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    RADIATION SOURCE AND METHOD FOR LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    3.
    发明申请
    RADIATION SOURCE AND METHOD FOR LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
    放射源和方法用于光刻设备和器件制造方法

    公开(公告)号：WO2013020758A1

    公开(公告)日：2013-02-14

    申请号：PCT/EP2012/063019

    申请日：2012-07-04

    Applicant: ASML NETHERLANDS B.V. ,  LOOPSTRA, Erik ,  DIJKSMAN, Johan

    Inventor： LOOPSTRA, Erik ,  DIJKSMAN, Johan

    IPC: H05G2/00

    CPC classification number: H05G2/003 ,  B05B1/086 ,  B05B1/24 ,  B05B17/0607 ,  H05G2/005 ,  H05G2/006

    Abstract: A radiation source for generating EUV from a stream of molten fuel droplets by LPP (Laser Produced Plasma) or (Dual Laser Plasma) has a fuel droplet generator arranged to provide a stream of droplets of fuel (314) and at least one laser configured to vaporize at least some of the droplets of fuel, whereby radiation is generated. The fuel droplet generator has a nozzle (301), a feed chamber, and a reservoir (303), with a pumping device arranged to supply a flow of fuel in molten state from the reservoir through the feed chamber and out of the nozzle as a stream of droplets. The feed chamber has an outer face in contact with a drive cavity (310) filled with a liquid, and the liquid is driven to oscillate by a vibrator (311) with the oscillation transmissible to the molten fuel in the feed chamber from the outer face of the feed chamber through the liquid. The arrangement permits oscillatory driving of a nozzle feed chamber to control fuel stream breakup into droplets without need for direct contact between a vibrator and the fuel nozzle feed chamber. This may reduce risk of loss of transmission from vibrator to feed chamber through contact failure and may allow for remote positioning of the vibrator at a cooled location for efficient operation.

    Abstract translation: 用于通过LPP（激光产生等离子体）或（双激光等离子体）从熔融燃料液滴流产生EUV的辐射源具有燃料液滴发生器，其布置成提供燃料液滴（314）和至少一个激光器，其配置成 蒸发至少一些燃料液滴，从而产生辐射。 燃料液滴发生器具有喷嘴（301），进料室和储存器（303），其中泵送装置被布置成将熔融状态的燃料流从储存器通过进料室提供出来并作为喷嘴 液滴流。 进料室具有与填充有液体的驱动腔（310）接触的外表面，并且液体被振动器（311）驱动振荡，振动器（311）可从外表面传送到进料室中的熔融燃料 的进料室通过液体。 该布置允许喷嘴进料室的振荡驱动以将燃料流分解成液滴，而不需要振动器和燃料喷嘴进料室之间的直接接触。 这可以降低通过接触故障从振动器传递到进料室的损失的风险，并且可以允许将振动器远程定位在冷却的位置以进行有效的操作。

    PROJECTION SYSTEM AND LITHOGRAPHIC APPARATUS
    4.
    发明申请
    PROJECTION SYSTEM AND LITHOGRAPHIC APPARATUS 审中-公开
    投影系统和平面设备

    公开(公告)号：WO2010037575A1

    公开(公告)日：2010-04-08

    申请号：PCT/EP2009/059222

    申请日：2009-07-17

    Applicant: ASML Netherlands B.V. ,  LOOPSTRA, Erik ,  DE BOEIJ, Wilhelmus ,  BUTLER, Hans ,  DE JONGH, Robertus ,  VAN SCHOOT, Jan ,  SENGERS, Timotheus ,  WIJCKMANS, Maurice ,  JANSSEN, Franciscus

    Inventor： LOOPSTRA, Erik ,  DE BOEIJ, Wilhelmus ,  BUTLER, Hans ,  DE JONGH, Robertus ,  VAN SCHOOT, Jan ,  SENGERS, Timotheus ,  WIJCKMANS, Maurice ,  JANSSEN, Franciscus

    IPC: G03F7/20

    CPC classification number: G03F7/70891 ,  G03F7/70258 ,  G03F7/70825

    Abstract: A projection system (PS) is provided which includes, in an embodiment, two frames. The optical elements of the projection system are mounted on a first frame (200). The position of the optical elements is measured relative to a second frame (300) using a first measurement system (910). A second measurement system (920) is used to measure a parameter associated with a deformation of the second frame. The measurement made by the second measurement system can be used to compensate for any errors in the position of the optical elements as measured by the first measurement system resulting from deformations of the second frame. Typically, deformations of the frames are due to resonant oscillation and thermal expansion. Having two frames enables the optical elements of the projection system to be positioned with a high degree of accuracy. Optionally, a temperature control system (780, 790) may be provided to drive the temperature of at least one of the frames back to a desired value after the lithographic apparatus has been taken off line.

    Abstract translation: 提供了一种投影系统（PS），在一个实施例中包括两个帧。 投影系统的光学元件安装在第一框架（200）上。 使用第一测量系统（910）相对于第二框架（300）测量光学元件的位置。 第二测量系统（920）用于测量与第二帧的变形相关联的参数。 由第二测量系统进行的测量可用于补偿由第二框架的变形引起的由第一测量系统测量的光学元件位置的任何误差。 通常，框架的变形是由于共振振荡和热膨胀。 具有两个框架使得投影系统的光学元件能够以高精确度定位。 可选地，可以提供温度控制系统（780,790），以在光刻设备已经离线之后将至少一个框架的温度恢复到期望值。

    FREE ELECTRON LASER
    5.
    发明申请
    FREE ELECTRON LASER 审中-公开
    免费电子激光

    公开(公告)号：WO2015067467A1

    公开(公告)日：2015-05-14

    申请号：PCT/EP2014/072588

    申请日：2014-10-22

    Applicant: ASML NETHERLANDS B.V.

