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    Lithographic apparatus and device manufacturing method
    1.
    发明专利
    Lithographic apparatus and device manufacturing method 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：JP2007258749A

    公开(公告)日：2007-10-04

    申请号：JP2007154924

    申请日：2007-06-12

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： PRIL WOUTER ONNO ,  VAN DER PASCH ENGELBERTUS ANTO ,  DILLON ROBERT F ,  HENSHAW PHILIP DENNIS

    IPC: H01L21/027 ,  G01B9/02 ,  G01B11/00 ,  G03F7/20 ,  H01L21/68

    CPC classification number: G03F7/70958 ,  G01B9/02007 ,  G01B9/02014 ,  G01B9/02027 ,  G01B9/0207 ,  G01B9/02074 ,  G01B2290/45 ,  G01B2290/60 ,  G01B2290/70 ,  G03F7/70775 ,  G03F7/70883

    Abstract: PROBLEM TO BE SOLVED: To provide an interferometric displacement measuring system for use in a lithographic projection apparatus having increased precision in spite of pressure and temperature disturbances in the optical paths of measurement and reference beams. SOLUTION: Measurement values of an interferometric measurement system are corrected for variations of atmospheric conditions such as pressure, temperature and turbulence using measurement values from a second harmonic interferometer. A ramp, representing the dependence of the SHI (second harmonic interferometer) data on a path length, is removed before use of the SHI data. The SHI may use a passive Q-switched laser as a light source and Brewster prisms in a receiver module. Optical fibers may be used to conduct light to detectors. A mirror reflecting the measurement beams has a coating of a thickness selected to minimize the sensitivity of the SHI data to changes in the coating thickness. COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种用于光刻投影设备的干涉位移测量系统，其具有在测量和参考光束的光路中的压力和温度干扰的情况下具有提高的精度。 解决方案：使用来自二次谐波干涉仪的测量值来校正干涉测量系统的测量值，以测量大气条件（如压力，温度和湍流）的变化。 代表SHI（二次谐波干涉仪）数据对路径长度的依赖性的斜坡在使用SHI数据之前被去除。 SHI可以使用无源Q开关激光器作为光源，并在接收器模块中使用布鲁斯特棱镜。 可以使用光纤将光传导到检测器。 反映测量光束的反射镜具有选择的厚度的涂层，以使SHI数据对涂层厚度的变化的敏感性最小化。 版权所有（C）2008，JPO＆INPIT

    Position determination system and lithography system
    2.
    发明专利
    Position determination system and lithography system 有权
    位置确定系统和平移系统

    公开(公告)号：JP2007071874A

    公开(公告)日：2007-03-22

    申请号：JP2006237166

    申请日：2006-09-01

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： PRIL WOUTER ONNO ,  EUSSEN EMIEL J M ,  VAN DER PASCH ENGELBERTUS ANTO

    IPC: G01B11/00 ,  H01L21/027

    CPC classification number: G03F7/70775

    Abstract: PROBLEM TO BE SOLVED: To provide a position determination system for measuring the position of an object.
    SOLUTION: This system comprises: a first increment value measuring unit for measuring the first distance step of a first number at the distance between a reference frame and the object, in which the first number is equal to the value obtained by adding a first fraction to a first integer; and a second increment value measuring unit for measuring the second distance step of a second number at the distance between the reference frame and the object, in which the second number is equal to the value obtained by adding a second fraction to the first integer. The position determination system is constructed and arranged to initialize the second increment value measuring unit based on the first number and the second fraction.
    COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种用于测量物体的位置的位置确定系统。 解决方案：该系统包括：第一增量值测量单元，用于测量在参考帧和对象之间的距离处的第一数字的第一距离步长，其中第一数字等于通过添加一个 第一个分数到第一个整数; 以及第二增量值测量单元，用于在参考帧和对象之间的距离处测量第二数量的第二距离步长，其中第二数量等于通过将第二分数加到第一整数而获得的值。 位置确定系统被构造和布置为基于第一数量和第二分数来初始化第二增量值测量单元。 版权所有（C）2007，JPO＆INPIT

    LITHOGRAPHY APPARATUS AND METHOD FOR DETERMINING ERROR/VARIATIONS OF Z-POSITION, AND ROUGHNESS OF SUBSTRATE TABLE
    4.
    发明专利
    LITHOGRAPHY APPARATUS AND METHOD FOR DETERMINING ERROR/VARIATIONS OF Z-POSITION, AND ROUGHNESS OF SUBSTRATE TABLE 审中-公开

