公开(公告)号：WO2015062921A1

公开(公告)日：2015-05-07

申请号：PCT/EP2014/072590

申请日：2014-10-22

Applicant: ASML NETHERLANDS B.V.

Inventor： BUTLER, Hans ,  DE HOON, Cornelius, Adrianus, Lambertus ,  VAN DER WIJST, Marc, Wilhelmus, Maria ,  VERHEES, Thijs ,  KERSSEMAKERS, Sander

IPC: G03F7/20

CPC classification number: G03F7/70775 ,  G03F7/70766 ,  G03F7/70833 ,  G03F7/709

Abstract: A lithographic apparatus (300) includes: a base frame (50); an illumination system (310) configured to condition a radiation beam and supported by the base frame; a support (320) constructed to support a patterning device (350), the patterning device being capable of imparting the radiation beam with a pattern in its cross- section to form a patterned radiation beam; a substrate table (100.2, 100.3) constructed to hold a substrate (110); a projection system (340) configured to project the patterned radiation beam onto a target portion of the substrate; a positioning device (100) configured to position the substrate table, the positioning device being supported by the base frame; a sensor (395) configured to sense a vibration caused by a torque exerted on the base frame and, an actuator configured to exert a force on the illumination system or the base frame, in response to the sensed vibration, in order to at least partly dampen the vibration.

Abstract translation: 光刻设备（300）包括：基架（50）; 照明系统（310），被配置为调节辐射束并由所述基架支撑; 构造成支撑图案形成装置（350）的支撑件（320），所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 构造成保持衬底（110）的衬底台（100.2,100.3）; 投影系统（340），被配置为将所述图案化的辐射束投影到所述基板的目标部分上; 定位装置（100），其被配置为定位所述基板台，所述定位装置由所述基架支撑; 传感器（395），其被配置为感测由施加在所述基座框架上的扭矩引起的振动;以及致动器，其被配置为响应于所感测到的振动而对所述照明系统或所述基座框架施加力，以便至少部分地 抑制振动。