公开(公告)号：WO2009144218A1

公开(公告)日：2009-12-03

申请号：PCT/EP2009/056365

申请日：2009-05-26

Applicant: ASML NETHERLANDS B.V. ,  SEIJGER, Olav ,  KOK, Martinus ,  KERSSEMAKERS, Sander ,  MAGIELSEN, Mark

Inventor： SEIJGER, Olav ,  KOK, Martinus ,  KERSSEMAKERS, Sander ,  MAGIELSEN, Mark

IPC: G03F7/20 ,  H01L21/687

CPC classification number: G03F7/70766

Abstract: A substrate table positioning device that is supported by four bearing elements is provided. The substrate table positioning device also includes a balance mass. Two of the bearing elements support the base frame in such a way that they can move in a vertical direction independently of the other bearing elements. This can be achieved by using a hinge. This structure of substrate table positioning device has a higher lowest Eigen frequency of oscillation than that of substrate table positioning devices supported by three bearing elements. As such, the balance mass is not excited by typical vibrations that occur in the lithographic apparatus. This enables better positional control of the substrate table. It also enables at least some of the dimensions of the frame elements of the balance mass to be reduced.

Abstract translation: 提供由四个轴承元件支撑的基板台定位装置。 基板台定位装置还包括平衡块。 两个轴承元件以这样的方式支撑底架，使得它们可以独立于其它轴承元件在垂直方向上移动。 这可以通过使用铰链来实现。 衬底台定位装置的这种结构具有比由三个轴承元件支撑的衬底台定位装置更低的本征振荡频率。 因此，平衡质量不受在光刻设备中发生的典型振动的激发。 这使得能够更好地对衬底台进行位置控制。 它还使平衡块的框架元件的至少一些尺寸得以减小。

公开(公告)号：WO2015197260A1

公开(公告)日：2015-12-30

申请号：PCT/EP2015/060618

申请日：2015-05-13

Applicant: ASML NETHERLANDS B.V.

Inventor： BASELMANS, Johannes, Jacobus, Matheus ,  BUTLER, Hans ,  HOOGENDAM, Christiaan, Alexander ,  KERSSEMAKERS, Sander ,  SMEETS, Bart ,  VAN BALLEGOIJ, Robertus, Nicodemus, Jacobus ,  VAN BUSSEL, Hubertus, Petrus, Leonardus, Henrica

IPC: G03F7/20 ,  G02B13/14

CPC classification number: G03F7/70258 ,  G03F7/70066 ,  G03F7/70141 ,  G03F7/70641

Abstract: A method of modifying a lithographic apparatus comprising an illumination system for providing a radiation beam, a support structure for supporting a patterning device to impart the radiation beam with a pattern in its cross-section, a first lens for projecting the radiation beam at the patterning device with a first magnification, a substrate table for holding a substrate, and a first projection system for projecting the patterned radiation beam at a target portion of the substrate with a second magnification. The first lens and the first projection system together provide a third magnification. The method comprises reducing by a first factor the first magnification to provide a second lens for projecting the radiation beam with a fourth magnification; and increasing by the first factor the second magnification to provide a second projection system for projecting the patterned radiation beam at the target portion of the substrate with a fifth magnification.

Abstract translation: 一种修改包括用于提供辐射束的照明系统的光刻设备的方法，用于支撑图案形成装置以将辐射束赋予其横截面图案的支撑结构，用于将辐射束投射在图案化处的第一透镜 具有第一放大率的装置，用于保持基板的基板台，以及用于以第二倍率将图案化的辐射束投影在基板的目标部分的第一投影系统。 第一透镜和第一投影系统一起提供第三放大率。 该方法包括以第一因子减小第一倍率以提供用于以第四放大率投影辐射束的第二透镜; 并且通过第一因子增加第二倍率以提供第二投影系统，用于以第五放大率将图案化的辐射束投影到基板的目标部分。

公开(公告)号：WO2015185320A1

公开(公告)日：2015-12-10

申请号：PCT/EP2015/060096

申请日：2015-05-07

Applicant: ASML NETHERLANDS B.V.

Inventor： NAKIBOGLU, Günes ,  BAGGEN, Mark, Constant, Johannes ,  BOOGAARD, Gerard, Johannes ,  COX, Henrikus, Herman, Marie ,  KEMPER, Nicolaas, Rudolf ,  KERSSEMAKERS, Sander ,  RIJS, Robertus, Mathijs, Gerardus ,  VAN BOXTEL, Frank, Johannes, Jacobus ,  VAN DEN BOOGAERT, Erwin, Antonius, Henricus, Franciscus ,  VAN DER WIJST, Marc, Wilhelmus, Maria ,  VAN DUIJNHOVEN, Martinus ,  VERDONSCHOT, Jessica, Henrica, Anna

IPC: G03F7/20

CPC classification number: G03F7/709 ,  G10K11/16 ,  G10K11/168 ,  G10K11/172

Abstract: A lithographic apparatus has a compartment which accommodates a movable object. Movements of the movable object cause acoustic disturbances in the compartment. An acoustic damper is arranged to damp the acoustic disturbances in the compartment and comprises a chamber (100) in communication with the compartment and a perforated plate (101), having a plurality of through-holes (102), between the chamber and the compartment.