    公开(公告)号：JP2006186380A

    公开(公告)日：2006-07-13

    申请号：JP2005381264

    申请日：2005-12-26

    Applicant: ASML NETHERLANDS BV

    Inventor： KOENEN WILLEM HERMAN G A ,  MINNAERT ARTHUR WINFRIED E ,  OUWEHAND LUBERTHUS ,  ADRIAENS JOHANNES MATHIAS T A ,  PRIL WOUTER ONNO

    IPC: H01L21/027 ,  G03F7/207

    Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus capable of determining the values of an error/variations in a Z-position and/or the roughness of a substrate table. SOLUTION: This lithographic projection apparatus comprises an illuminator configured to provide a radiation beam; a support structure configured to hold a patterning device which is configured to impart the beam with a pattern in its cross-section, a substrate table WT configured to hold a substrate W, a projection system configured to project the patterned beam onto a target portion of the substrate W, a plurality of level sensors LS configured to detect the level of a substrate on the substrate table WT by measuring the heights of a plurality of points on the substrate, and a system for determining the position of the substrate table WT. Further, the apparatus is provided with a control unit configured to produce a relative displacement between the substrate W and the array of the level sensors LS from a first position, at which a first measurement value is obtained to a plurality of duplicate points at which another measurement value is obtained; and a calculator configured to calculate the value of an error in the Z-position, and/or the non-roughness of a substrate table WT, and/or the values of the positions/the off-set of the level sensors LS by using duplicate measurement values. COPYRIGHT: (C)2006,JPO&NCIPI

    Lithography apparatus and position determination method
    5.
    发明专利
    Lithography apparatus and position determination method 有权
    算术装置和位置确定方法

    公开(公告)号：JP2006108681A

    公开(公告)日：2006-04-20

    申请号：JP2005290613

    申请日：2005-10-04

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： EUSSEN EMIEL JOZEF MELANIE ,  VAN EMPEL TJARKO ADRIAAN RUDOL ,  PRIL WOUTER ONNO

    IPC: H01L21/027 ,  G01B11/00 ,  G03F7/20

    CPC classification number: G03F7/70775 ,  G03F7/70858

    Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus and a position determination method. SOLUTION: In the lithography apparatus, the position determination of an object existing in the ambient space is corrected by an object position determination system, which is affected by the pressure changes of the ambient space, by making a correct measurement of the ambient space pressure. A reference pressure volume that has a fluid connection with the ambient space can be provided by predetermined fluid properties. Pressure differential between the pressure of the reference pressure volume and the atmospheric pressure of the ambient space can be measured. The pressure change of the ambient space is determined after the absolute pressure of the reference pressure volume is added to the differential pressure. As an alternative method, the differential pressure is integrated by time, by which the pressure change of the reference pressure volume is determined. After that, the pressure change of the ambient space is determined after the pressure change of the reference pressure volume is added to the differential pressure. For the purpose of the fluid connection, it is possible to use a valve that can be opened and closed. COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：提供一种光刻设备和位置确定方法。 解决方案：在光刻设备中，通过由环境空间的压力变化影响的物体位置确定系统来校正存在于环境空间中的物体的位置确定，通过对环境的正确测量 空间压力。 可以通过预定的流体特性提供与环境空间具有流体连接的参考压力体积。 可以测量参考压力体积的压力与环境空间的大气压力之间的压力差。 在将参考压力体积的绝对压力加到差压之后确定环境空间的压力变化。 作为替代方法，差压通过时间积分，由此确定参考压力体积的压力变化。 之后，在将参考压力体积的压力变化加到差压之后确定环境空间的压力变化。 为了流体连接的目的，可以使用可以打开和关闭的阀。 版权所有（C）2006，JPO＆NCIPI

    Lithography system, interferometer and method of device-manufacturing
    6.
    发明专利
    Lithography system, interferometer and method of device-manufacturing 有权
    LITHOGRAPHY系统，干涉仪和器件制造方法

    公开(公告)号：JP2005134400A

    公开(公告)日：2005-05-26

    申请号：JP2004315793

    申请日：2004-10-29

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： PRIL WOUTER ONNO

    IPC: G01B9/02 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027

    CPC classification number: G03F7/70775

    Abstract: PROBLEM TO BE SOLVED: To provide a lithography system equipped having an interferometer for measuring the position of a mirror.
    SOLUTION: In order to measure the nonplanarity of the mirror, this interferometer contains a modulator which modulates the position of incoming beam for the interferometer, a synchronous detector which synchronously detects the interfering modulation beam, and a calculator which computes nonflatness of mirror area from effects on output signal of the synchronous detector caused by positional modulation of the incoming beam.
    COPYRIGHT: (C)2005,JPO&NCIPI

