公开(公告)号：KR20100135198A

公开(公告)日：2010-12-24

申请号：KR20100056706

申请日：2010-06-15

Applicant: ASML NETHERLANDS BV

Inventor： DIRECKS DANIEL JOZEF MARIA ,  KEMPER NICOLAAS RUDOLF ,  PHILIPS DANNY MARIA HUBERTUS ,  RIEPEN MICHEL ,  VAN DEN DUNGEN CLEMENS JOHANNES GERARDUS ,  SCHEPERS MAIKEL ADRIANUS CORNELIS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  H01L21/0274 ,  G03F7/2041 ,  G03F7/7085

Abstract: PURPOSE: A lithography apparatus, a method for controlling the same, and a method for manufacturing a device using the same are provided to reduce the generation risk of imaging defects by supplying immersing liquid into a space between a projection system and an opposite surface. CONSTITUTION: Patterned radiation beam directs toward a substrate through a projection system. The substrate is supported by a table. A liquid handling system supplies immersing liquid into a space between the projection system and an opposite surface. The structure of an opening(70) affects the influence of a liquid handling structure(12) in which the liquid is contained. A controller controls the operation of the table with respect to the liquid handling system.

Abstract translation: 目的：提供一种光刻设备及其控制方法，以及使用该方法的设备的制造方法，以通过将浸入液体供入投影系统与相对面之间的空间来降低成像缺陷的产生风险。 构成：图案化的辐射束通过投影系统指向衬底。 基板由桌子支撑。 液体处理系统将浸入液体提供到投影系统和相对表面之间的空间中。 开口（70）的结构影响液体处理结构（12）的含有液体的影响。 控制器控制工作台相对于液体处理系统的操作。

公开(公告)号：JP2012147039A

公开(公告)日：2012-08-02

申请号：JP2012109711

申请日：2012-05-11

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： GRAAF ROELOF FREDERICK DE ,  LAMBERTUS DONDERS SJOERD NICOLAAS ,  HOOGENDAM CHRISTIAAN A ,  JANSEN HANS ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  LIEBREGTS PAULUS MARTINUS MARIA ,  JEROEN JOHANNES SOPHIA MARIA MERTENS ,  STREEFKERK BOB ,  VAN DER TOORN JAN-GERARD C ,  RIEPEN MICHEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic projection apparatus in which measures are taken to prevent or reduce presence of bubbles in liquid through which radiated projection beam passes.SOLUTION: This provision may be done, for example, by ensuring that a gap between a substrate and a substrate table is filled with immersion liquid or by causing a localized flow toward radial outside direction from an optical axis in the vicinity of an edge of the substrate.

Abstract translation: 要解决的问题：提供一种光刻投影装置，其中采取措施来防止或减少辐射投射光束通过的液体中气泡的存在。 解决方案：这种设置可以通过例如通过确保衬底和衬底台之间的间隙被浸没液体填充或者通过使得从位于其附近的光轴朝向径向外侧方向的局部流动来实现 衬底的边缘。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2010219510A

