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    Lithographic apparatus and device manufacturing method
    1.
    发明专利
    Lithographic apparatus and device manufacturing method 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：JP2006191084A

    公开(公告)日：2006-07-20

    申请号：JP2005377185

    申请日：2005-12-28

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： KUNST RONALD CASPER ,  TSO YIN TIM ,  DE VOS YOUSSEF KAREL MARIA ,  KAMIDI RAMIDIN IZAIR

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70725

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus provided with an improved motion control system for controlling the movement of a movable target object, where at least one of a patterning device and a supporting part of a substrate can be moved for instance. SOLUTION: The motion control system comprises a control device having a transfer function. The control device controls the position of a movable target object along a plurality of continuous positions. The transfer function is constituted of a sum of a plurality of position transfer functions each of which is determined in each of these positions, and each position transfer function is multiplied by a weighting function. COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：提供一种设置有改进的运动控制系统的光刻设备，用于控制可移动目标物体的运动，其中图案形成装置和基板的支撑部分中的至少一个可以移动，例如 。 运动控制系统包括具有传递功能的控制装置。 控制装置沿着多个连续位置控制可移动目标物体的位置。 传递函数由在这些位置中的每一个中确定的多个位置传递函数的和构成，并且每个位置传递函数乘以加权函数。 版权所有（C）2006，JPO＆NCIPI

    Stage system and lithographic apparatus equipped with same
    3.
    发明专利
    Stage system and lithographic apparatus equipped with same 有权
    具有相同功能的舞台系统和平面设备

    公开(公告)号：JP2008219001A

    公开(公告)日：2008-09-18

    申请号：JP2008034572

    申请日：2008-02-15

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： KAMIDI RAMIDIN IZAIR ,  COX HENRIKUS HERMAN MARIE ,  RONALD CASPER KUNST ,  DE VOS YOUSSEF KAREL MARIA

    IPC: H01L21/027 ,  G03F7/20 ,  H01L21/683

    CPC classification number: G03F7/709 ,  G03F7/70725 ,  G03F7/70758

    Abstract: PROBLEM TO BE SOLVED: To improve the dynamic performance of a stage. SOLUTION: A stage system for a lithographic apparatus includes a stage, actuators that act on the stage and the number of which is set in excess, and at least two sensors that measure position-dependent parameters of the stage and supply each sensor signal. At least two sensors are arranged so as to measure each position-dependent parameters with a same degree of freedom. A controller is provided so as to supply a controller output signal, to at least one of the actuators, according to the set value measured by at least one of the sensors and the position-dependent parameters. Another controller is supplied with the position-dependent parameters measured by the sensor. The other sensor is configured so as to determine a difference between the position-dependent parameters from the sensors and supply another controller output signal to at least one of the actuators, in response to the determined difference. COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：提高舞台的动态性能。 解决方案：用于光刻设备的舞台系统包括舞台，作用在舞台上并且其数目被设置得过多的致动器，以及至少两个测量舞台的位置相关参数并提供每个传感器的传感器 信号。 布置至少两个传感器，以便以相同的自由度测量每个位置相关的参数。 提供控制器，以便根据由至少一个传感器测量的设定值和与位置相关的参数来向至少一个致动器提供控制器输出信号。 向另一个控制器提供由传感器测量的与位置相关的参数。 另一个传感器被配置成响应于所确定的差异来确定来自传感器的位置相关参数之间的差异并将另一个控制器输出信号提供给至少一个致动器。 版权所有（C）2008，JPO＆INPIT

    Lithography equipment and method for manufacturing device
    4.
    发明专利
    Lithography equipment and method for manufacturing device 有权
    LITHOGRAPHY EQUIPMENT AND METHOD FOR MANUFACTURING DEVICE

    公开(公告)号：JP2008199020A

    公开(公告)日：2008-08-28

    申请号：JP2008028927

    申请日：2008-02-08

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： MARK CONSTANT JOHANNES BAGGEN ,  PETRUS MARINUS CHRISTIANUS MAR ,  TSO YIN TIM ,  MARCEL FRANCOIS HEERTJES ,  KAMIDI RAMIDIN IZAIR ,  DENNIS ANDREAS PETRUS HUBERTIN ,  CONSTANT PAUL MARIE JOZEF BAGG ,  VAN DE MOLENGRAFT MARINUS JACO

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G05B5/01 ,  G03F7/70725 ,  G05B13/0265

    Abstract: PROBLEM TO BE SOLVED: To provide a lithography equipment which can improve robustness of an iterative learning control system against variation in setting values. SOLUTION: On a lithography equipment, a feedforward transfer function of a control system is determined by the following: (a) a feedforward output signal of the control system is iteratively learned to a specified setting value signal through iterative learning control, (b) a relationship between the learned feedforward output signal and the setting value signal is determined, and (c) such a relationship is applied as the feedforward transfer function of the control system. A feedforward learned only to one or more specific setting value signals can be adapted to give the feedforward output signal dependent on the setting value signals. The learned feedforward can be made more robust against variation in setting values. COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：提供可以改善迭代学习控制系统对设定值变化的鲁棒性的光刻设备。 解决方案：在光刻设备上，通过以下方式确定控制系统的前馈传递函数：（a）通过迭代学习控制将控制系统的前馈输出信号迭代学习到指定的设定值信号（ b）确定所学习的前馈输出信号和设定值信号之间的关系，并且（c）将这样的关系用作控制系统的前馈传递函数。 只能学习到一个或多个特定设定值信号的前馈可以适应于根据设定值信号给出前馈输出信号。 学习的前馈可以对设置值的变化更加鲁棒。 版权所有（C）2008，JPO＆INPIT

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