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    A LITHOGRAPHY APPARATUS, A DEVICE MANUFACTURING METHOD, A METHOD OF MANUFACTURING AN ATTENUATOR
    3.
    发明申请
    A LITHOGRAPHY APPARATUS, A DEVICE MANUFACTURING METHOD, A METHOD OF MANUFACTURING AN ATTENUATOR 审中-公开
    一种雕刻设备，一种设备制造方法，一种制造衰减器的方法

    公开(公告)号：WO2013143729A1

    公开(公告)日：2013-10-03

    申请号：PCT/EP2013/052199

    申请日：2013-02-05

    Applicant: ASML NETHERLANDS B.V.

    Inventor： HOEKS, Martinus ,  BLEEKER, Arno

    IPC: G03F7/20

    CPC classification number: G03F7/20 ,  G03F7/70191 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70391 ,  G03F7/704

    Abstract: There is disclosed an exposure apparatus, a device manufacturing method and a method of manufacturing an attenuator. According to an embodiment, the exposure apparatus includes a programmable patterning device configured to provide a plurality of individually controllable radiation beams; a projection system configured to project each of the radiation beams onto a respective location on a target; and an attenuator configured to reduce a standard deviation in maximum radiation flux or background exposure level that can be applied to the target by the radiation beams as a function of position on the target.

    Abstract translation: 公开了一种曝光装置，装置制造方法和衰减器的制造方法。 根据实施例，曝光装置包括可编程图案形成装置，其被配置为提供多个可单独控制的辐射束; 投影系统，被配置为将每个辐射束投射到目标上的相应位置; 以及衰减器，其被配置为减少可以作为靶上的位置的函数的辐射束可以施加到目标的最大辐射通量或背景曝光水平的标准偏差。

    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    4.
    发明申请
    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：WO2013107595A1

    公开(公告)日：2013-07-25

    申请号：PCT/EP2012/076319

    申请日：2012-12-20

    Applicant: ASML NETHERLANDS B.V.

    Inventor： TINNEMANS, Patricius ,  BLEEKER, Arno

    IPC: G03F7/20

    CPC classification number: G03F7/70058 ,  G03F7/70358 ,  G03F7/70366 ,  G03F7/70391 ,  G03F7/704 ,  G03F7/70525 ,  G03F7/70558

    Abstract: A lithographic or exposure apparatus (1) has a projection system (12, 14, 18) and a controller (500). The projection system includes a stationary part (12) and a moving part (14, 18). The projection system is configured to project a plurality of radiation beams onto locations on a target. The locations are selected based on a pattern. The controller is configured to control the apparatus to operate in a first mode or a second mode. In the first mode the projection system delivers a first amount of energy to the selected locations. In the second mode the projection system delivers a second amount of energy to the selected locations. The second amount of energy is greater than the first amount of energy.

    Abstract translation: 光刻或曝光设备（1）具有投影系统（12,14,18）和控制器（500）。 投影系统包括固定部分（12）和移动部分（14,18）。 投影系统被配置为将多个辐射束投影到目标上的位置上。 基于模式选择位置。 控制器被配置为控制设备以第一模式或第二模式操作。 在第一模式中，投影系统向选定位置传送第一量的能量。 在第二模式中，投影系统将第二量的能量传送到所选择的位置。 第二量的能量大于第一能量。

    METHOD AND APPARATUS FOR PRINTING LARGE DATA FLOWS
    5.
    发明申请
    METHOD AND APPARATUS FOR PRINTING LARGE DATA FLOWS 审中-公开
    打印大数据流的方法和装置

    公开(公告)号：WO2003081338A1

    公开(公告)日：2003-10-02

    申请号：PCT/SE2003/000462

    申请日：2003-03-19

    Applicant: MICRONIC LASER SYSTEMS AB ,  ASML NETHERLANDS B.V. ,  THURÉN, Anders ,  VAN DER MAST, Karel ,  BLEEKER, Arno

    Inventor： THURÉN, Anders ,  VAN DER MAST, Karel ,  BLEEKER, Arno

    IPC: G03F7/20

    CPC classification number: G03F7/70725 ,  G03F7/70291 ,  G03F7/704 ,  G03F7/70508

    Abstract: An aspect of the present invention includes a method for patterning a workpiece covered at least partly with a layer sensitive to electromagnetic radiation, comprising the actions of, providing a data representation of at least one image to be imaged onto a plurality of locations of said workpiece, fracturing said data representation into a plurality of field stripes, repeating the actions of rasterizing a first field stripe of said data representation, modulating a modulator according to said rasterized field stripe, imaging said first field stripe onto a plurality of locations of said workpiece, rasterizing a second field stripe of said data representation while imaging said first field stripe onto said plurality of locations of said workpiece, terminating the repetition when a predetermined amount of said image is imaged onto said plurality of locations of said workpiece. Other aspects of the present invention are reflected in the detailed description, figures and claims.

