公开(公告)号：WO2019038054A1

公开(公告)日：2019-02-28

申请号：PCT/EP2018/071059

申请日：2018-08-02

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN WITTEVEEN, Koen ,  WANG, Wei-Chun ,  TURNER, Paul, Jonathan ,  MC NAMARA, Elliott, Gerard ,  MICELI, Giacomo

IPC: G03F7/20

Abstract: A method of determining a parameter of a pattern transfer process and device manufacturing methods are disclosed. In one arrangement, a method comprises obtaining a detected representation of radiation redirected by a structure. The structure is a structure formed by applying a pattern processing to a pattern transferred to an earlier formed structure by a pattern transfer process. The pattern processing is such as to remove one or more selected regions in a horizontal plane of the earlier formed structure to form a pattern in the horizontal plane. The pattern is defined by a unit cell that is mirror symmetric with respect to an axis of mirror symmetry. An asymmetry in the detected representation is determined. The determined asymmetry in the detected representation is used to determine a parameter of the pattern transfer process.

公开(公告)号：WO2019038054A9

公开(公告)日：2019-02-28

申请号：PCT/EP2018/071059

申请日：2018-08-02

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN WITTEVEEN, Koen ,  WANG, Wei-Chun ,  TURNER, Paul, Jonathan ,  MC NAMARA, Elliott, Gerard ,  MICELI, Giacomo

IPC: G03F7/20

Abstract: A method of determining a parameter of a pattern transfer process and device manufacturing methods are disclosed. In one arrangement, a method comprises obtaining a detected representation of radiation redirected by a structure. The structure is a structure formed by applying a pattern processing to a pattern transferred to an earlier formed structure by a pattern transfer process. The pattern processing is such as to remove one or more selected regions in a horizontal plane of the earlier formed structure to form a pattern in the horizontal plane. The pattern is defined by a unit cell that is mirror symmetric with respect to an axis of mirror symmetry. An asymmetry in the detected representation is determined. The determined asymmetry in the detected representation is used to determine a parameter of the pattern transfer process.