Radiation source for lithographic projection apparatus
    1.
    发明专利
    Radiation source for lithographic projection apparatus 有权
    光栅投影装置的辐射源

    公开(公告)号:JP2007329484A

    公开(公告)日:2007-12-20

    申请号:JP2007155698

    申请日:2007-06-12

    CPC classification number: H05G2/003 G03F7/70033

    Abstract: PROBLEM TO BE SOLVED: To provide an improved plasma source that can be used as a radiation source for a lithographic projection apparatus and emits extreme ultraviolet radiations (EUV). SOLUTION: A radiation source 220 of a radiation system of a lithographic projection apparatus comprises electrodes 221 and 222 generating an electric discharge between them in such a manner that the electric discharge collapses into a pinch volume 229. The collapsing electric discharge generates a high-temperature plasma that is highly ionized in the pinch volume. The working fluid of a supply source 227 is ejected into the pinch volume from an injection nozzle. Thereby, it is raised up to the high-temperature state, and far ultraviolet rays PB are emitted. COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题:提供可用作光刻投影设备的辐射源并发射极紫外辐射(EUV)的改进的等离子体源。 解决方案:光刻投影设备的辐射系统的辐射源220包括电极221和222,它们以这样的方式产生它们之间的放电,使得放电塌陷成压缩体积229.塌陷放电产生 在压缩体积中高度电离的高温等离子体。 供应源227的工作流体从喷嘴喷射到压缩容积中。 由此,升高到高温状态,发出远紫外线PB。 版权所有(C)2008,JPO&INPIT

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