    Inventor： AKKERMANS, Johannes, ,  AMENT, Lucas ,  BANINE, Vadim ,  COENEN, Teis, Johan ,  DE JAGER, Pieter ,  DE VRIES, Gosse ,  FRIJNS, Olav ,  GRIMMINCK, Leonardus ,  KATALENIC, Andelko ,  LOOPSTRA, Erik ,  LUITEN, Otger ,  NIKIPELOV, Andrey

    IPC: H01S3/09 ,  H05H9/00 ,  H01J25/12 ,  H01J23/027 ,  H05H7/12

    CPC classification number: H01S3/0903 ,  G03F7/70208 ,  H01J23/027 ,  H01J25/10 ,  H05H9/00

    Abstract: A free electron laser comprising: an electron source (21), a linear accelerator (22), an undulator (26), electron beam optics and a deceleration unit (28'). The electron source is operable to produce a bunched electron beam. The linear accelerator arranged to impart energy to electrons in the bunched electron beam produced by the electron source. The undulator is operable to produce a periodic magnetic field and is arranged so as to guide the bunched electron beam along a periodic path about a central axis of the undulator such that they interact with radiation in the undulator, stimulating emission of coherent radiation. The electron beam optics is arranged to direct the bunched electron beam back into the linear accelerator after it leaves the undulator so as to extract energy from electrons in the bunched electron beam. The deceleration unit is arranged to extract energy from electrons in the bunched electron beam after it has left the undulator. The deceleration unit comprises one or more resonant cavities (33), and an energy dissipation mechanism. The bunched electron beam is directed through the one or more resonant cavities so as to excite one or more resonant standing wave modes therein.

    Abstract translation: 一种自由电子激光器，包括：电子源（21），线性加速器（22），波动器（26），电子束光学器件和减速单元（28'）。 电子源可操作以产生聚束电子束。 线性加速器被布置成赋予由电子源产生的聚束电子束中的电子能量。 波动器可操作以产生周期性磁场，并且被布置成引导聚束电子束沿着围绕波动器的中心轴线的周期性路径，使得它们与波动器中的辐射相互作用，刺激相干辐射的发射。 电子束光学器件被布置成在聚束束电子束离开波束器之后将聚束电子束引导回线性加速器，以便从束电子束中的电子提取能量。 减速单元被布置成在束状电子束离开波动器之后从电子束中的电子提取能量。 减速单元包括一个或多个谐振腔（33）和能量耗散机构。 聚束电子束被引导通过一个或多个谐振腔，以激发其中的一个或多个共振驻波模式。

    CHUCK, LITHOGRAPHY APPARATUS AND METHOD OF USING A CHUCK
    6.
    发明申请
    CHUCK, LITHOGRAPHY APPARATUS AND METHOD OF USING A CHUCK 审中-公开
    CHUCK，LITHOGRAPHY APPARATUS AND METHOD OF USING CHUCK

    公开(公告)号：WO2013050243A1

    公开(公告)日：2013-04-11

    申请号：PCT/EP2012/068386

    申请日：2012-09-19

    Applicant: ASML NETHERLANDS B.V.

    Inventor： GILISSEN, Noud ,  LOOPSTRA, Erik ,  SIJBEN, Anko ,  CORNELISSEN, Bas ,  VAN SCHOOT, Jan ,  NOTENBOOM, Arnoud ,  VAN DER WILK, Ronald

    IPC: G03F7/20

    CPC classification number: G03F7/70708 ,  G03F7/707 ,  G03F7/70875 ,  G03F7/70908 ,  G10L15/08 ,  G10L2015/223 ,  H01L21/6831

    Abstract: A chuck, chuck control system, lithographic apparatus and method of using a chuck are disclosed. In an embodiment, there is provided a chuck (43) for use in holding a patterning device (MA) or a substrate (W) onto a supporting table (MT, WT) of a lithography apparatus (100) by electrostatic force, in which the patterning device is for imparting a radiation beam (B) with a pattern in its cross-section to form a patterned radiation beam, and the substrate is for receiving the patterned radiation beam; said chuck comprising: a dielectric member (45); a temperature conditioning fluid channel (48) formed within the chuck; a drive electrode (40, 42) for applying a potential difference between the drive electrode and the patterning device or substrate across the dielectric member in order to electrostatically attract the patterning device or substrate towards the drive electrode; and a first shield electrode (60) for reducing or preventing the development of an electric field across temperature conditioning fluid in the temperature conditioning fluid channel due to a voltage applied to the drive electrode, in order to reduce or prevent electrolysis in the fluid.

    Abstract translation: 公开了一种卡盘，卡盘控制系统，光刻设备和使用卡盘的方法。 在一个实施例中，提供了一种用于通过静电力将图案形成装置（MA）或基板（W）保持在光刻设备（100）的支撑台（MT，WT）上的卡盘，其中 图案形成装置用于在其横截面中赋予具有图案的辐射束（B）以形成图案化的辐射束，并且该衬底用于接收图案化的辐射束; 所述卡盘包括：电介质构件（45）; 形成在卡盘内的温度调节流体通道（48） 用于在驱动电极和图案形成装置或基板之间跨越电介质构件施加电位差的驱动电极（40,42），以便静电地将图案形成装置或衬底吸引到驱动电极; 以及第一屏蔽电极（60），用于减少或防止由于施加到驱动电极的电压而在温度调节流体通道中的温度调节流体的电场的发展，以便减少或防止流体中的电解。

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