公开(公告)号：WO2013182367A1

公开(公告)日：2013-12-12

申请号：PCT/EP2013/059576

申请日：2013-05-08

Applicant: ASML NETHERLANDS B.V.

Inventor： MULDER, Heine ,  SCHUURMANS, Frank ,  VAN ZWET, Erwin

IPC: G03F7/20

CPC classification number: G03F7/70291 ,  G03F7/70391 ,  G03F7/704

Abstract: In a maskless lithography or exposure apparatus, a plurality of sources devices emit non-parallel, e.g. directed towards a common point, beams. A redirecting element redirects the beams into respective mutually parallel paths. The redirecting element may be a positive or negative refractive lens group.

Abstract translation: 在无掩模光刻或曝光装置中，多个源装置发射不平行，例如， 指向一个共同点，梁。 重定向元件将光束重定向到相应的相互平行的路径中。 重定向元件可以是正或负折射透镜组。

公开(公告)号：WO2011104180A1

公开(公告)日：2011-09-01

申请号：PCT/EP2011/052408

申请日：2011-02-18

Applicant: ASML NETHERLANDS B.V. ,  VAN ZWET, Erwin ,  DE JAGER, Pieter ,  ONVLEE, Johannes ,  FRITZ, Erik

Inventor： VAN ZWET, Erwin ,  DE JAGER, Pieter ,  ONVLEE, Johannes ,  FRITZ, Erik

IPC: G03F7/20

CPC classification number: G03F7/704 ,  G03F7/70275 ,  G03F7/70391

Abstract: The invention relates to a lithographic apparatus comprising one or more optical columns capable of projecting a beam on a target portion on a substrate held by the substrate support. The one or more optical columns may comprise one or more self-emissive contrast devices to emit the beam. The optical column may comprise a projection system to project the beam onto the target portion. The target portion has a height in a scanning direction of the substrate and a tangential width mainly perpendicular to the scanning direction, wherein a scanning speed of the substrate in the scanning direction divided by the height substantially corresponds with a rotating speed of the optical column or a part thereof divided by the tangential width of the target portion.

Abstract translation: 本发明涉及一种光刻设备，包括一个或多个能够将光束投射在由基板支撑件保持的基板上的目标部分上的光学柱。 一个或多个光学柱可以包括一个或多个发射光束的自发射对比度装置。 光学柱可以包括将光束投影到目标部分上的投影系统。 目标部分具有基板的扫描方向的高度和主要垂直于扫描方向的切线宽度，其中基板沿扫描方向除以高度的扫描速度基本上对应于光学柱的转速或 其一部分除以目标部分的切线宽度。

公开(公告)号：WO2013124114A1

公开(公告)日：2013-08-29

申请号：PCT/EP2013/051355

申请日：2013-01-24

Applicant: ASML NETHERLANDS B.V.

Inventor： KOEK, Wouter ,  BLEEKER, Arno ,  LOOPSTRA, Erik ,  MULDER, Heine ,  VAN ZWET, Erwin ,  SMEETS, Dries ,  EBELING, Robert

IPC: G03F7/20 ,  G02B6/12

CPC classification number: G03F7/70891 ,  G02B6/4296 ,  G03F7/7015 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70391 ,  G03F7/704 ,  Y10T29/49

Abstract: A device having a waveguide formed of a continuous body of material that is transparent to radiation that passes through the waveguide, wherein the body has an input surface and an output surface, and a cooler configured to cool the input surface and/or the output surface. An exposure apparatus having a programmable patterning device that comprises a plurality of radiation emitters, configured to provide a plurality of radiation beams; and a projection system, comprising a stationary part and a moving part, configured to project the plurality of radiation beams onto locations on a target that are selected based on a pattern, wherein at least one of the radiation emitters comprises a waveguide configured to output a radiation beam that comprises unpolarized and/or circularly polarized radiation.

Abstract translation: 一种具有波导形成的波导的器件，所述波导由穿过所述波导的辐射透明的材料的连续体形成，其中所述主体具有输入表面和输出表面，以及冷却器，被配置为冷却所述输入表面和/或输出表面 。 一种具有可编程图案形成装置的曝光装置，包括多个辐射发射器，被配置为提供多个辐射束; 以及投影系统，包括固定部分和移动部分，其被配置为将所述多个辐射束投影到基于图案被选择的目标上的位置上，其中所述辐射发射器中的至少一个包括波导，所述波导被配置为输出 包括非偏振和/或圆偏振辐射的辐射束。

公开(公告)号：WO2011104177A1

公开(公告)日：2011-09-01

申请号：PCT/EP2011/052405

申请日：2011-02-18

Applicant: ASML NETHERLANDS B.V. ,  VAN ZWET, Erwin ,  DE JAGER, Pieter ,  ONVLEE, Johannes ,  Fritz, Erik