公开(公告)日：2010-09-30

申请号：JP2010029605

申请日：2010-02-15

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STAVENGA MARCO KOERT ,  KEMPER NICOLAAS R ,  ANTONIUS LEENDERS MARTINUS HENDRIKUS ,  LIEBREGTS PAULUS MARTINUS MARIA ,  HUBERTUS MULKENS JOHANNES C ,  EUMMELEN ERIK HENRICUS EGIDIUS CATHARINA ,  MOERMAN RICHARD ,  RIEPEN MICHEL ,  SERGEI SHULEPOV ,  BRANDS GERT-JAN GERARDUS JOHANEES THOMAS ,  STEFFENS KOEN ,  CROMWIJK JAN WILLEM ,  MEIJERS RALPH JOSEPH ,  FABRIZIO EVANGELISTA ,  BESSEMS DAVID ,  LI HUA ,  JOCHEMSEN MARINUS ,  GUNTHER PIETER LEIN JOSEPH ,  BELL FRANCISCUS WILHELMUS ,  WITBERG ERIK ,  SMITS MARCUS AGNES JOHANNES ,  MA ZHENHUA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus, a method of controlling the same, and a device manufacturing method, wherein defects of imaging are reduced or eliminated. SOLUTION: The method includes the steps of: moving a substrate table supporting a substrate relative to a projection system; and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area at or near an edge of the substrate, and/or adjusting the stepping speed between adjacent target positions in a predefined area at or near the edge of the substrate. The step of adjusting the scanning and/or stepping speed may comprise lowering the speed. The projection system is configured to project a patterned beam of radiation onto a target portion of the substrate. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻设备，其控制方法以及减少或消除成像缺陷的器件制造方法。 解决方案：该方法包括以下步骤：相对于投影系统移动支撑衬底的衬底台; 以及在所述基板的边缘处或附近的预定区域内的目标成像期间调整所述基板台和所述投影系统之间的扫描速度，和/或调整所述基板的边缘处或其附近的预定区域中的相邻目标位置之间的步进速度 衬底的边缘。 调整扫描和/或步进速度的步骤可以包括降低速度。 投影系统被配置为将图案化的辐射束投影到基板的目标部分上。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2010118713A

公开(公告)日：2010-05-27

申请号：JP2010048947

申请日：2010-03-05

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  GRAAF ROELOF FREDERICK DE ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  MERTENS JEROEN JOHANNES SOPHIA MARIA ,  RIEPEN MICHEL

IPC: H01L21/027

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide an immersion lithographic apparatus suitable for preventing or reducing production of bubbles by preventing the bubbles from escaping from one or more gaps in a substrate table to a path of a radiation beam, or extracting the bubbles that may be produced in the gaps. SOLUTION: This lithographic apparatus is configured to project an image of a desired pattern on a substrate W, which is held on a substrate table WT, through a liquid. In the lithographic apparatus, gaps 22 are formed inside a surface of the substrate table between the substrate table and an outer edge of a substrate, or between the substrate table and another component that is arranged thereon and brought into contact with the liquid in normal use. The lithographic apparatus is composed by arranging, in the gap, a bubble holding device configured to hold bubbles 24 that may be produced in the gap. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种浸没式光刻设备，其适用于通过防止气泡从衬底台中的一个或多个间隙逸出到辐射束的路径来防止或减少气泡的产生，或提取气泡， 可能在间隙中产生。 解决方案：该光刻设备被配置为通过液体将保持在衬底台WT上的衬底W投影所需图案的图像。 在光刻设备中，间隙22形成在衬底台的表面之间，衬底台与衬底的外边缘之间，或衬底台与另一部件之间，在正常使用中与其配置并与液体接触 。 光刻设备通过在间隙中布置构造成保持可能在间隙中产生的气泡24的气泡保持装置而构成。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009290212A

公开(公告)日：2009-12-10

申请号：JP2009126877

申请日：2009-05-26

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： CLOIN CHRISTIAN GERARDUS NORBE ,  KATE NICOLAAS TEN ,  KEMPER NICOLAAS R ,  STAVENGA MARCO KOERT ,  EUMMELEN ERIK HENRICUS EGIDIUS ,  RIEPEN MICHEL ,  ELISSEEVA OLGA VLADIMIROVNA ,  GUNTHER WILFRED MATHIJS ,  VAN DER WEKKEN MICHAEL CHRISTI

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70733

Abstract: PROBLEM TO BE SOLVED: To disclose a lithographic projection apparatus that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. SOLUTION: The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the substrate table, or (iii) a surface of the shutter member, or (iv) an arbitrary combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：公开一种包括工作台，活门构件，流体处理结构和流体抽出系统的光刻投影装置。 流体处理结构可以被配置为在投影系统和（i）基板之间供应和限制液体，或（ii）基板台，或（iii）挡板部件的表面，或（iv ）选自（i） - （iii）中的任意组合。 活门构件的表面可以与桌子的表面邻接并且共面。 活门构件和桌子的表面可以间隔开间隙。 流体提取系统可以构造成从间隙去除液体。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009272636A

