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公开(公告)号:NL1036662A1
公开(公告)日:2009-10-09
申请号:NL1036662
申请日:2009-03-04
Applicant: ASML NETHERLANDS BV
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公开(公告)号:SG145645A1
公开(公告)日:2008-09-29
申请号:SG2008012049
申请日:2008-02-13
Applicant: ASML NETHERLANDS BV
Inventor: BAGGEN MARK CONSTANT JOHANNES , VAN DEN BIGGELAAR PETRUS MARINUS CHRISTIANUS , TIM TSO YIN , HEERTJES MARCEL FRANCOIS , KAMIDI RAMIDIN IZAIR , HOUBEN DENNIS ANDREAS PETRUS HUBERTINA , BAGGEN CONSTANT PAUL MARIE JOZZEF , VAN DE MOLENGRAFT MARINUS JACOBUS GERARDUS
Abstract: LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD In a lithographic apparatus, a feedforward transfer function of a control system, is determined by : a) iteratively learning a feedforward output signal of the control system by iterative learning control for a given setpoint signal; b) determining a relation between the learned feedforward output signal and the setpoint signal; and c) applying the relation as the feedforward transfer function of the control system. A learned feedforward, which has been learned for one or more specific setpoint signals only, can be adapted to provide a setpoint signal dependent feedforward output signal. The learned feedforward can be made more robust against setpoint variations.
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