公开(公告)号：JP2010045400A

公开(公告)日：2010-02-25

申请号：JP2009264762

申请日：2009-11-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BAKKER LEVINUS P ,  BANINE VADIM YEVGENYEVICH ,  IVANOV VLADIMIR VITALEVITCH ,  KOSHELEV KONSTANTIN NIKOLAEVITCH ,  MERTENS BASTIAAN MATTHIAS ,  MOORS JOHANNES HUBERTUS JOSEPHINA ,  SCHUURMANS FRANK JEROEN PIETER ,  ZUKAVISHVILI GIVI GEORGIEVITCH ,  WOLSCHRIJN BASTIAAN THEODOOR ,  VAN DER VELDEN MARC H L

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70933 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70916

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus which reduces sputtering due to gas that has been introduced in an optical path of a projection beam, and to provide a device manufacturing method. SOLUTION: The lithographic apparatus is arranged to project a beam from a radiation source onto a substrate. The lithographic apparatus includes an optical element in an optical path of the beam, a gas inlet for introducing gas into the optical path of the beam so that the gas will be ionized by the beam to create an electric field toward the optical element, and a gas source coupled to the gas inlet for supplying the gas. The gas has a threshold value of kinetic energy for sputtering the optical element that is greater than a kinetic energy developed by ions of the gas in the electric field. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻设备，其减少由于在投影光束的光路中引入的气体引起的溅射，并提供器件制造方法。 解决方案：光刻设备被布置成将来自辐射源的光束投射到基板上。 光刻设备包括光束的光路中的光学元件，用于将气体引入光束的光路中的气体入口，使得气体将被光束离子化以产生朝向光学元件的电场，并且 气体源耦合到用于供应气体的气体入口。 气体具有用于溅射光学元件的动能的阈值，其大于由电场中的气体的离子产生的动能。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2011082551A

公开(公告)日：2011-04-21

申请号：JP2010270657

申请日：2010-12-03

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： RAKHIMOVA TATYANA V ,  BANINE VADIM YEVGENYEVICH ,  IVANOV VLADIMIR VITALEVITCH ,  KOSHELEV KONSTANTIN NIKOLAEVITCH ,  MOORS JOHANNES HUBERTUS JOSEPHINA ,  KOVALEV ALEKSANDER S ,  LOPAEV DMITRIY VICTOROVICH

IPC: H01L21/027

CPC classification number: G03F7/70925 ,  G03F7/70933 ,  G21K2201/06

Abstract: PROBLEM TO BE SOLVED: To provide a method for cleaning elements of a lithographic device, for example, optical elements such as a collector mirror. SOLUTION: The method for cleaning the elements includes the steps of: providing a gas 155 containing nitrogen; generating nitrogen radicals from at least a part of the gas, thereby forming a radical containing gas 165; and providing at least a part of the radical containing gas to the one or more elements 100 of the apparatus. The lithographic apparatus includes a source and an optical element 100, and an electrical discharge generator 200 arranged so as to generate a radio frequency discharge. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种清洁光刻设备元件的方法，例如诸如集光镜的光学元件。 解决方案：用于清洁元件的方法包括以下步骤：提供含氮的气体155; 从气体的至少一部分产生氮自由基，从而形成含有基团的气体165; 以及向装置的一个或多个元件100提供至少一部分含自由基的气体。 光刻设备包括源和光学元件100以及布置成产生射频放电的放电发生器200。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010003687A

公开(公告)日：2010-01-07

申请号：JP2009138240

申请日：2009-06-09

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： GLUSHKOV DENIS ,  BANINE VADIM YEVGENYEVICH ,  VLADIMIR VITALEVICH IVANOV ,  KOSHELEV KONSTANTIN NIKOLAEVITCH ,  ZUKAKISHVILI GIVI GEORGIEVICH ,  KRIVTSUN VLADIMIR MIHAILOVITCH ,  SIDELNIKOV YURII VICTOROVITCH ,  GIELISSEN KURT ,  YAKUSHEV OLEG

