公开(公告)号：KR20100103425A

公开(公告)日：2010-09-27

申请号：KR20100022399

申请日：2010-03-12

Applicant: ASML NETHERLANDS BV

Inventor： STAVENGA MARCO KOERT ,  SHULEPOV SERGEI ,  STEFFENS KOEN ,  VAN LIEROP MATHEUS ANNA KAREL ,  DAVID SAMUEL BERTRAND DOMINIQUE ,  BESSEMS DAVID

IPC: H01L21/027 ,  H01L21/683 ,  H01L21/687

CPC classification number: G03F7/70716 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70866 ,  H01L21/68 ,  H01L21/68735 ,  G03F7/2041 ,  H01L21/682

Abstract: PURPOSE: A substrate table, an immersion lithography apparatus, and a method for manufacturing a device are provided to reduce the generation of defects on images by minimizing bubbles in the immersion lithography apparatus. CONSTITUTION: A pre-set size substrate(W) is contained in a recess(20). The recess includes a supporting region supporting the lower surface of the substrate and an edge. The edge is adjacently arranged to the edge of the substrate. A fluid draining system drains fluid from a gap(26) between the edges of the substrate and the recess. The fluid draining system includes a first duct(32) and a second duct(42) which are open toward the inside gap.

Abstract translation: 目的：提供一种衬底台，浸没式光刻设备及其制造方法，用于通过使浸没式光刻设备中的气泡最小化来减少图像缺陷的产生。 构成：预定尺寸的基板（W）容纳在凹部（20）中。 所述凹部包括支撑所述基板的下表面的支撑区域和边缘。 边缘相邻地布置到基板的边缘。 流体排放系统从衬底的边缘和凹部之间的间隙（26）排出流体。 流体排放系统包括朝向内部间隙开放的第一管道（32）和第二管道（42）。

公开(公告)号：KR20100039311A

公开(公告)日：2010-04-15

申请号：KR20100017706

申请日：2010-02-26

Applicant: ASML NETHERLANDS BV

Inventor： DE JONG ANTHONIUS MARTINUS COR ,  STAVENGA MARCO KOERT ,  JANSEN BAUKE ,  BEEREN RAYMOND GERARDUS MARIUS ,  HOEKERD KORNELIS TIJMEN ,  JANSEN HANS ,  WANTEN PETER FRANCISCUS ,  CUIJPERS JOHANNES WILHELMUS JACOBUS LEONARDUS

IPC: H01L21/027 ,  H01L21/02 ,  H01L21/302

CPC classification number: G03F7/70925 ,  B08B3/12 ,  G03F7/70341 ,  G03F9/7096 ,  H01L21/02041

Abstract: PURPOSE: A cleaning device, a lithography device, and a method for cleaning the lithography device are provided to efficiently clean an immersion lithographic projection apparatus using a megasonic wave through liquid. CONSTITUTION: A megasonic transducer(20) cleans the surface of an immersion lithographic projection apparatus. A liquid supply system supplies liquid between the megasonic transducer and the surface to be cleaned. A cleaning solution outlet provides a space for discharging a liquid solution(30) formed on the surface of the megasonic transducer.

Abstract translation: 目的：提供一种清洁装置，光刻装置和用于清洁光刻装置的方法，以有效地清洗使用超声波通过液体的浸没式光刻投影装置。 构成：超声波换能器（20）清洁浸没式光刻投影装置的表面。 液体供应系统在兆声传感器和要清洁的表面之间提供液体。 清洁溶液出口提供用于排出形成在兆声换能器表面上的液体溶液（30）的空间。

公开(公告)号：JP2012253389A

公开(公告)日：2012-12-20

申请号：JP2012208465

申请日：2012-09-21

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： CLOIN CHRISTIAN GERARDUS NORBERTUS HENDRICUS MARIE ,  KATE NICOLAAS TEN ,  KEMPER NICOLAAS R ,  STAVENGA MARCO KOERT ,  EUMMELEN ERIK HENRICUS EGIDIUS CATHARINA ,  RIEPEN MICHAEL ,  ELISSEEVA OLGA VLADIMIROVNA ,  WILFRED MATHIJS GUNTHER TIJMEN ,  VAN DER WEKKEN MICHAEL CHRISTIAAN

IPC: H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70733

Abstract: PROBLEM TO BE SOLVED: To disclose a lithographic projection apparatus comprising a table, a shutter member, fluid handling structure, and a fluid extraction system.SOLUTION: Fluid handling structure supplies and shuts in liquid between a projection system and (i) a substrate, (ii) a substrate table, (iii) a surface of a shutter member, or (iv) an arbitrary combination selected from (i)-(iii). The surface of the shutter member adjoins a surface of the table and is disposed on the same surface of the table. The surface of the shutter member and the surface of the table can be separated by gap. A fluid extraction system removes the liquid from the gap.

