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    Lithography apparatus and method of manufacturing device
    1.
    发明专利
    Lithography apparatus and method of manufacturing device 有权
    平面设备及其制造方法

    公开(公告)号：JP2007165875A

    公开(公告)日：2007-06-28

    申请号：JP2006325814

    申请日：2006-12-01

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： SCHOORMANS CAROLUS JOHANNES C ,  EUSSEN EMIEL JOZEF M ,  KOENEN WILLEM HERMAN GERTRUDA ,  LALLEMANT NICOLAS A ,  VAN DER PASCH ENGELBERTUS ANTO ,  ADRIAENS JOHANNES MATHIAS T A

    IPC: H01L21/027 ,  G01B11/00 ,  G03F9/00

    CPC classification number: G03F7/70775

    Abstract: PROBLEM TO BE SOLVED: To provide a method and an apparatus having high accuracy in determining a position of a movable object. SOLUTION: The method of manufacturing a device includes projecting a patterned radiation beam to a substrate wherein a position of a movable object is determined with multiple degrees of freedom using many sensors, the number of sensors is larger than the number of degrees of freedom, the position of the movable object is determined with the degrees of freedom using a signal from each of the sensors, and the signal from the sensor is weighed based on difference in noise level of each sensor. The lithography apparatus has improved accuracy in measurement of a position of the movable object and/or superposition ability and focusing ability. COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种在确定可移动物体的位置时具有高精度的方法和装置。 解决方案：制造装置的方法包括将图案化的辐射束投影到基板，其中使用许多传感器以多个自由度确定可移动物体的位置，传感器的数量大于 自由度，使用来自每个传感器的信号，利用自由度来确定可移动物体的位置，并且基于每个传感器的噪声水平的差异来称量来自传感器的信号。 光刻装置提高了可移动物体的位置的测量精度和/或叠加能力和聚焦能力。 版权所有（C）2007，JPO＆INPIT

    LITHOGRAPHY APPARATUS AND METHOD FOR DETERMINING ERROR/VARIATIONS OF Z-POSITION, AND ROUGHNESS OF SUBSTRATE TABLE
    2.
    发明专利
    LITHOGRAPHY APPARATUS AND METHOD FOR DETERMINING ERROR/VARIATIONS OF Z-POSITION, AND ROUGHNESS OF SUBSTRATE TABLE 审中-公开

    公开(公告)号：JP2006186380A

    公开(公告)日：2006-07-13

    申请号：JP2005381264

    申请日：2005-12-26

    Applicant: ASML NETHERLANDS BV

    Inventor： KOENEN WILLEM HERMAN G A ,  MINNAERT ARTHUR WINFRIED E ,  OUWEHAND LUBERTHUS ,  ADRIAENS JOHANNES MATHIAS T A ,  PRIL WOUTER ONNO

    IPC: H01L21/027 ,  G03F7/207

    Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus capable of determining the values of an error/variations in a Z-position and/or the roughness of a substrate table. SOLUTION: This lithographic projection apparatus comprises an illuminator configured to provide a radiation beam; a support structure configured to hold a patterning device which is configured to impart the beam with a pattern in its cross-section, a substrate table WT configured to hold a substrate W, a projection system configured to project the patterned beam onto a target portion of the substrate W, a plurality of level sensors LS configured to detect the level of a substrate on the substrate table WT by measuring the heights of a plurality of points on the substrate, and a system for determining the position of the substrate table WT. Further, the apparatus is provided with a control unit configured to produce a relative displacement between the substrate W and the array of the level sensors LS from a first position, at which a first measurement value is obtained to a plurality of duplicate points at which another measurement value is obtained; and a calculator configured to calculate the value of an error in the Z-position, and/or the non-roughness of a substrate table WT, and/or the values of the positions/the off-set of the level sensors LS by using duplicate measurement values. COPYRIGHT: (C)2006,JPO&NCIPI

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