公开(公告)日：2009-11-19

申请号：JP2009112621

申请日：2009-05-07

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： RIEPEN MICHEL ,  KEMPER NICOLAAS R ,  VERMEULEN JOHANNES PETRUS MART ,  DIREKS DANIEL JOSEPH MARIA ,  DANNY MARIA HUBERTUS PHILIPS ,  VAN PUTTEN ARNOLD JAN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03B27/52 ,  G03F7/70341 ,  G03F7/70916

Abstract: PROBLEM TO BE SOLVED: To disclose a liquid immersion lithographic device for immersing a substrate in a lithography projection device in a liquid having a relatively high refractive index such as water so as to fill a space between the final element of a projection system and the substrate. SOLUTION: In the liquid immersion lithographic device, a liquid removing device is configured so as to remove the liquid from the substrate through a plurality of slender slots disposed along a line and also having an angle to the line, for example during exposure. The liquid removing device can act as a meniscus-fixed fixing device in a liquid immersion hood or used in a drying device for removing a liquid droplet from the substrate. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：公开一种用于将光刻投影装置中的基板浸入具有较高折射率的液体如液体的液浸式光刻装置，以填充投影系统的最终元件之间的空间 和基板。 解决方案：在液浸式光刻设备中，液体移除装置被配置成通过沿着一条线设置的多个细长的狭缝从衬底中移除液体，并且还具有与线的角度，例如在曝光期间 。 液体移除装置可以用作液浸罩中的弯液面固定固定装置，或用于从基板除去液滴的干燥装置中。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2008085370A

公开(公告)日：2008-04-10

申请号：JP2007324518

申请日：2007-12-17

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  DONDERS SJOERD NICOLAAS LAMBER ,  GRAAF ROELOF FREDERICK DE ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  LEENDERS MARTINUS HENDRIKUS AN ,  MERTENS JEROEN JOHANNES SOPHIA ,  RIEPEN MICHEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide immersion lithography equipment suitable for preventing or reducing generation of bubbles by preventing bubbles from leaking to a radiation beam passage through one or more gaps in a substrate table, or by extracting bubbles possibly generated in the gap. SOLUTION: The lithography equipment is configured to project a desired pattern image on a substrate W held on a substrate table WT through liquid; in the surface of the substrate table, a gap 22 exists between the substrate table and the outer edge of the substrate, or between the substrate table and other component which comes in contact with the liquid during normal use; and a bubble holding device configured to hold bubbles 24 possibly generated in the gap is provided in the gap. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：通过防止气泡通过衬底台中的一个或多个间隙而泄漏到辐射束通道中，或通过提取可能在间隙中产生的气泡来提供适于防止或减少气泡产生的浸没式光刻设备 。 解决方案：光刻设备被配置为通过液体在保持在衬底台WT上的衬底W上投影所需图案图像; 在基板台的表面上，在正常使用之间，在基板台与基板的外边缘之间，或基板台与与液体接触的其它部件之间存在间隙22; 并且在所述间隙中设置气泡保持装置，所述气泡保持装置构造成保持可能在间隙中产生的气泡24。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2006313904A

公开(公告)日：2006-11-16

申请号：JP2006123549

申请日：2006-04-27

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  LAMBERTUS DONDERS SJOERD NICOL ,  GRAAF ROELOF FREDERICK DE ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JANSEN HANS ,  MARTINUS HENDRIKUS ANTONIUS LE ,  LIEBREGTS PAULUS MARTINUS MARI ,  MERTENS JEROEN JOHANNES SOPHIA ,  VAN DER TOORN JAN-GERARD CORNE ,  RIEPEN MICHEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/2041 ,  G03F7/3085 ,  G03F7/70058 ,  G03F7/70341 ,  G03F7/70825 ,  G03F7/70875 ,  G03F7/70916 ,  G03F2007/2067 ,  H01L21/0274 ,  H01L21/67098

