公开(公告)号：US20200209736A1

公开(公告)日：2020-07-02

申请号：US16614815

申请日：2018-06-08

Applicant: ASML NETHERLANDS B.V.

Inventor： David Ferdinand VLES ,  Chaitanya Krishna ANDE ,  Antonius Franciscus Johannes DE GROOT ,  Adrianus Johannes Maria GIESBERS ,  Johannes Joseph JANSSEN ,  Paul JANSSEN ,  Johan Flendrik KLOOTWIJK ,  Peter Simon Antonius KNAPEN ,  Evgenia KURGANOVA ,  Marcel Peter MEIJER ,  Wouter Rogier MEIJERINK ,  Maxim Aleksandrovich NASALEVICH ,  Arnoud Willem NOTENBOOM ,  Raymond OLSMAN ,  Hrishikesh PATEL ,  Maria PETER ,  Gerrit VAN DEN BOSCH ,  Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN ,  Willem Joan VAN DER ZANDE ,  Pieter-Jan VAN ZWOL ,  Johannes Petrus Martinus Bernardus VERMEULEN ,  Willem-Pieter VOORTHUIJZEN ,  Hendrikus Jan WONDERGEM ,  Aleksandar Nikolov ZDRAVKOV

IPC: G03F1/64 ,  G03F7/20

Abstract: A pellicle assembly is disclosed that has a pellicle frame defining a surface onto which a pellicle is to be attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. There is also disclosed a pellicle assembly for a patterning device, the pellicle assembly including one or more actuators for moving the pellicle assembly towards and way from the patterning device.

公开(公告)号：US20180364584A1

公开(公告)日：2018-12-20

申请号：US15781813

申请日：2016-11-02

Applicant: ASML NETHERLANDS B.V.

Inventor： Daan Daniel Johannes Antonius VAN SOMMEREN ,  Coen Hubertus Matheus BALTIS ,  Harold Sebastiaan BUDDENBERG ,  Giovanni Luca GATTOBIGIO ,  Johannes Cornelis Paulus MELMAN ,  Günes NAKIBOGLU ,  Theodorus Wilhelmus POLET ,  Walter Theodorus Matheus STALS ,  Yuri Johannes Gabriël VAN DE VIJVER ,  Josephus Peter VAN LIESHOUT ,  Jorge Alverto VIEYRA SALAS ,  Aleksandar Nikolov ZDRAVKOV

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70716

Abstract: A substrate table configured to support a substrate for exposure in an immersion lithographic apparatus, the substrate table including: a support body having a support surface configured to support the substrate; and a cover ring fixed relative to the support body and configured to surround, in plan view, the substrate supported on the support surface, wherein the cover ring has an upper surface, wherein at least a portion of the upper surface is configured so as to alter the stability of a meniscus of immersion liquid when moving along the upper surface towards the substrate.

公开(公告)号：US20240004283A1

公开(公告)日：2024-01-04

申请号：US18227833

申请日：2023-07-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Maxim Aleksandrovich Nasalevich ,  Erik Achilles ABEGG ,  Nirupam BANERJEE ,  Michiel Alexander BLAUW ,  Derk Servatius Gertruda BROUNS ,  Paul JANSSEN ,  Matthias KRUIZINGA ,  Egbert LENDERINK ,  Nicolae MAXIM ,  Andrey NIKIPELOV ,  Arnoud Willem NOTENBOOM ,  Claudia PILIEGO ,  Mária PÉTER ,  Gijsbert RISPENS ,  Nadja SCHUH ,  Marcus Adrianus VAN DE KERKHOF ,  Willem Joan VAN DER ZANDE ,  Pieter-Jan VAN ZWOL ,  Antonius Willem VERBURG ,  Johannes Petrus Martinus Bernardus VERMEULEN ,  David Ferdinand VLES ,  Willem-Pieter VOORTHUIJZEN ,  Aleksandar Nikolov ZDRAVKOV

IPC: G03F1/62 ,  G03F7/00 ,  G03F1/82 ,  G02B5/20 ,  G02B5/28

CPC classification number: G03F1/62 ,  G03F7/70191 ,  G03F7/70983 ,  G03F1/82 ,  G03F7/70916 ,  G03F7/70958 ,  G03F7/70575 ,  G02B5/208 ,  G02B5/283

Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane has a stack having layers in the following order: a first capping layer including an oxide of a first metal; a base layer including a compound having a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer including an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.

公开(公告)号：US20220121111A1

公开(公告)日：2022-04-21

申请号：US17548944

申请日：2021-12-13

Applicant: ASML NETHERLANDS B.V.

Inventor： David Ferdinand VLES ,  Chaitanya Krishna ANDE ,  Antonius Franciscus Johannes DE GROOT ,  Adrianus Johannes Maria GIESBERS ,  Johannes Joseph JANSSEN ,  Paul JANSSEN ,  Johan Hendrik KLOOTWIJK ,  Peter Simon Antonius KNAPEN ,  Evgenia KURGANOVA ,  Marcel Peter MEIJER ,  Wouter Rogier MEIJERINK ,  Maxim Aleksandrovich NASALEVICH ,  Arnoud Willem NOTENBOOM ,  Raymond OLSMAN ,  Hrishikesh PATEL ,  Mária PÉTER ,  Gerrit VAN DEN BOSCH ,  Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN ,  Willem Joan VAN DER ZANDE ,  Pieter-Jan VAN ZWOL ,  Johannes Petrus Martinus Bernardus VERMEULEN ,  Willem-Pieter VOORTHUIJZEN ,  Hendrikus Jan WONDERGEM ,  Aleksandar Nikolov ZDRAVKOV

IPC: G03F1/64

Abstract: The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.