Abstract translation: 要解决的问题：公开一种包括工作台，挡板部件，流体处理结构和流体抽出系统的光刻投影装置。 解决方案：流体处理结构在投影系统和（i）基板之间供应和关闭液体，（ii）基板台，（iii）挡板部件的表面，或（iv）任意组合， （ⅰ） - （ⅲ）。 活门构件的表面与桌子的表面相邻并且设置在桌子的相同表面上。 活门构件的表面和桌子的表面可以通过间隙分开。 流体萃取系统从间隙中除去液体。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2011071535A

公开(公告)日：2011-04-07

申请号：JP2010260034

申请日：2010-11-22

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STAVENGA MARCO KOERT ,  BRULS RICHARD JOSEPH ,  JANSEN HANS ,  ANTONIUS LEENDERS MARTINUS HENDRIKUS ,  WANTEN PETER FRANCISCUS ,  CUIJPERS JOHANNES WILHELMUS JACOBUS LEONARDUS ,  BEEREN RAYMOND GERARDUS MARIUS ,  DE JONG ANTHONIUS MARTINUS CORNELIS PETRUS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: H01L21/68735 ,  G03F7/70916 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To provide a method of effectively cleaning an immersion lithographic device. SOLUTION: The lithographic device includes: a substrate table WT configured to hold a substrate; a projection system configured to project a patterned radiation beam onto the substrate; a megasonic transducer 20 configured to clean a surface; and a liquid supply system configured to supply a liquid between the megasonic transducer 20 and the surface to be cleaned. A surface of an immersion lithography projector is cleaned using megasonic waves generated from the megasonic transducer 20 configured to clean the surface. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种有效地清洗浸没式光刻设备的方法。 光刻设备包括：被配置为保持衬底的衬底台WT; 投影系统，被配置为将图案化的辐射束投影到所述衬底上; 构造成清洁表面的兆声换能器20; 以及液体供应系统，其构造成在所述兆声换能器20和待清洁表面之间提供液体。 浸没光刻投影仪的表面使用被配置为清洁表面的兆声传感器20产生的兆声波来清洁。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010135787A

公开(公告)日：2010-06-17

申请号：JP2009268224

申请日：2009-11-26

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KNAAPEN THIJS EGIDIUS JOHANNES ,  BRULS RICHARD JOSEPH ,  VAN DOMMELEN YOURI JOHANNES LAURENTIUS MARIA ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  KAMPHUIS MARTIJN HENDRIK ,  LIEBREGTS PAULUS MARTINUS MARIA ,  MAAS RUDOLF ADRIANUS JOANNES ,  STAVENGA MARCO KOERT ,  VERSPAGET COEN CORNELIS WILHELMUS ,  PELLENS RUDY JAN MARIA ,  VAN DER HOEVEN JAN CORNELIS ,  ANSTOTZ DAVID LUCIEN ,  BRANDS GERT-JAN GERARDUS JOHANEES THOMAS ,  MARCUS JOHANNES VAN DER ZANDEN ,  BADAM VIJAY KUMAR ,  DE GROOT CASPER RODERIK

IPC: H01L21/027

CPC classification number: G03F7/70925 ,  G03B27/52 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus reducing latent adverse effect of liquid drops remained on a substrate table after light-exposure of a substrate. SOLUTION: The lithographic apparatus having a table including a target and/or a sensor and a liquid displacement device displacing a liquid from the target and/or the sensor using a localized gas flow is disclosed. The liquid displacement device can be disposed at various positions. For example, the liquid displacement device can be mounted on a liquid handling device at a light-exposure station and can be disposed adjacent to a transfer passage between the light-exposure station and a measuring station or adjacent to a load/unload station or the sensor in the transfer passage. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻设备，其减少了在曝光基板之后残留在基板台上的液滴的潜在不利影响。 公开了具有包括靶和/或传感器的台的液晶显示装置以及使用局部气流从液体和/或传感器移出液体的液体排量装置。 液体置换装置可以设置在各种位置。 例如，液体移动装置可以安装在曝光站处的液体处理装置上，并且可以设置在靠近曝光站和测量站之间或与装载/卸载站相邻的传送通道或者 传感器在传输通道中。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2008294439A

公开(公告)日：2008-12-04

申请号：JP2008120668

申请日：2008-05-02

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JONG ANTHONIUS MARTINUS COR ,  STAVENGA MARCO KOERT ,  JANSEN BAUKE ,  BEEREN RAYMOND GERARDUS MARIUS ,  KORNELIS TIJMEN HOEKERD ,  JANSEN HANS ,  PETER FRANCISCUS WANTEN ,  JOHANNES WILHELMUS JACOBUS LEO