    Abstract translation: 要解决的问题：提供一种装备有用于测量反射镜位置的干涉仪的光刻系统。 解决方案：为了测量反射镜的非平面性，该干涉仪包含调制干涉仪入射光束位置的调制器，同步检测干扰调制光束的同步检测器，以及计算镜面非平坦性的计算器 区域对由入射束的位置调制引起的对同步检测器的输出信号的影响。 版权所有（C）2005，JPO＆NCIPI

    Lithographic equipment
    7.
    发明专利
    Lithographic equipment 审中-公开
    光刻设备

    公开(公告)号：JP2005051245A

    公开(公告)日：2005-02-24

    申请号：JP2004221972

    申请日：2004-07-29

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： PRIL WOUTER ONNO

    IPC: G01B9/02 ,  G01B11/00 ,  G03B27/42 ,  G03F7/20 ,  H01L21/027

    CPC classification number: G03F7/70775

    Abstract: PROBLEM TO BE SOLVED: To provide lithographic equipment having a small number of modules, as compared with that in conventional equipment.
    SOLUTION: The lithographic equipment has a radiation system for providing a projection beam of radiation, a support structure for supporting the patterning means that patterns the projection beam according to a desired pattern, a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target area on the substrate, and an interferometer system to help positioning an object in the equipment, wherein the interferometer system performs position measurement.
    COPYRIGHT: (C)2005,JPO&NCIPI

    Abstract translation: 要解决的问题：与常规设备相比，提供具有少量模块的光刻设备。 光刻设备具有用于提供投影辐射束的辐射系统，用于支撑图案化装置的支撑结构，其根据期望的图案对投影光束进行图案化，用于保持基板的基板台，投影系统 用于将图案化的光束投影到基板上的目标区域上;以及干涉仪系统，用于帮助将物体定位在设备中，其中干涉仪系统执行位置测量。 版权所有（C）2005，JPO＆NCIPI

    POSITION MEASUREMENT SYSTEM AND LITHOGRAPHIC APPARATUS
    9.
    发明专利
    POSITION MEASUREMENT SYSTEM AND LITHOGRAPHIC APPARATUS 未知

    公开(公告)号：SG130183A1

    公开(公告)日：2007-03-20

    申请号：SG2006060180

    申请日：2006-09-01

    Applicant: ASML NETHERLANDS BV

    Inventor： PRIL WOUTER ONNO ,  EUSSEN EMIEL JOZEF MELANIE ,  VAN DER PASCH ENGELBERTUS ANTO

    Abstract: A position measurement system for measuring a position of an object is described, the system including: a first incremental measurement unit for measuring a first number of first distance steps in a distance between a reference frame and the object, wherein the first number equals a first integer value plus a first fraction, and a second incremental measurement unit for measuring a second number of second distance steps in a distance between the reference frame and the object, wherein the second number equals a second integer value plus a second fraction, wherein the position measurement system is constructed and arranged to initialize the second incremental measurement unit on the basis of the first number and the second fraction.

    10.
    发明专利
    未知

    公开(公告)号：DE60322171D1

    公开(公告)日：2008-08-28

    申请号：DE60322171

    申请日：2003-11-25

    Applicant: ASML NETHERLANDS BV

    Inventor： PRIL WOUTER ONNO ,  VAN DER PASCH EGELBERTUS ANTON ,  DILLON ROBERT ,  HENSHAW PHILIP DENNIS

    IPC: G03F7/20 ,  G01B9/02 ,  G01B11/00 ,  H01L21/027

    Abstract: Measurements of an interferometric measurement system are corrected for variations of atmospheric conditions such as pressure, temperature and turbulence using measurements from a second harmonic interferometer (10). A ramp, representing the dependence of the SHI data on path length, is removed before use of the SHI data. The SHI may use a passive Q-switched laser (11) as a light source and Brewster prisms (142,144) in the receiver module. Optical fibers may be used to conduct light to the detectors (145-147). A mirror reflecting the measurement beams has a coating of a thickness selected to minimize the sensitivity of the SHI data to changes in coating thickness.

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