公开(公告)号：JP2009267405A

公开(公告)日：2009-11-12

申请号：JP2009100475

申请日：2009-04-17

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE GRAAF ROELOF FREDERIK ,  VAN DER NET ANTONIUS JOHANNUS ,  STAVENGA MARCO KOERT ,  CUIJPERS JOHANNES WILHELMUS JA ,  VAN DEN HEUVEL MARTINUS WILHEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70916 ,  G03F7/70341 ,  G03F7/7085

Abstract: PROBLEM TO BE SOLVED: To provide a method of detecting particles in liquid immersion fluid in a lithography device or in liquid immersion fluid from the lithography device. SOLUTION: The method includes, using a vacuum system, extracting a sample from a single phase flow of liquid immersion fluid of a fluid handling structure of a lithography device or from a fluid handling structure. The method includes detecting particles in a sample, and when detected particles exceed a particular threshold, starting a signal. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种检测光刻装置中的液浸液体或来自光刻装置的液浸液体中的颗粒的方法。 解决方案：该方法包括使用真空系统，从光刻装置的流体处理结构的液浸流体的单相流或从流体处理结构提取样品。 该方法包括检测样品中的颗粒，并且当检测到的颗粒超过特定阈值时，启动信号。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2007318129A

公开(公告)日：2007-12-06

申请号：JP2007129288

申请日：2007-05-15

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STAVENGA MARCO KOERT ,  BRULS RICHARD JOSEPH ,  JANSEN HANS ,  ANTONIUS LEENDERS MARTINUS HEN ,  WANTEN PETER FRANCISCUS ,  CUIJPERS JOHANNES WILHELMUS JA ,  BEEREN RAYMOND GERARDUS MARIUS ,  DE JONG ANTHONIUS MARTINUS COR

IPC: H01L21/027 ,  G03F7/20

CPC classification number: H01L21/68735 ,  G03F7/70916 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To provide a method of effectively cleaning an immersion lithographic equipment. SOLUTION: The immersion lithographic equipment comprises a substrate so configured as to hold a substrate, a projection system configured to project a patterned radiation beam onto the substrate, a megasonic transducer configured to clean a surface, and a liquid supply system configured to supply a liquid between the megasonic transducer and the surface to be cleaned. The surface of the immersion lithography projector is cleaned using megasonic waves generated from the megasonic transducer configured to clean the surface. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种有效地清洗浸没式光刻设备的方法。 浸没式光刻设备包括被配置为保持基板的基板，被配置为将图案化的辐射束投影到基板上的投影系统，配置成清洁表面的兆声传感器，以及配置为 在超声波换能器和要清洁的表面之间提供液体。 浸没式光刻投影仪的表面使用由构造成清洁表面的兆声传感器产生的兆声波来清洁。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：NL1036766A1

公开(公告)日：2009-10-27

申请号：NL1036766

申请日：2009-03-24

Applicant: ASML NETHERLANDS BV

Inventor： GRAAF ROELOF FREDERIK DE ,  NET ANTONIUS JOHANNUS VAN DER ,  STAVENGA MARCO KOERT ,  CUIJPERS JOHANNES WILHELMUS JA ,  HEUVEL MARTINUS WILHELMUS VAN

IPC: G03F7/20