公开(公告)号：JP2006114899A

公开(公告)日：2006-04-27

申请号：JP2005295920

申请日：2005-10-11

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： COX HENRIKUS HERMAN MARIE ,  BUTLER HANS ,  KUNST RONALD CASPER ,  VEN DER SCHOOT HARMEN KLAAS ,  DE VOS YOUSSEF KAREL MARIA

IPC: H01L21/027 ,  G03F9/00 ,  H01L21/68

CPC classification number: G03F7/70725

Abstract: PROBLEM TO BE SOLVED: To dispense with an actuator for accurately positioning, without deteriorating accuracy in positioning of an actuator driven assembly. SOLUTION: In order to obtain a high acceleration and high traveling speed of a pattern support or a substrate table of a lithography apparatus, one of the pattern support and the substrate table is supported by an actuator for relatively larger displacement, and the actuator for accurately positioning is dispensed with. The other of the pattern support and the substrate table is supported by the actuator assembly including the actuator for accurately positioning and the actuator for relatively larger displacement. By providing a control system adapted to align the other of the pattern support and the substrate table, so that the positioning error of one of the pattern support and the substrate table is compensated by the positioning of the other, a positioning accuracy of the pattern forming apparatus and the substrate is achieved. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：省略用于精确定位的致动器，而不会降低致动器驱动组件的定位精度。 解决方案：为了获得光刻设备的图案支撑件或基板台的高加速度和高行进速度，图案支撑件和基板台之一由用于相对较大位移的致动器支撑，并且 省去了用于精确定位的执行器。 图案支撑和基板台中的另一个由包括用于精确定位的致动器和用于相对较大位移的致动器的致动器组件支撑。 通过提供一种适于对准图案支架和基片台中的另一个的控制系统，使得图案支架和基板台之一的定位误差由另一方的定位补偿，图形形成的定位精度 设备和基板。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2006191084A

公开(公告)日：2006-07-20

申请号：JP2005377185

申请日：2005-12-28

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： KUNST RONALD CASPER ,  TSO YIN TIM ,  DE VOS YOUSSEF KAREL MARIA ,  KAMIDI RAMIDIN IZAIR

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70725

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus provided with an improved motion control system for controlling the movement of a movable target object, where at least one of a patterning device and a supporting part of a substrate can be moved for instance. SOLUTION: The motion control system comprises a control device having a transfer function. The control device controls the position of a movable target object along a plurality of continuous positions. The transfer function is constituted of a sum of a plurality of position transfer functions each of which is determined in each of these positions, and each position transfer function is multiplied by a weighting function. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种设置有改进的运动控制系统的光刻设备，用于控制可移动目标物体的运动，其中图案形成装置和基板的支撑部分中的至少一个可以移动，例如 。 运动控制系统包括具有传递功能的控制装置。 控制装置沿着多个连续位置控制可移动目标物体的位置。 传递函数由在这些位置中的每一个中确定的多个位置传递函数的和构成，并且每个位置传递函数乘以加权函数。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：SG164330A1

公开(公告)日：2010-09-29

申请号：SG2010008704

申请日：2010-02-08

Applicant: ASML NETHERLANDS BV

Inventor： VERVOORDELDONK MICHAEL JOHANNES ,  KUNST RONALD CASPER ,  DE VOS YOUSSEF KAREL MARIA ,  VAN DE RIJDT JOHANNES HUBERTUS ANTONIUS ,  VAN KEMPEN ROBERTUS JACOBUS THEODORUS

Abstract: A lithographic apparatus includes a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate on a central area; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate in a first direction. The apparatus further includes a positioning device to position the substrate table, wherein the positioning device includes a plurality of actuators arranged to, in use, exert forces to position the substrate table, the forces substantially being directed in a plane substantially perpendicular to the first direction and wherein the plurality of actuators are arranged outside a central volume of the substrate table, the central volume being obtained by projecting the central area along the first direction.

公开(公告)号：NL1036028A1

公开(公告)日：2009-04-15

申请号：NL1036028

申请日：2008-10-07

Applicant: ASML NETHERLANDS BV

Inventor： VOS YOUSSEF KAREL MARIA DE ,  BIJVOET DIRK-JAN ,  KUNST RONALD CASPER ,  KAMIDI RAMIDIN IZAIR ,  MANSSOURI KHALID

IPC: G03F9/00 ,  G03F7/20

公开(公告)号：NL1036662A1

公开(公告)日：2009-10-09

申请号：NL1036662

申请日：2009-03-04

Applicant: ASML NETHERLANDS BV

Inventor： KAMIDI RAMIDIN IZAIR ,  COX HENRIKUS HERMAN MARIE ,  EUSSEN EMIEL JOZEF MELANIE ,  KUNST RONALD CASPER ,  PASCH ENGELBERTUS ANTONIUS FRANSISCUS VAN DER ,  HEERTJES MARCEL FRANCOIS ,  BAGGEN MARK CONSTANT JOHANNES

IPC: H01L21/68 ,  G03F9/00

公开(公告)号：SG121949A1

公开(公告)日：2006-05-26

申请号：SG200506171

申请日：2005-09-27

Applicant: ASML NETHERLANDS BV

Inventor： COX HENRIKUS HERMAN MARIE ,  BUTLER HANS ,  KUNST RONALD CASPER ,  SCHOOT VAN DER HARMEN KLAAS ,  VOS DE YOUSSEF KAREL MARIA

Abstract: To enable high acceleration and high moving speed of a pattern support (PS) or a substrate table (ST) of a lithographic apparatus, one of the pattern support and the substrate table is supported by an actuator (SLS,PLS) for relatively large displacements, whereas an actuator (SV,PV) for accurately positioning is omitted. The other one of the pattern support and the substrate table is supported by an actuator assembly including an actuator for accurate positioning and an actuator for relatively large displacements. An alignment accuracy of a patterning device and a substrate is achieved by providing a control system that is adapted to position the other one of the pattern support and the substrate table such that a positioning error of the one of the pattern support and the substrate table is compensated by the positioning of the other one.