IPC: H05G2/00 ,  G03F7/20 ,  H01L21/027

CPC classification number: H05G2/003 ,  G03F7/70033 ,  H05G2/008

Abstract: PROBLEM TO BE SOLVED: To provide a discharge forming plasma radiation source, and a method of forming radiation using the discharge forming plasma radiation source to reduce the number of formed high-speed (high-energy) ions.
SOLUTION: The discharge forming plasma radiation source includes a laser beam pulse generator constituted so as to induce a pinch in the plasma of the discharge forming plasma radiation source by providing a laser beam pulse. The laser beam pulse generator is constituted so as to provide the laser beam pulse having larger energy than the most suitable laser beam pulse energy corresponding to the maximum output of the radiation of a prescribed wavelength with respect to prescribed discharge energy.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种放电形成等离子体辐射源，以及使用放电形成等离子体辐射源形成辐射的方法，以减少形成的高速（高能）离子的数量。 解决方案：放电形成等离子体辐射源包括激光束脉冲发生器，其被构造成通过提供激光束脉冲在放电形成等离子体辐射源的等离子体中引起夹紧。 激光束脉冲发生器被构造成提供激光束脉冲，其具有比对应于规定波长的辐射的最大输出相对于规定的放电能量的最合适的激光束脉冲能量更大的能量。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：WO2008072962A3

公开(公告)日：2008-10-16

申请号：PCT/NL2007050645

申请日：2007-12-13

Applicant: ASML NETHERLANDS BV ,  VAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS ,  BANINE VADIM YEVGENYEVICH ,  IVANOV VLADIMIR VITALEVITCH ,  KOSHELEV KONSTANTIN NIKOLAEVITCH ,  KLUNDER DERK JAN WILFRED

Inventor： VAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS ,  BANINE VADIM YEVGENYEVICH ,  IVANOV VLADIMIR VITALEVITCH ,  KOSHELEV KONSTANTIN NIKOLAEVITCH ,  KLUNDER DERK JAN WILFRED

IPC: H05G2/00 ,  G03F7/20

CPC classification number: H05G2/003 ,  B82Y10/00 ,  G03F7/70033 ,  H05G2/005

Abstract: The invention relates to a radiation system for generating electromagnetic radiation. The radiation system includes a pair of electrodes (5) constructed and arranged to generate plasma of a first substance and a pinch (10) in the plasma. The radiation system also includes a plasma recombination surface (13) that is arranged proximate to the pinch, and is configured to neutralize a plurality of plasma particles.

Abstract translation: 本发明涉及一种用于产生电磁辐射的辐射系统。 辐射系统包括一对电极（5），其构造和布置成在等离子体中产生第一物质和夹点（10）的等离子体。 辐射系统还包括等离子体复合表面（13），该等离子体复合表面（13）被布置成靠近夹点，并且被配置为中和多个等离子体颗粒。

公开(公告)号：WO2009116867A3

公开(公告)日：2009-11-12

申请号：PCT/NL2009050132

申请日：2009-03-20

Applicant: ASML NETHERLANDS BV ,  KRIVTSUN VLADIMIR MIHAILOVITC ,  BANINE VADIM YEVGENYEVICH ,  BLEEKER ARNO JAN ,  IVANOV VLADIMIR VITALEVITCH ,  KOSHELEV KONSTANTIN NIKOLAEVIT ,  MOORS JOHANNES HUBERTUS JOSEPH ,  CHURILOV SERGEY ,  GLUSHKOV DENIS

Inventor： KRIVTSUN VLADIMIR MIHAILOVITC ,  BANINE VADIM YEVGENYEVICH ,  BLEEKER ARNO JAN ,  IVANOV VLADIMIR VITALEVITCH ,  KOSHELEV KONSTANTIN NIKOLAEVITCH ,  MOORS JOHANNES HUBERTUS JOSEPHINA ,  CHURILOV SERGEY ,  GLUSHKOV DENIS

IPC: H05G2/00

CPC classification number: H05G2/003 ,  H05G2/005 ,  H05G2/008

Abstract: A target material is configured to be used in a source constructed and arranged to generate a radiation beam having a wavelength in a 6.8 nm range. The target material includes a Gd-based composition configured to modify a melting temperature of Gd, or Tb, or a Tb-based composition configured to reduce a melting temperature of Tb.