Inventor： VAN ZWET, Erwin ,  DE JAGER, Pieter ,  ONVLEE, Johannes ,  Fritz, Erik

IPC: G03F7/20 ,  G02B7/02

CPC classification number: G03F7/70891 ,  G02B7/028 ,  G03F7/70391 ,  G03F7/704

Abstract: The invention relates to a lithographic apparatus with a substrate table constructed to hold a substrate and an optical column 924, 930) capable of creating a pattern on a target portion of the substrate. The apparatus has an actuator (928) to move the optical column or part thereof with respect to the substrate. The movement of the optical column or part thereof through a medium causes a heat load on the optical column or part thereof. The apparatus is constructed or operated to reduce the influence of the heat load on the operation of the apparatus.

Abstract translation: 本发明涉及一种光刻设备，其具有用于保持基板的基板台和能够在基板的目标部分上产生图案的光学柱924,930。 该装置具有致动器（928），用于相对于基板移动光学柱或其一部分。 光学柱或其部分通过介质的移动导致光学柱或其一部分上的热负荷。 该装置被构造或操作以减少热负荷对装置的操作的影响。

公开(公告)号：WO2011098325A2

公开(公告)日：2011-08-18

申请号：PCT/EP2011/050600

申请日：2011-02-02

Applicant: ASML NETHERLANDS B.V. ,  VAN ZWET, Erwin ,  DE JAGER, Pieter ,  ONVLEE, Johannes ,  FRITZ, Erik

Inventor： VAN ZWET, Erwin ,  DE JAGER, Pieter ,  ONVLEE, Johannes ,  FRITZ, Erik

IPC: G03F7/20

CPC classification number: G03F7/70366 ,  G03F7/70275 ,  G03F7/70391 ,  G03F7/704 ,  G03F7/70491 ,  G03F7/70883

Abstract: A lithographic apparatus comprising an optical column capable of creating a pattern on a target portion of a substrate is disclosed. The optical column may have a self emissive contrast device configured to emit a beam, and a projection system configured to project the beam onto the target portion. The apparatus may also have an actuator to move the optical column or a part thereof with respect to the substrate. The apparatus may be constructed to reduce the optical effect of density variation in a medium around the moving part of the optical column on the beam.

Abstract translation: 公开了一种包括能够在基板的目标部分上形成图案的光学柱的光刻设备。 光学柱可以具有被配置为发射光束的自发射对比度装置，以及被配置为将光束投影到目标部分上的投影系统。 该装置还可以具有致动器以相对于基板移动光学柱或其一部分。 该装置可以被构造成减小在光束上的光学柱的移动部分周围的介质中的密度变化的光学效应。

公开(公告)号：WO2011104179A1

公开(公告)日：2011-09-01

申请号：PCT/EP2011/052407

申请日：2011-02-18

Applicant: ASML NETHERLANDS B.V. ,  ONVLEE, Johannes ,  VAN ZWET, Erwin ,  KOPPELMANS, Johannes

Inventor： ONVLEE, Johannes ,  VAN ZWET, Erwin ,  KOPPELMANS, Johannes

IPC: G03F7/20

CPC classification number: G03F7/704 ,  G03F7/70391

Abstract: A lithographic apparatus includes an optical column configured to create a pattern on a target portion of a substrate, the optical column including a controllable element (906) configured to provide a beam; and a projection system configured to project the beam onto the target portion; an actuator (936) configured to move at least a part (924, 940) of the optical column with respect to the substrate; a measurement system (938, 940) configured to measure a position of the at least part of the optical column; and a controller (942) configured to drive the controllable element, the controller being provided with an output signal of the measurement system.

Abstract translation: 光刻设备包括被配置为在衬底的目标部分上产生图案的光学柱，所述光学柱包括构造成提供光束的可控元件（906） 以及投影系统，被配置为将所述光束投影到所述目标部分上; 致动器（936），其构造成相对于所述基板移动所述光学柱的至少一部分（924,940）; 被配置为测量所述光学柱的所述至少一部分的位置的测量系统（938,940）; 以及被配置为驱动所述可控元件的控制器（942），所述控制器被提供有所述测量系统的输出信号。

公开(公告)号：WO2011104178A1

公开(公告)日：2011-09-01

申请号：PCT/EP2011/052406

申请日：2011-02-18

Applicant: ASML NETHERLANDS B.V. ,  ONVLEE, Johannes ,  DE JAGER, Pieter ,  VAN ZWET, Erwin

Inventor： ONVLEE, Johannes ,  DE JAGER, Pieter ,  VAN ZWET, Erwin

IPC: G03F7/20

CPC classification number: G03F7/704 ,  G03F7/70383 ,  G03F7/70391

Abstract: A lithographic apparatus including an optical column configured to project a beam on a target portion of a substrate is disclosed. A focus controller is provided to control the focus position (906, 920, 924, 930) of the optical column with respect to a reference object, wherein the focus controller comprises a focus measurement device (942) configured to determine a focus quality on the reference object (938), and a focus actuator configured to adjust the focus position of the optical column on the basis of the determined focus quality.