公开(公告)号：US20240027893A1

公开(公告)日：2024-01-25

申请号：US18220799

申请日：2023-07-11

Applicant: ASML NETHERLANDS B.V.

Inventor： David Ferdinand VLES ,  Chaitanya Krishna ANDE ,  Antonius Franciscus Johannes DE GROOT ,  Adrianus Johannes Maria GIESBERS ,  Johannes Joseph JANSSEN ,  Paul JANSSEN ,  Johan Hendrik KLOOTWIJK ,  Peter Simon Antonius KNAPEN ,  Evgenia KURGANOVA ,  Marcel Peter MEIJER ,  Wouter Rogier MEIJERINK ,  Maxim Aleksandrovich NASALEVICH ,  Arnoud Willem NOTENBOOM ,  Raymond OLSMAN ,  Hrishikesh PATEL ,  Mária PÉTER ,  Gerrit VAN DEN BOSCH ,  Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN ,  Willem Joan VAN DER ZANDE ,  Pieter-Jan VAN ZWOL ,  Johannes Petrus Martinus Bernardus VERMEULEN ,  Willem-Pieter VOORTHUIJZEN ,  Hendrikus Jan WONDERGEM ,  Aleksandar Nikolov ZDRAVKOV

IPC: G03F1/64

CPC classification number: G03F1/64

Abstract: A pellicle assembly includes a pellicle frame defining a surface onto which a pellicle is, or to be, attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. A pellicle assembly for a patterning device, the pellicle assembly includes one or more actuators for moving the pellicle assembly towards and way from the patterning device.

公开(公告)号：US20230024490A1

公开(公告)日：2023-01-26

申请号：US17780906

申请日：2020-10-29

Applicant: ASML Netherlands B.V.

Inventor： Paulus Albertus VAN HAL ,  Diego MILLO ,  Aleksandar Nikolov ZDRAVKOV ,  Marcus Anrianus VAN DE KERKHOF

IPC: G03F7/20 ,  G03F7/16

Abstract: The present invention relates to methods for improving the resistance of lithography substrate holders to corrosion. The present invention also relates to systems comprising lithography substrate holders with improved corrosion resistance, and to methods of fabricating devices, e.g. integrated circuits, using such systems. The present invention also relates to substrates with backsides configured to preferentially corrode when used in lithography. The present invention has particular use in connection with lithographic apparatus for fabricating devices, for example integrated circuits.

公开(公告)号：US20220035239A1

公开(公告)日：2022-02-03

申请号：US17278356

申请日：2019-10-02

Applicant: ASML NETHERLANDS B.V.

Inventor： Pieter-Jan VAN ZWOL ,  Sander BALTUSSEN ,  Dennis DE GRAAF ,  Johannes Christiaan Leonardus FRANKEN ,  Adrianus Johannes Maria GIESBERS ,  Alexander Ludwig KLEIN ,  Johan Hendrik KLOOTWIJK ,  Peter Simon Antonius KNAPEN ,  Evgenia KURGANOVA ,  Alexey Sergeevich KUZNETSOV ,  Arnoud Willem NOTENBOOM ,  Mahdiar VALEFI ,  Marcus Adrianus VAN DE KERKHOF ,  Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN ,  Ties Wouter VAN DER WOORD ,  Hendrikus Jan WONDERGEM ,  Aleksandar Nikolov ZDRAVKOV

IPC: G03F1/64 ,  G03F7/20

Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method including: providing a stack including: at least one membrane layer supported by a planar substrate, wherein the planar substrate has an inner region and a border region around the inner region; and a first sacrificial layer between the planar substrate and the membrane layer; selectively removing the inner region of the planar substrate such that the membrane assembly has: a membrane formed from the at least one membrane layer, and a border holding the membrane, the border having the border region of the planar substrate and the first sacrificial layer situated between the border region and the membrane layer, wherein the selectively removing the inner region of the planar substrate includes using an etchant which has a similar etch rate for the membrane layer and its oxide and a substantially different etch rate for the first sacrificial layer.

公开(公告)号：US20190265597A1

公开(公告)日：2019-08-29

申请号：US16407878

申请日：2019-05-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Daan Daniel Johannes Antonius VAN SOMMEREN ,  Coen Hubertus Matheus BALTIS ,  Harold Sebastiaan BUDDENBERG ,  Giovanni Luca GATTOBIGIO ,  Johannes Cornelis Paulus MELMAN ,  Günes NAKIBOGLU ,  Theodorus Wilhelmus POLET ,  Walter Theodorus Matheus STALS ,  Yuri Johannes Gabriël VAN DE VIJVER ,  Josephus Peter VAN LIESHOUT ,  Jorge Alberto VIEYRA SALAS ,  Aleksandar Nikolov ZDRAVKOV

IPC: G03F7/20

Abstract: A substrate table configured to support a substrate for exposure in an immersion lithographic apparatus, the substrate table including: a support body having a support surface configured to support the substrate; and a cover ring fixed relative to the support body and configured to surround, in plan view, the substrate supported on the support surface, wherein the cover ring has an upper surface and at least a portion of the upper surface is configured so as to alter the stability of a meniscus of immersion liquid when moving along the upper surface towards the substrate.