公开(公告)号：WO2014082938A1

公开(公告)日：2014-06-05

申请号：PCT/EP2013/074516

申请日：2013-11-22

Applicant: ASML NETHERLANDS B.V.

Inventor： VANOPPEN, Peter ,  BROUWER, Eric ,  CRAMER, Hugo ,  DEN BESTEN, Jan ,  ENGELEN, Adrianus ,  HINNEN, Paul

IPC: G03F7/20

CPC classification number: G03F7/70058 ,  G01N21/4738 ,  G03F7/70558 ,  G03F7/70625 ,  G03F7/70641 ,  G03F7/70683

Abstract: A method of determining exposure dose of a lithographic apparatus used in a lithographic process on a substrate. Using the lithographic process to produce a first structure on the substrate, the first structure having a dose-sensitive feature which has a form that depends on exposure dose of the lithographic apparatus on the substrate. Using the lithographic process to produce a second structure on the substrate, the second structure having a dose-sensitive feature which has a form that depends on the exposure dose of the lithographic apparatus but which has a different sensitivity to the exposure dose than the first structure. Detecting scattered radiation while illuminating the first and second structures with radiation to obtain first and second scatterometer signals. Using the first and second scatterometer signals to determine an exposure dose value used to produce at least one of the first and second structures.

Abstract translation: 一种确定在光刻工艺中使用的光刻设备在衬底上的曝光剂量的方法。 使用光刻工艺在衬底上产生第一结构，第一结构具有剂量敏感特征，其具有取决于光刻设备在衬底上的曝光剂量的形式。 使用光刻工艺在衬底上产生第二结构，第二结构具有剂量敏感特征，其具有取决于光刻设备的曝光剂量但与第一结构具有不同于曝光剂量的灵敏度的形式 。 检测散射辐射，同时用辐射照射第一和第二结构，以获得第一和第二散射仪信号。 使用第一和第二散射仪信号来确定用于产生第一和第二结构中的至少一个的曝光剂量值。

公开(公告)号：WO2010049348A2

公开(公告)日：2010-05-06

申请号：PCT/EP2009/063918

申请日：2009-10-22

Applicant: ASML Netherlands B.V. ,  LEEWIS, Christian ,  VAN DE KERKHOF, Marcus ,  VAN DER MAST, Karel ,  VANOPPEN, Peter ,  ALVAREZ SANCHEZ, Ruben

Inventor： LEEWIS, Christian ,  VAN DE KERKHOF, Marcus ,  VAN DER MAST, Karel ,  VANOPPEN, Peter ,  ALVAREZ SANCHEZ, Ruben

IPC: G03F7/20

CPC classification number: G03F7/70625

Abstract: In a method for determining one or more properties of a substrate, scatterometry spectra can be measured from one or more targets on the substrate. Reconstructions of each of said spectra can be performed to derive one or more values for the property of the substrate, by comparing representations of each of the measured spectra with one or more modeled representations of spectra calculated using variable parameter values. At least one parameter in the reconstruction for each spectrum can be linked to the value of the parameter used in the reconstruction for a different spectrum.

Abstract translation: 在确定衬底的一个或多个特性的方法中，可以从衬底上的一个或多个靶测量散射光谱。 可以通过将每个测量光谱的表示与使用可变参数值计算的光谱的一个或多个建模表示进行比较，来执行每个所述光谱的重建以导出衬底性质的一个或多个值。 每个频谱的重建中至少有一个参数可以链接到在不同频谱的重构中使用的参数的值。