动，并且响应于所计算的运动，经由所述控制器驱动所述至少一个致动器。

公开(公告)号：WO2014154433A1

公开(公告)日：2014-10-02

申请号：PCT/EP2014/053753

申请日：2014-02-26

Applicant: ASML NETHERLANDS B.V. ,  CARL ZEISS SMT GMBH

Inventor： LOOPSTRA, Erik ,  BEERENS, Ruud ,  BIELING, Stig ,  CADEE, Theodorus ,  DONDERS, Sjoerd ,  FRIJNS, Olav ,  KEMPEN, Antonius ,  SCHEEPERS, Marcus ,  STRUYCKEN, Alexander ,  TEN KATE, Nicolaas ,  VANDERHALLEN, ivo ,  VAN LIESHOUT, Richard

IPC: G03F7/20 ,  H05G2/00

CPC classification number: G03F7/70033 ,  G02B5/0891 ,  G02B19/0095 ,  G03F7/70166 ,  G03F7/702 ,  G03F7/70916 ,  G03F7/70983 ,  G21K1/067 ,  H05G2/003 ,  H05G2/008

Abstract: A radiation collector comprising a first collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a first location at a distance from the radiation collector, a second collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a second location at said distance from the radiation collector, wherein the first location and the second location are separated from one another.

Abstract translation: 一种辐射收集器，包括第一收集器段，该第一收集器段包括多个掠入射反射器壳体，所述多个入射反射器壳体被配置为引导辐射在离辐射收集器一定距离处的第一位置会聚;第二收集器部分，其包括多个入射入射反射器壳体， 以在距离辐射收集器的所述距离处会聚在第二位置，其中第一位置和第二位置彼此分离。

公开(公告)号：WO2013152877A1

公开(公告)日：2013-10-17

申请号：PCT/EP2013/051800

申请日：2013-01-30

Applicant: ASML NETHERLANDS B.V.

Inventor： BLEEKER, Arno ,  CASTENMILLER, Thomas ,  DE JAGER, Pieter ,  MULDER, Heine ,  ZAAL, Koen ,  CADEE, Theodorus Petrus Maria ,  PHILIPS, Danny ,  BEERENS, Ruud ,  TIMMERMANS, Roger

IPC: G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/20 ,  G03F7/7005 ,  G03F7/70075 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70366 ,  G03F7/70383 ,  G03F7/70391 ,  G03F7/704 ,  G03F7/70425 ,  G03F7/70475

Abstract: A projection system, configured to project a radiation beam onto a target, includes a rotatable frame (8) configured to rotate about an axis defining a tangential direction and a radial direction, wherein the rotatable frame holds a lens configured to focus the radiation beam in only the tangential or radial direction; and a stationary part comprising a substantially stationary lens configured to focus the radiation beam in only the other of the tangential or radial direction. Provisions are made to prevent moments to be exerted on the lens held by the rotatable frame.

Abstract translation: 被配置为将辐射束投影到目标上的投影系统包括可旋转的框架（8），其被配置为围绕限定切线方向和径向方向的轴线旋转，其中可旋转框架保持配置成将辐射束聚焦在 只有切向或径向; 以及固定部分，其包括基本上固定的透镜，其被配置为仅将所述辐射束聚焦在所述切向或径向方向中的另一个中。 作出规定以防止由可旋转框架保持的镜片施加力矩。