公开(公告)号：JP2006186380A

公开(公告)日：2006-07-13

申请号：JP2005381264

申请日：2005-12-26

Applicant: ASML NETHERLANDS BV

Inventor： KOENEN WILLEM HERMAN G A ,  MINNAERT ARTHUR WINFRIED E ,  OUWEHAND LUBERTHUS ,  ADRIAENS JOHANNES MATHIAS T A ,  PRIL WOUTER ONNO

IPC: H01L21/027 ,  G03F7/207

Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus capable of determining the values of an error/variations in a Z-position and/or the roughness of a substrate table. SOLUTION: This lithographic projection apparatus comprises an illuminator configured to provide a radiation beam; a support structure configured to hold a patterning device which is configured to impart the beam with a pattern in its cross-section, a substrate table WT configured to hold a substrate W, a projection system configured to project the patterned beam onto a target portion of the substrate W, a plurality of level sensors LS configured to detect the level of a substrate on the substrate table WT by measuring the heights of a plurality of points on the substrate, and a system for determining the position of the substrate table WT. Further, the apparatus is provided with a control unit configured to produce a relative displacement between the substrate W and the array of the level sensors LS from a first position, at which a first measurement value is obtained to a plurality of duplicate points at which another measurement value is obtained; and a calculator configured to calculate the value of an error in the Z-position, and/or the non-roughness of a substrate table WT, and/or the values of the positions/the off-set of the level sensors LS by using duplicate measurement values. COPYRIGHT: (C)2006,JPO&NCIPI

公开(公告)号：JP2007184576A

公开(公告)日：2007-07-19

申请号：JP2006337301

申请日：2006-12-14

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： SENGERS TIMOTHEUS FRANCISCUS ,  VAN ASTEN NICOLAAS ANTONIUS AL ,  BOX WILHELMUS JOSEPHUS ,  VAN EMPEL TJARKO ADRIAAN RUDOL ,  LEVASIER LEON MARTIN ,  LOOPSTRA ERIK R ,  MUITJES MARCEL JOHANNUS ELISAB ,  OUWEHAND LUBERTHUS ,  VAN DER SCHOOR LEON JOSEPH MAR ,  BECKERS MARCEL ,  JANSEN ROB ,  VAN LOENHOUT ELKE

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70883 ,  G03F7/7075 ,  G03F7/70858 ,  G03F9/7011 ,  G03F9/7034

Abstract: PROBLEM TO BE SOLVED: To provide a method of highly precisely adjusting a measuring optical system of a lithographic apparatus. SOLUTION: In the lithographic apparatus, a substrate table constituted to hold a substrate is movable to transfer the substrate between a substrate measuring position and a substrate processing position. The lithographic apparatus also includes a measuring system constituted to measure at least one aspect or a characteristic of the substrate when the substrate table holds the substrate in the measuring position. The measuring system is constituted to guide at least one measuring beam and/or a field toward the front surface of the substrate. A projection system is constituted to project a patterned radiation beam onto the target of the substrate when the substrate table holds the substrate in the substrate processing position. An adjusting system is constituted to supply adjusting fluid to at least a part of the path of the measuring beam and/or the field of the measuring system to adjust the part of the path. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种高精度地调整光刻设备的测量光学系统的方法。 解决方案：在光刻设备中，用于保持衬底的衬底台可移动以在衬底测量位置和衬底处理位置之间传送衬底。 光刻设备还包括测量系统，该测量系统构成为当衬底台将衬底保持在测量位置时测量衬底的至少一个方面或特性。 测量系统被构造成朝向基板的前表面引导至少一个测量光束和/或场。 投影系统被构造成当衬底台将衬底保持在衬底处理位置时，将图案化的辐射束投影到衬底的靶上。 调整系统被构造成将调节流体提供给测量光束的路径的至少一部分和/或测量系统的场以调整路径的一部分。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006337373A

公开(公告)日：2006-12-14

申请号：JP2006155056

申请日：2006-06-02

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VAN ASTEN NICOLAAS ANTONIUS AL ,  BALAN OANA C ,  OUWEHAND LUBERTHUS ,  VIGUURS MACHIEL JACOBUS J ,  ALEXANDER CHARLES FRANCISCUS A ,  CHENG LUN K ,  BLOKLAND HUIBERT ,  VAN LOENHOUT ELKE ,  BALTUS BAKKER HANS

