公开(公告)号：SG117435A1

公开(公告)日：2005-12-29

申请号：SG200300822

申请日：2003-02-27

Applicant: ASML NETHERLANDS BV

Inventor： JOERI LOF ,  HENRICUS WILHELMUS MARIA VAN B ,  CHENG-QUN GUI ,  FRANSISCUS GODEFRIDUS CASPER B

IPC: G03F9/02 ,  G03F9/00 ,  H01L21/027

Abstract: To calibrate a front-to-backside alignment system a transparent calibration substrate with reference markers on opposite sides is used. A plane plate is inserted to displace the focal position of the alignment system from the top to bottom surface of the calibration substrate.

公开(公告)号：SG143184A1

公开(公告)日：2008-06-27

申请号：SG2007179252

申请日：2007-11-19

Applicant: ASML NETHERLANDS BV

Inventor： CHENG-QUN GUI ,  MARIA PELLENS RUDY JAN

Abstract: Lithographic Apparatus and Method In an embodiment, a ring seal forming apparatus is disclosed, the apparatus including a substrate holder arranged to hold a substrate coated at least in part with resist, and a deep ultraviolet radiation outlet configured to irradiate an area of the resist, relative movement between the substrate holder and the deep ultraviolet radiation outlet being possible, the movement being arranged such that, in use of the apparatus, the area of resist irradiated by the deep ultraviolet radiation outlet is ring- shaped.

公开(公告)号：SG118419A1

公开(公告)日：2006-01-27

申请号：SG200504123

申请日：2005-06-28

Applicant: ASML NETHERLANDS BV

Inventor： PIETER WILLEM HERMAN DE JAGER ,  CHENG-QUN GUI ,  PETER SPIT ,  EDUARD HOEBERICHTS

公开(公告)号：SG148015A1

公开(公告)日：2008-12-31

申请号：SG2004029625

申请日：2004-05-26

Applicant: ASML NETHERLANDS BV

Inventor： GEORGE RICHARD ALEXANDER ,  CHENG-QUN GUI ,  DE JAGER PIETER WILLEM HERMAN ,  VAN LEEUWEN ROBBERT EDGAR ,  BURGHOORN JACOBUS

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/027

Abstract: Lithographic Apparatus and Device Manufacturing Method Lithographic apparatus in which alignment marks on the substrate are inspected during the exposure of the substrate to optimize the exposure conditions.

公开(公告)号：SG144718A1

公开(公告)日：2008-08-28

申请号：SG2004026126

申请日：2004-05-14

Applicant: ASML NETHERLANDS BV

Inventor： VAN BUEL HENRICUS WILHELMUS MA ,  CHENG-QUN GUI ,  DE VRIES ALEX

IPC: G03F9/00 ,  H01L21/027

Abstract: A Method of Calibrating a Lithographic Apparatus, an Alignment Method, a Computer Program, a Lithographic Apparatus and a Device Manufacturing Method A method of compensating for the distortion of front-to-backside alignment optics in which displacement vector between the estimated position of a substrate mark and the actual position of a substrate mark is calculated. An optical correction array is also calculated by moving a reference substrate by a fixed amount and comparing how far an image of a point on the back side of a reference substrate moves to how far a corresponding point on the front side of the substrate moves. The displacement vector and optical correction array are then used to accurately calculate the position of further substrates. The front-to-backside alignment optics may be sufficiently large to simultaneously project a plurality of marks through each branch. A reference mark is implanted in the object window of the front-to-backside alignment optics and a relative change in the position of the images of the reference mark and substrate mark projected through a single branch of the front-to-backside alignment optics can indicate a change in the optical characteristics of the front-to-backside alignment optics.

公开(公告)号：SG143179A1

公开(公告)日：2008-06-27

申请号：SG2007178833

申请日：2007-11-19

Applicant: ASML NETHERLANDS BV

Inventor： FRANK BEST KEITH ,  CHENG-QUN GUI ,  CHRISTOPHER OCKWELL DAVID ,  PETER TEN BERGE

Abstract: Lithographic Apparatus and Method In an embodiment, a ring seal forming apparatus is disclosed, the apparatus including a substrate holder arranged to hold a substrate coated at least in part with resist, and a heating device configured to heat an area of the resist, relative movement between the substrate holder and heating device being possible, the movement being arranged such that, in use of the apparatus, the area of resist heated by the heating device is ring-shaped.