    Abstract translation: 本发明的一个方面包括一种用于图案化至少部分地具有对电磁辐射敏感的层的工件的方法，包括以下动作：提供要成像到所述工件的多个位置上的至少一个图像的数据表示 将所述数据表示压缩成多个场条带，重复光栅化所述数据表示的第一场条带的动作，根据所述光栅化场条带调制调制器，将所述第一场条纹成像到所述工件的多个位置上， 光栅化所述数据表示的第二场条纹，同时将所述第一场条纹成像到所述工件的所述多个位置上，当将预定量的所述图像成像到所述工件的所述多个位置上时，终止重复。 本发明的其它方面在详细描述，附图和权利要求中被体现。

    DEVICE, LITHOGRAPHIC APPARATUS, METHOD FOR GUIDING RADIATION AND DEVICE MANUFACTURING METHOD
    7.
    发明申请
    DEVICE, LITHOGRAPHIC APPARATUS, METHOD FOR GUIDING RADIATION AND DEVICE MANUFACTURING METHOD 审中-公开
    设备，光刻设备，用于引导辐射的方法和设备制造方法

    公开(公告)号：WO2013124114A1

    公开(公告)日：2013-08-29

    申请号：PCT/EP2013/051355

    申请日：2013-01-24

    Applicant: ASML NETHERLANDS B.V.

    Inventor： KOEK, Wouter ,  BLEEKER, Arno ,  LOOPSTRA, Erik ,  MULDER, Heine ,  VAN ZWET, Erwin ,  SMEETS, Dries ,  EBELING, Robert

    IPC: G03F7/20 ,  G02B6/12

    CPC classification number: G03F7/70891 ,  G02B6/4296 ,  G03F7/7015 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70391 ,  G03F7/704 ,  Y10T29/49

    Abstract: A device having a waveguide formed of a continuous body of material that is transparent to radiation that passes through the waveguide, wherein the body has an input surface and an output surface, and a cooler configured to cool the input surface and/or the output surface. An exposure apparatus having a programmable patterning device that comprises a plurality of radiation emitters, configured to provide a plurality of radiation beams; and a projection system, comprising a stationary part and a moving part, configured to project the plurality of radiation beams onto locations on a target that are selected based on a pattern, wherein at least one of the radiation emitters comprises a waveguide configured to output a radiation beam that comprises unpolarized and/or circularly polarized radiation.

    Abstract translation: 一种具有波导形成的波导的器件，所述波导由穿过所述波导的辐射透明的材料的连续体形成，其中所述主体具有输入表面和输出表面，以及冷却器，被配置为冷却所述输入表面和/或输出表面 。 一种具有可编程图案形成装置的曝光装置，包括多个辐射发射器，被配置为提供多个辐射束; 以及投影系统，包括固定部分和移动部分，其被配置为将所述多个辐射束投影到基于图案被选择的目标上的位置上，其中所述辐射发射器中的至少一个包括波导，所述波导被配置为输出 包括非偏振和/或圆偏振辐射的辐射束。

    LITHOGRAPHIC APPARATUS, METHOD FOR MAINTAINING A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    8.
    发明申请
    LITHOGRAPHIC APPARATUS, METHOD FOR MAINTAINING A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
    平面设备，维护平板设备的方法和设备制造方法

    公开(公告)号：WO2012143188A1

    公开(公告)日：2012-10-26

    申请号：PCT/EP2012/054736

    申请日：2012-03-16

    Applicant: ASML Netherlands B.V. ,  BLEEKER, Arno ,  HOEKS, Martinus ,  CADEE, Theodorus

    Inventor： BLEEKER, Arno ,  HOEKS, Martinus ,  CADEE, Theodorus

    IPC: G03F7/20

    CPC classification number: G03F7/70133 ,  G03F7/70391 ,  G03F7/70975

    Abstract: A lithographic apparatus having a plurality of individually controllable radiation source units each providing a portion of a patterned beam of radiation, a control system configured to monitor a parameter of performance of each of the individually controllable radiation source units, and a replacement mechanism configured to replace one of the individually controllable radiation source units with a replacement unit when the control system determines that a criterion has been met based on the monitored parameter of performance.

    Abstract translation: 一种光刻设备，具有多个可单独控制的辐射源单元，每个辐射源单元各自提供图案化辐射束的一部分，被配置为监测每个独立可控辐射源单元的性能参数的控制系统，以及配置成替换 当控制系统基于所监视的性能参数确定已经满足标准时，具有替换单元的单独可控的辐射源单元之一。

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