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公开(公告)号：NL2006615A
公开(公告)日：2011-11-14
申请号：NL2006615
申请日：2011-04-18
Applicant: ASML NETHERLANDS BV
Inventor： CORTIE ROGIER , RIEPEN MICHEL , CORNELISSEN ROB
IPC: G03F7/20
Abstract: A fluid handling structure for a lithographic apparatus is disclosed. The fluid handling structure has, on an undersurface, a liquid supply opening or a plurality of liquid supply openings and a liquid extraction opening or a plurality of liquid extraction openings arranged such that, in use, liquid is provided on and removed from the undersurface of the fluid handling structure.
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