IPC: G01B11/02 ,  H01L21/027

CPC classification number: G03F9/7049 ,  G01B11/0625 ,  G03F9/7034 ,  G03F9/7088

Abstract: PROBLEM TO BE SOLVED: To provide a level sensor capable of executing improved position measurement correction to find a height of a substrate.
SOLUTION: The level sensor generates one or a plurality of measuring beam(s), and emits the measuring beam(s) toward a measuring spot on the substrate to generate a reflected measuring beam(s). The level sensor generates also one or a plurality of reference beam(s). A detector detects respectively both the reflected measuring beam (s) and the reference beam(s), and generates respectively a measuring signal indicating the height in the measuring spot, and a reference signal. A processor receives the signals, and corrects the measuring signal, based on the reference signal. The level sensor has optical constitution in a prescribed area near to a place to arrange the substrate. The measuring beam(s) and the reference beam(s) are propagated along substantially equal propagation optical paths within the prescribed area. The optical constitution deflects the reference beam(s) from the substantially equal propagation optical paths within the prescribed area to make at least one the reference beam not hit the substrate.
COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供能够执行改进的位置测量校正以找到基板的高度的液位传感器。

解决方案：液位传感器产生一个或多个测量光束，并将测量光束朝向衬底上的测量点发射以产生反射的测量光束。 液位传感器还产生一个或多个参考光束。 检测器分别检测反射的测量光束和参考光束，分别产生指示测量点的高度的测量信号和参考信号。 处理器接收信号，并根据参考信号校正测量信号。 液位传感器在靠近用于布置基板的位置的规定区域中具有光学构造。 测量光束和参考光束在规定区域内沿着基本相等的传播光路传播。 光学构造将参考光束从规定区域内的基本上相等的传播光路偏转，使至少一个参考光束不会撞击到衬底上。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：SG133552A1

公开(公告)日：2007-07-30

申请号：SG2006088587

申请日：2006-12-19

Applicant: ASML NETHERLANDS BV

Inventor： SENGERS TIMOTHEUS FRANCISCUS ,  VAN ASTEN NICOLAAS ANTONIUS AL ,  BOX WILHELMUS JOSEPHUS ,  VAN EMPEL TJARKO ADRIAAN RUDOL ,  LEVASIER LEON MARTIN ,  LOOPSTRA ERIK ROELOF ,  MUITJES MARCEL JOHANNUS ELISAB ,  OUWEHAND LUBERTHUS ,  VAN DEN SCHOOR LEON JOSEPH MAR ,  BECKERS MARCEL ,  JANSEN ROB ,  VAN LOENHOUT ELKE

公开(公告)号：SG123762A1

公开(公告)日：2006-07-26

申请号：SG200508364

申请日：2005-12-23

Applicant: ASML NETHERLANDS BV

Inventor： KOENEN WILLEM HERMAN GERTRUDA ,  MINNAERT ARTHUR WINFRIED EDUAR ,  OUWEHAND LUBERTHUS ,  ADRIENS JOHANNES MATHIAS THEOD ,  PRIL WOUTER ONNO

Abstract: A lithographic projection apparatus including: an illumination system configured to provide a beam of radiation; a support configured to support a patterning device, the patterning device configured to impart the beam with a pattern in its cross section; a substrate table (WT) configured to hold a substrate (W); a projection system configured to project the patterned radiation onto a target portion of the substrate (W); a plurality of level sensors (LS) for sensing a level of a substrate carried on the substrate table (WT) at a plurality of different positions, and a system for determining the position of the substrate table (WT). Also provided is a controller that is configured to cause relative movement between the substrate (W) and the level sensor array from a first position at which a first measurement is taken to a plurality of overlapping positions at which further measurements are taken, and a calculator for calculating a measure of Z position errors and/or substrate table (WT) unflatness and/or a measure of the level sensor (LS) position/offset using the plurality of overlapping measurements.