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    Method of performing tilted focus testing, exposure apparatus, and device manufactured accordingly
    1.
    发明专利
    Method of performing tilted focus testing, exposure apparatus, and device manufactured accordingly 审中-公开
    执行倾斜焦点测试，曝光装置和制造的装置的方法

    公开(公告)号：JP2006210895A

    公开(公告)日：2006-08-10

    申请号：JP2005372890

    申请日：2005-12-26

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： MARTINUS HENDRIKUS ANTONIUS LE ,  DEN BOEF ARIE J ,  BURGHOORN JACOBUS ,  MICKAN UWE ,  VANNER ROELAND NICOLAAS MARIA ,  HAUSCHILD JAN

    IPC: H01L21/027 ,  G01B11/00 ,  G01C3/06

    CPC classification number: G02B27/0075 ,  G03F7/70641 ,  G03F9/7026

    Abstract: PROBLEM TO BE SOLVED: To provide a method of performing a tilted focus testing and an exposure apparatus, capable of easily giving a tilt to the projection beam with a pattern using a tilting device, and capable of easily performing tilted defocus testing, and to provide a device manufactured in accordance with it. SOLUTION: In order to tilt the at least one reflective device to the second orientation, a device for tilting is used. A step for supplying the second projection beam with a tilt to the above first projection beam, and a step for producing a second projected radiation beam onto the target object, are provided along with a step for determining a lateral shift of the first and second projected radiation beams on the target object and, determining from the lateral shift a defocus of the target object with respect to the projected radiation beam. COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：为了提供一种执行倾斜聚焦测试和曝光设备的方法，其能够使用倾斜装置以容易地使用倾斜装置的图案倾斜到投影光束，并且能够容易地进行倾斜散焦测试， 并提供根据其制造的装置。 解决方案：为了将至少一个反射装置倾斜到第二取向，使用倾斜装置。 提供将第二投影光束向上述第一投影光束提供倾斜的步骤，以及用于产生第二投影辐射束到目标物体上的步骤，以及用于确定第一和第二投影光束的横向偏移的步骤 在目标物体上的辐射束，并且从横向偏移确定目标物体相对于投射的辐射束的散焦。 版权所有（C）2006，JPO＆NCIPI

    Marker structure to control positioning each layer of multi-layer substrate and its method
    5.
    发明专利
    Marker structure to control positioning each layer of multi-layer substrate and its method 有权
    控制多层基板各层定位的标记结构及其方法

    公开(公告)号：JP2006140500A

    公开(公告)日：2006-06-01

    申请号：JP2005327563

    申请日：2005-11-11

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： VAN HAREN RICHARD JOHANNES FRA ,  DEN BOEF ARIE JEFFREY ,  BURGHOORN JACOBUS ,  VAN DER SCHAAR MAURITS ,  RIJPERS BARTOLOMEUS P

    IPC: H01L21/027 ,  G03F9/00

    CPC classification number: H01L23/544 ,  G03F7/70633 ,  G03F9/7049 ,  G03F9/7065 ,  G03F9/7076 ,  G03F9/7092 ,  H01L2223/54453 ,  H01L2924/0002 ,  H01L2924/00

    Abstract: PROBLEM TO BE SOLVED: To provide a marker structure to be used by a lithography system which is equipped with a first radiant source to produce a radiation having a first wavelength and a positioning system which includes a second radiant source to produce a radiation having a second wavelength. SOLUTION: The second wavelength is larger than the first wavelength. The marker structure is equipped with the first layer and the second layer. The second layer directly or indirectly exists on the first layer. The first layer has a first periodic structure, and the second layer has a second periodic structure. At least the other periodic structure has a plurality of features having a size smaller than 400 nm at least in one direction. The combination of the first periodic structure and the second periodic structure forms a diffraction structure which is composed to be illuminated by a radiation having the second wavelength. COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：提供一种由光刻系统使用的标记结构，其被配备有第一辐射源以产生具有第一波长的辐射和定位系统，该定位系统包括第二辐射源以产生辐射 具有第二波长。

    解决方案：第二波长大于第一波长。 标记结构配备有第一层和第二层。 第二层直接或间接存在于第一层上。 第一层具有第一周期性结构，第二层具有第二周期性结构。 至少另一个周期性结构具有至少在一个方向上具有小于400nm的尺寸的多个特征。 第一周期结构和第二周期结构的组合形成衍射结构，该衍射结构被具有第二波长的辐射照射。 版权所有（C）2006，JPO＆NCIPI

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