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公开(公告)号:JP2007329484A
公开(公告)日:2007-12-20
申请号:JP2007155698
申请日:2007-06-12
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor: FIEDOROWICZ HENRYK , BIJKERK FREDERIK , DE BRUIJN CORNELIS C , BARTNIK ANDRZEJ , KOSHELEV KONSTANTIN NIKOLAEVIT , BANINE VADIM YEVGENYEVICH
CPC classification number: H05G2/003 , G03F7/70033
Abstract: PROBLEM TO BE SOLVED: To provide an improved plasma source that can be used as a radiation source for a lithographic projection apparatus and emits extreme ultraviolet radiations (EUV). SOLUTION: A radiation source 220 of a radiation system of a lithographic projection apparatus comprises electrodes 221 and 222 generating an electric discharge between them in such a manner that the electric discharge collapses into a pinch volume 229. The collapsing electric discharge generates a high-temperature plasma that is highly ionized in the pinch volume. The working fluid of a supply source 227 is ejected into the pinch volume from an injection nozzle. Thereby, it is raised up to the high-temperature state, and far ultraviolet rays PB are emitted. COPYRIGHT: (C)2008,JPO&INPIT
Abstract translation: 要解决的问题:提供可用作光刻投影设备的辐射源并发射极紫外辐射(EUV)的改进的等离子体源。 解决方案:光刻投影设备的辐射系统的辐射源220包括电极221和222,它们以这样的方式产生它们之间的放电,使得放电塌陷成压缩体积229.塌陷放电产生 在压缩体积中高度电离的高温等离子体。 供应源227的工作流体从喷嘴喷射到压缩容积中。 由此,升高到高温状态,发出远紫外线PB。 版权所有(C)2008,JPO&INPIT
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公开(公告)号:DE60043381D1
公开(公告)日:2010-01-07
申请号:DE60043381
申请日:2000-12-14
Applicant: ASML NETHERLANDS BV
Inventor: FIEDOROWICZ HENRYK , BIJKERK FREDERIK , DE BRUIJN CORNELIS CORNELIA , BARTNIK ANDRZEJ , KOSHELEV KONSTANTIN NIKOLAEVITCH , BANINE VADIM YEVGENYEVITCH
IPC: H01L21/027 , H05G2/00 , G03F7/20
Abstract: A radiation source of a radiation system of a lithographic projection apparatus comprises electrodes for creating a discharge in a space between them such that the discharge collapses into a pinch volume. The collapsing discharge creates a highly ionized, high temperature plasma in the pinch volume. A working fluid is ejected from a jet nozzle into the pinching volume and is thereby raised to a high temperature state and emits extreme ultraviolet radiation.
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公开(公告)号:DE60139532D1
公开(公告)日:2009-09-24
申请号:DE60139532
申请日:2001-06-29
Applicant: ASML NETHERLANDS BV
Inventor: KOSHELEV KONSTANTIN NIKOLAEVITCH , BIJKERK FREDERIK , ZUKAVISHVILI GIVI GEORGIEVITCH , KOROP EVGENII DMITREEVITCH , IVANOV VLADIMIR VITAL EVITCH
IPC: G21K5/02 , H05G2/00 , G03F7/20 , H01L21/027 , H05H1/24
Abstract: A radiation source comprises an anode and a cathode for creating a discharge in a gas or vapor in a space between anode and cathode and to form a plasma of a working gas or vapor so as to generate electromagnetic radiation. The cathode comprises a hollow cavity having an aperture that has a substantially annular configuration around a central axis of said radiation source for initiating the discharge. A driver gas or vapor is supplied to the cathode cavity and the working gas or vapor is supplied in a region around the central axis in between anode and cathode. The working gas or vapor may comprise xenon, lithium vapor and tin vapor.
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