Abstract translation: 目标材料被配置为用于构造和布置成产生具有6.8nm范围波长的辐射束的源。 目标材料包括配置成改变Gd或Tb的熔融温度的Gd基组合物或构造成降低Tb的熔融温度的Tb基组合物。

公开(公告)号：AT482607T

公开(公告)日：2010-10-15

申请号：AT05106446

申请日：2005-07-14

Applicant: ASML NETHERLANDS BV

Inventor： KOSHELEV KONSTANTIN NIKOLAEVITCH ,  IVANOV VLADIMIR VITALEVITCH ,  KOROB EVGENII DMITREEVITCH ,  ZUKAVISHVILI GIVI GEORGIEVITCH ,  GAYAZOV ROBERT RAFILEVITCH ,  KRIVTSUN VLADIMIR MIHAILOVITCH

IPC: H05G2/00

Abstract: A device for generating radiation based on a discharge includes a cathode (33k) and an anode (33a). The cathode and anode material are supplied in fluid state. The material forms a plasma pinch when the device is in use. Optionally, nozzles (31) may be used to supply the material. The cathode and/or anode may form a flat surface. The trajectories (33) of the material may be elongated. A laser (37) may be used to cause the discharge more easily. The laser may be directed on the anode or cathode or on a separate material located in between the anode and cathode.

公开(公告)号：DE602005023696D1

公开(公告)日：2010-11-04

申请号：DE602005023696

申请日：2005-07-14

Applicant: ASML NETHERLANDS BV

Inventor： KOSHELEV KONSTANTIN NIKOLAEVITCH ,  IVANOV VLADIMIR VITALEVITCH ,  KOROB EVGENII DMITREEVITCH ,  ZUKAVISHVILI GIVI GEORGIEVITCH ,  GAYAZOV ROBERT RAFILEVITCH ,  KRIVTSUN VLADIMIR MIHAILOVITCH

IPC: H05G2/00

公开(公告)号：DE60139532D1

公开(公告)日：2009-09-24

申请号：DE60139532

申请日：2001-06-29

Applicant: ASML NETHERLANDS BV

Inventor： KOSHELEV KONSTANTIN NIKOLAEVITCH ,  BIJKERK FREDERIK ,  ZUKAVISHVILI GIVI GEORGIEVITCH ,  KOROP EVGENII DMITREEVITCH ,  IVANOV VLADIMIR VITAL EVITCH

IPC: G21K5/02 ,  H05G2/00 ,  G03F7/20 ,  H01L21/027 ,  H05H1/24

Abstract: A radiation source comprises an anode and a cathode for creating a discharge in a gas or vapor in a space between anode and cathode and to form a plasma of a working gas or vapor so as to generate electromagnetic radiation. The cathode comprises a hollow cavity having an aperture that has a substantially annular configuration around a central axis of said radiation source for initiating the discharge. A driver gas or vapor is supplied to the cathode cavity and the working gas or vapor is supplied in a region around the central axis in between anode and cathode. The working gas or vapor may comprise xenon, lithium vapor and tin vapor.

公开(公告)号：DE602006021680D1

公开(公告)日：2011-06-16

申请号：DE602006021680

申请日：2006-09-14

Applicant: ASML NETHERLANDS BV

Inventor： RAKHIMOVA TATYANA VICTOROVNA ,  BANINE VADIM YEVGENYEVICH ,  IVANOV VLADIMIR VITALEVITCH ,  KOSHELEV KONSTANTIN NIKOLAEVITCH ,  MOORS JOHANNES HUBERTUS JOSEPHINA ,  KOVALEV ALEKSANDER SERGEEVICH ,  LOPAEV DMITRIY VICTOROVICH

IPC: G03F7/20

公开(公告)号：DE60043381D1

公开(公告)日：2010-01-07

申请号：DE60043381

申请日：2000-12-14

Applicant: ASML NETHERLANDS BV

Inventor： FIEDOROWICZ HENRYK ,  BIJKERK FREDERIK ,  DE BRUIJN CORNELIS CORNELIA ,  BARTNIK ANDRZEJ ,  KOSHELEV KONSTANTIN NIKOLAEVITCH ,  BANINE VADIM YEVGENYEVITCH

IPC: H01L21/027 ,  H05G2/00 ,  G03F7/20

Abstract: A radiation source of a radiation system of a lithographic projection apparatus comprises electrodes for creating a discharge in a space between them such that the discharge collapses into a pinch volume. The collapsing discharge creates a highly ionized, high temperature plasma in the pinch volume. A working fluid is ejected from a jet nozzle into the pinching volume and is thereby raised to a high temperature state and emits extreme ultraviolet radiation.