Abstract: PROBLEM TO BE SOLVED: To reduce generation of bubbles in immersion liquid and to reduce evaporation of immersion liquid. SOLUTION: Liquid immersion lithography equipment is provided with a liquid confinement structure for defining a space arranged to contain liquid between a projection system and a substrate at least partially. In order to decrease crossing of the edge of a substrate for forming an image (which may cause inclusion of bubbles in immersion liquid), cross-sectional area of the space is minimized in a plane parallel with the substrate. Minimum theoretical size is the size of a target portion where an image is formed by the projection system. In one embodiment, profile of a final element in the projection system is altered to have the size and/or profile similar to that of the target portion in the cross-section parallel with the substrate. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：减少浸没液中气泡的产生并减少浸没液体的蒸发。 解决方案：液浸光刻设备设置有液体限制结构，用于限定至少部分地在投影系统和基板之间容纳液体的空间。 为了减少用于形成图像（可能引起浸入液体中的气泡的）的基板的边缘的交叉，在平行于基板的平面中，该空间的横截面面积被最小化。 最小理论尺寸是由投影系统形成图像的目标部分的尺寸。 在一个实施例中，投影系统中的最终元件的轮廓被改变成具有与平行于基底的横截面中的目标部分的尺寸和/或轮廓相似的尺寸和/或轮廓。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2013021331A

公开(公告)日：2013-01-31

申请号：JP2012154530

申请日：2012-07-10

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： ROGIER HENDRIX MAGDALENA CORTIE ,  KATE NICOLAAS TEN ,  ROSET NIEK JACOBUS JOHANNES ,  RIEPEN MICHEL ,  CASTELIJNS HENRICUS JOZEF ,  ROPS CORNELIUS MARIA ,  JIM VINCENT OVERKAMP

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus in which the likelihood of bubble inclusion is at least reduced.SOLUTION: A fluid handling structure for a lithographic apparatus comprises at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: meniscus pinning features to resist passage of the immersion fluid in a radially outward direction from the space; and a plurality of gas supply openings in a linear array. The plurality of gas supply openings at least partly surround one or more of the meniscus pinning features, and are placed radially outside of the meniscus pinning features. The plurality of gas supply openings in a linear array are of a similar or the same size.

Abstract translation: 要解决的问题：提供其中气泡夹杂的可能性至少降低的光刻设备。 解决方案：用于光刻设备的流体处理结构包括在从被配置为将浸没流体包含在流体处理结构外部的区域的空间的边界处：弯液面钉扎特征以阻止浸没流体沿径向向外的方向 从空间; 以及线性阵列中的多个气体供给开口。 多个气体供应开口至少部分地围绕弯月面钉扎特征中的一个或多个，并且被放置在半月板钉扎特征的径向外侧。 线性阵列中的多个气体供给开口具有相似或相同的尺寸。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2012054572A

公开(公告)日：2012-03-15

申请号：JP2011222759

申请日：2011-10-07

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： ROGER JOHANNES MARIA HUBERTUS KROONEN ,  SEBASTIAN MARIA JOHANNES CORNELISSEN ,  LAMBERTUS DONDERS SJOERD NICOLAAS ,  KATE NICOLAAS TEN ,  DER HAM RONALD V ,  ROSET NIEK JACOBUS JOHANNES ,  FRANSISCUS MATHIJS JACOBS ,  GERARDUS ARNOLDUS HENDRICUS FRANCISCUS JANSSEN ,  REINDER WIETSE ROOS ,  MATTIJS HOGELAND ,  RIEPEN MICHEL

IPC: H01L21/027

CPC classification number: G03F7/70716 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a system for removing liquid from an upper surface of a substrate table in immersion lithography.SOLUTION: An immersion lithography projection apparatus is disclosed. The apparatus comprises a substrate table for holding a substrate and a liquid feeding system for feeding liquid to the substrate. The apparatus is constructed to allow a liquid flowing outside the substrate and crossing at least two outside end parts of an upper surface of the substrate table. A shape of the end parts may be optimized in such a way as to reduce thickness of a liquid layer on the upper surface in a static state.

Abstract translation: 要解决的问题：提供一种用于在浸没式光刻中从衬底台的上表面去除液体的系统。 解决方案：公开了一种浸没光刻投影装置。 该装置包括用于保持基板的基板台和用于将液体供给到基板的液体供给系统。 该装置被构造成允许液体流过基板并且与基板台的上表面的至少两个外端部交叉。 端部的形状可以以这样的方式进行优化，以便在静态下减小上表面上的液体层的厚度。 版权所有（C）2012，JPO＆INPIT