Abstract translation: 公开了一种光刻设备，其包括被配置为将光束投射在基板的目标部分上的光学列。 提供聚焦控制器以相对于参考对象来控制光学列的聚焦位置（906,920,924,930），其中焦点控制器包括焦点测量装置（942），其被配置为确定在第 参考物体（938），以及焦点致动器，其被配置为基于所确定的聚焦质量来调节光学列的聚焦位置。

公开(公告)号：WO2011104173A1

公开(公告)日：2011-09-01

申请号：PCT/EP2011/052401

申请日：2011-02-18

Applicant: ASML NETHERLANDS B.V. ,  ONVLEE, Johannes ,  DE JAGER, Pieter ,  VAN ZWET, Erwin

Inventor： ONVLEE, Johannes ,  DE JAGER, Pieter ,  VAN ZWET, Erwin

IPC: G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70475 ,  G03F7/70258 ,  G03F7/70275 ,  G03F7/70391 ,  G03F7/704

Abstract: A lithographic apparatus includes two or more optical columns configured to project a beam on a target portion of a substrate, each of the two or more optical columns including one or more radiation sources (906) to provide the beam, and a projection system (920, 924, 930) to project the beam onto the target portion; a scanning movement actuator configured to move the substrate with a scanning speed in a scanning direction with respect to the two or more optical columns; and two or more position measurement devices (944) configured to determine a position of the respective two or more optical columns with respect to a reference object (940).

Abstract translation: 光刻设备包括两个或更多个光学柱，其配置成将光束投影到基板的目标部分上，两个或更多个光柱中的每一个包括一个或多个辐射源（906）以提供光束，以及投影系统（920 ，924,930）将光束投影到目标部分上; 扫描移动致动器，被配置为相对于所述两个或更多个光学柱在扫描方向上以扫描速度移动所述基板; 以及两个或更多个位置测量装置（944），其被配置为确定相对于参考对象（940）的相应的两个或更多个光学列的位置。

公开(公告)号：WO2011104172A1

公开(公告)日：2011-09-01

申请号：PCT/EP2011/052400

申请日：2011-02-18

Applicant: ASML NETHERLANDS B.V. ,  ONVLEE, Johannes ,  DE JAGER, Pieter ,  VAN ZWET, Erwin

Inventor： ONVLEE, Johannes ,  DE JAGER, Pieter ,  VAN ZWET, Erwin

IPC: G03F7/20

CPC classification number: G03F7/7085 ,  G03F7/70275 ,  G03F7/70366 ,  G03F7/70391 ,  G03F7/704 ,  G03F7/70516 ,  G03F7/70558

Abstract: The invention relates to a lithographic apparatus comprising an optical column capable of creating a pattern on a target portion of the substrate. The optical column may be provided with a self-emissive contrast device configured to emit a beam and a projection system configured to project the beam onto the target portion. The apparatus may be provided with an actuator to move the optical column or a part thereof with respect to the substrate. An optical sensor device is provided which is movable in respect of the optical columns and has a range of movement which enables the optical sensor device (936) to move through a projection area (940) of each of the optical columns to measure a beam of each of the optical columns.

Abstract translation: 本发明涉及一种光刻设备，其包括能够在基板的目标部分上产生图案的光学柱。 光学柱可以设置有被配置为发射光束的自发射对比度装置和被配置为将光束投射到目标部分上的投影系统。 该装置可以设置有致动器，以相对于基板移动光学柱或其一部分。 提供了一种光学传感器装置，其可相对于光学柱移动，并且具有使得光学传感器装置（936）能够移动通过每个光学列的投影区域（940）的移动范围，以测量光束 每个光学柱。

公开(公告)号：WO2012084457A3

公开(公告)日：2012-06-28

申请号：PCT/EP2011/071610

申请日：2011-12-02

Applicant: ASML NETHERLANDS B.V. ,  MULCKHUYSE, Wouter ,  DE JAGER, Pieter ,  VAN ZWET, Erwin

Inventor： MULCKHUYSE, Wouter ,  DE JAGER, Pieter ,  VAN ZWET, Erwin

IPC: G03F7/20

Abstract: A system for controlling a patterning device in a lithographic apparatus using a patterning device having individually controllable elements that may only be set to two states. The method includes converting a representation of a pattern to be formed on the substrate into a plurality of area intensity signals, each corresponding to a radiation intensity level required to be set in a respective area of the patterning device in order to provide the desired pattern on the substrate and a separate step of converting each of the area intensity signals into control signals for a plurality of individually controllable elements that each correspond to the area of the patterning device.