Abstract translation: 光刻设备具有容纳可移动物体的隔间。 可移动物体的运动引起隔室中的声学干扰。 声阻尼器布置成阻尼隔室中的声学干扰，并且包括与隔室连通的腔室（100）和多孔板（101），其具有多个通孔（102），位于腔室和隔间 。

公开(公告)号：WO2015062921A1

公开(公告)日：2015-05-07

申请号：PCT/EP2014/072590

申请日：2014-10-22

Applicant: ASML NETHERLANDS B.V.

Inventor： BUTLER, Hans ,  DE HOON, Cornelius, Adrianus, Lambertus ,  VAN DER WIJST, Marc, Wilhelmus, Maria ,  VERHEES, Thijs ,  KERSSEMAKERS, Sander

IPC: G03F7/20

CPC classification number: G03F7/70775 ,  G03F7/70766 ,  G03F7/70833 ,  G03F7/709

Abstract: A lithographic apparatus (300) includes: a base frame (50); an illumination system (310) configured to condition a radiation beam and supported by the base frame; a support (320) constructed to support a patterning device (350), the patterning device being capable of imparting the radiation beam with a pattern in its cross- section to form a patterned radiation beam; a substrate table (100.2, 100.3) constructed to hold a substrate (110); a projection system (340) configured to project the patterned radiation beam onto a target portion of the substrate; a positioning device (100) configured to position the substrate table, the positioning device being supported by the base frame; a sensor (395) configured to sense a vibration caused by a torque exerted on the base frame and, an actuator configured to exert a force on the illumination system or the base frame, in response to the sensed vibration, in order to at least partly dampen the vibration.

Abstract translation: 光刻设备（300）包括：基架（50）; 照明系统（310），被配置为调节辐射束并由所述基架支撑; 构造成支撑图案形成装置（350）的支撑件（320），所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 构造成保持衬底（110）的衬底台（100.2,100.3）; 投影系统（340），被配置为将所述图案化的辐射束投影到所述基板的目标部分上; 定位装置（100），其被配置为定位所述基板台，所述定位装置由所述基架支撑; 传感器（395），其被配置为感测由施加在所述基座框架上的扭矩引起的振动;以及致动器，其被配置为响应于所感测到的振动而对所述照明系统或所述基座框架施加力，以便至少部分地 抑制振动。

公开(公告)号：WO2021121814A1

公开(公告)日：2021-06-24

申请号：PCT/EP2020/082053

申请日：2020-11-13

Applicant: ASML NETHERLANDS B.V.

Inventor： KERSSEMAKERS, Sander ,  LANSBERGEN, Robert, Gabriël, Maria ,  LEENDERS, Martinus, Hendrikus, Antonius ,  TEGENBOSCH, Henricus, Gerardus

IPC: G03F7/20 ,  H05G2/00 ,  G03F7/70033 ,  G03F7/70808 ,  G03F7/70841 ,  G03F7/70925 ,  G03F7/70975 ,  H05G2/005 ,  H05G2/008

Abstract: A vessel (16) for an EUV radiation source, the vessel comprising a first opening (30) for accessing an interior (32) of the vessel, a first access member (34) configured to allow or prevent access to the interior of the vessel through the first opening, a second opening (36) for accessing the interior of the vessel, the second opening being arranged in the first access member and a second access member (38) arranged on the first access member and configured to allow or prevent access to the interior of the vessel through the second opening.

公开(公告)号：WO2016005117A1

公开(公告)日：2016-01-14

申请号：PCT/EP2015/062504

申请日：2015-06-04

Applicant: ASML NETHERLANDS B.V.

Inventor： KERSSEMAKERS, Sander ,  DE BOEIJ, Wilhelmus, Petrus ,  DE LANGE, Gerben, Frank ,  HOOGENDAM, Christiaan, Alexander ,  VAN GILS, Petrus, Franciscus ,  KAMMINGA, Jelmer, Mattheüs ,  KUIT, Jan Jaap ,  SCHOORMANS, Carolus, Johannes, Catharina

IPC: G03F7/20 ,  G03F1/00

CPC classification number: G03F7/70425 ,  G03F7/70433 ,  G03F7/707 ,  G03F7/70716

Abstract: A lithographic apparatus comprising a support structure configured to be moved by a first scan distance during a single scanning operation when supporting a patterning device having a first extent in the scanning direction and to be moved by a second scan distance during a single scanning operation when supporting a patterning device having a second extent in the scanning direction, and a substrate table configured to be moved by a third scan distance during a single scanning operation when the support structure supports a patterning device having the first extent in the scanning direction and to be moved by a fourth scan distance during a single scanning operation when the support structure supports a patterning device having the second extent in the scanning direction.

