公开(公告)号：DE60043381D1

公开(公告)日：2010-01-07

申请号：DE60043381

申请日：2000-12-14

Applicant: ASML NETHERLANDS BV

Inventor： FIEDOROWICZ HENRYK ,  BIJKERK FREDERIK ,  DE BRUIJN CORNELIS CORNELIA ,  BARTNIK ANDRZEJ ,  KOSHELEV KONSTANTIN NIKOLAEVITCH ,  BANINE VADIM YEVGENYEVITCH

IPC: H01L21/027 ,  H05G2/00 ,  G03F7/20

Abstract: A radiation source of a radiation system of a lithographic projection apparatus comprises electrodes for creating a discharge in a space between them such that the discharge collapses into a pinch volume. The collapsing discharge creates a highly ionized, high temperature plasma in the pinch volume. A working fluid is ejected from a jet nozzle into the pinching volume and is thereby raised to a high temperature state and emits extreme ultraviolet radiation.