Abstract translation: 一种光刻设备，包括支撑结构，该支撑结构构造成在单次扫描操作期间，当在单次扫描操作期间支撑具有第一扫描方向的扫描距离的图案形成装置时，在单次扫描操作期间移动第一扫描距离， 在扫描方向上具有第二范围的图案形成装置以及在单次扫描操作期间被移动第三扫描距离的基板台，当支撑结构支撑具有在扫描方向上具有第一范围的图案形成装置并被移动时 当支撑结构支撑具有在扫描方向上的第二范围的图案形成装置时，在单次扫描操作期间第四扫描距离。

公开(公告)号：WO2009150031A1

公开(公告)日：2009-12-17

申请号：PCT/EP2009/056300

申请日：2009-05-25

Applicant: ASML NETHERLANDS B.V. ,  SEIJGER, Olav ,  KOK, Martinus ,  KERSSEMAKERS, Sander ,  MAGIELSEN, Mark

Inventor： SEIJGER, Olav ,  KOK, Martinus ,  KERSSEMAKERS, Sander ,  MAGIELSEN, Mark

IPC: G03F7/20 ,  G01N21/95

CPC classification number: G03F7/70766 ,  G03F7/70608

Abstract: An inspection apparatus for measuring a property of a substrate (W), includes a base frame, a substrate table (51) to hold the substrate, an illumination system arranged to direct a beam of radiation onto the substrate and a sensor arranged to detect radiation reflected off the substrate. Two balanced positioning systems displace the substrate table and sensor relative to the base frame in several directions. Each balanced positioning system includes a balance mass (59, 61), a bearing arrangement (65) to movably support the balance mass and tracks effective to guide the displacement in each direction. A motor arrangement causes the displacement in each direction. The balance mass is positioned relative to the track arrangement such that the centers of gravity of each balance mass and the substrate table or the sensor are substantially aligned in the direction substantially perpendicular to the plane including the direction of displacement.

Abstract translation: 一种用于测量基板（W）的性质的检查装置，包括基架，用于保持基板的基板台（51），布置成将辐射束引导到基板上的照明系统和布置成检测辐射的传感器 反射出底物。 两个平衡定位系统使基板台和传感器相对于基架在几个方向上移位。 每个平衡定位系统包括平衡块（59,61），可移动地支撑平衡块的轨道装置（65）和有效地引导每个方向上的位移的轨迹。 马达装置引起各方向的位移。 平衡质量相对于轨道装置定位，使得每个平衡块和基板台或传感器的重心在基本垂直于包括位移方向的平面的方向上基本对准。

公开(公告)号：WO2009132800A1

公开(公告)日：2009-11-05

申请号：PCT/EP2009/002959

申请日：2009-04-23

Applicant: ASML NETHERLANDS B.V. ,  SEIJGER, Olav, Johannes ,  KOK, Martinus, Joseph ,  KERSSEMAKERS, Sander

Inventor： SEIJGER, Olav, Johannes ,  KOK, Martinus, Joseph ,  KERSSEMAKERS, Sander

IPC: G03F7/20 ,  H01L21/687

CPC classification number: G03F7/707 ,  H01L21/68742

Abstract: A substrate support, configured to support a substrate during a process within a lithography system, includes a lifting structure configured to move the substrate between a first position, in which a lifting face of the lifting structure supports the substrate at a position set apart from a support surface of the substrate support, and a second position, in which the lifting structure does not prevent the substrate from being supported by a support surface of the substrate support; wherein, in moving between the first and second positions, the substrate moves in a combination of movement substantially perpendicular to a plane parallel to the support surface and movement substantially parallel to the support surface.

Abstract translation: 衬底支撑件，被配置为在光刻系统内的工艺期间支撑衬底，包括提升结构，其构造成将衬底移动到第一位置，在第一位置处，提升结构的提升面在与第一位置分离的位置处支撑衬底 所述基板支撑件的支撑表面和第二位置，其中所述提升结构不阻止所述基板由所述基板支撑件的支撑表面支撑; 其中，在所述第一位置和所述第二位置之间移动时，所述基板以基本上垂直于平行于所述支撑表面的平面的运动和基本上平行于所述支撑表面的移动的组合移动。

公开(公告)号：EP4202447A1

公开(公告)日：2023-06-28

申请号：EP21217592.1

申请日：2021-12-23

Applicant: ASML Netherlands B.V.

Inventor： DERKS, Sander, Catharina, Reinier ,  RIJPMA, Albert, Pieter ,  BESSEMS, David ,  KERSSEMAKERS, Sander

IPC: G01P13/00 ,  G01F1/68 ,  G03F7/20 ,  H05G2/00

Abstract: There is described a liquid metal supply assembly for use in an EUV light source, the assembly comprising: a) a first reservoir configured to hold liquid metal at a first temperature; b) a liquid metal transportation conduit in fluid communication with the first reservoir wherein the liquid metal transportation conduit is configured to be at a second temperature different to the first temperature; c) a temperature sensor configured to measure the temperature of the liquid metal transportation conduit to detect a flow of liquid from the first reservoir through the liquid metal transportation conduit via a change in temperature of the liquid metal transportation conduit. Also described is an EUV light source, a method of detecting flow of a liquid metal, as well as the use thereof.