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70925 ,  B08B3/12 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide lithographic equipment which is easily and effectively cleaned, and to provide a cleaning method to effectively clean the liquid immersion lithographic equipment. SOLUTION: A cleaning tool to clean a surface of a component of the lithographic equipment is disclosed. The cleaning tool includes a sonic transducer, a liquid supply mechanism to supply liquid to a reservoir between the surface to be cleaned and the sonic transducer, and a liquid outlet to discharge the liquid supplied by the liquid supply mechanism. The cleaning tool is constituted so that the liquid may flow into the liquid outlet under operation of gravity when used. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供易于有效清洁的平版印刷设备，并提供清洁方法以有效地清洁液浸光刻设备。 公开了一种用于清洁光刻设备的部件的表面的清洁工具。 清洁工具包括声音换能器，用于将液体供应到待清洁表面与声音换能器之间的储液器的液体供给机构以及用于排出由液体供应机构供应的液体的液体出口。 清洁工具被构造成使得当使用时液体可以在重力作用下流入液体出口。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2005079584A

公开(公告)日：2005-03-24

申请号：JP2004247635

申请日：2004-08-27

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： DIERICHS MARCEL MATHIJS THEODO ,  DONDERS SJOERD NICOLAAS LAMBER ,  JACOBS JOHANNES HENRICUS WILHE ,  JANSEN HANS ,  LOOPSTRA ERIK ROELOF ,  JEROEN JOHANNES SOPHIA MARIA M ,  STAVENGA MARCO KOERT ,  STREEFKERK BOB ,  VERHAGEN MARTINUS CORNELIS MAR ,  SEUNTIENS-GRUDA LEJLA

IPC: B01D61/02 ,  B01D61/24 ,  C02F1/04 ,  C02F1/28 ,  C02F1/32 ,  C02F1/42 ,  C02F1/44 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70866 ,  B01D19/0031 ,  B01D61/025 ,  B01D61/24 ,  C02F1/04 ,  C02F1/20 ,  C02F1/28 ,  C02F1/283 ,  C02F1/32 ,  C02F1/42 ,  C02F1/441 ,  C02F2103/40 ,  G03F7/2041 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic projection apparatus, in which a liquid supply system maintains a liquid in a space between a final element of a projection system and a substrate with a liquid confinement system. SOLUTION: The liquid supply system further comprises a de-mineralizing unit, a distillation unit and a UV radiating source for the purification of an immersion liquid. Chemicals may be added to the immersion liquid for the inhibition of organism growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of organisms is reduced. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种光刻投影装置，其中液体供应系统在具有液体限制系统的投影系统的最终元件和基板之间的空间中保持液体。 解决方案：液体供应系统还包括去矿化单元，蒸馏单元和用于净化浸液的UV辐射源。 可以将化学品加入到用于抑制生物体生长的浸液中，并且液体供应系统的组分可以由对可见光不透明的材料制成，使得生物体的生长减少。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2011187971A

公开(公告)日：2011-09-22

申请号：JP2011093700

申请日：2011-04-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JONG ANTHONIUS MARTINUS CORNELIS PETRUS ,  STAVENGA MARCO KOERT ,  JANSEN BAUKE ,  BEEREN RAYMOND GERARDUS MARIUS ,  KORNELIS TIJMEN HOEKERD ,  JANSEN HANS ,  PETER FRANCISCUS WANTEN ,  JOHANNES WILHELMUS JACOBUS LEONARDUS CUIJPERS

IPC: H01L21/027

CPC classification number: G03F7/70925 ,  B08B3/12 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus which is easily and effectively cleaned, and to provide a cleaning method to effectively clean the liquid immersion lithographic apparatus. SOLUTION: A cleaning tool to clean a surface of a component of the lithographic apparatus is disclosed. The cleaning tool includes a sonic transducer, a liquid supply mechanism to supply liquid to a reservoir between the surface to be cleaned and the sonic transducer, and a liquid outlet to discharge the liquid supplied by the liquid supply mechanism. The cleaning tool is constituted so that the liquid may flow into the liquid outlet under operation of gravity when used. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种容易且有效地清洁的光刻设备，并提供一种有效地清洁液浸式光刻设备的清洁方法。 公开了一种用于清洁光刻设备的部件的表面的清洁工具。 清洁工具包括声音换能器，用于将液体供应到待清洁表面与声音换能器之间的储液器的液体供给机构以及用于排出由液体供应机构供应的液体的液体出口。 清洁工具被构造成使得当使用时液体可以在重力作用下流入液体出口。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011129951A

公开(公告)日：2011-06-30

申请号：JP2011033186

申请日：2011-02-18

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STAVENGA MARCO KOERT ,  BRULS RICHARD JOSEPH ,  JANSEN HANS ,  ANTONIUS LEENDERS MARTINUS HENDRIKUS ,  WANTEN PETER FRANCISCUS ,  CUIJPERS JOHANNES WILHELMUS JACOBUS LEONARDUS ,  BEEREN RAYMOND GERARDUS MARIUS ,  DE JONG ANTHONIUS MARTINUS CORNELIS PETRUS

IPC: H01L21/027

CPC classification number: H01L21/68735 ,  G03F7/70916 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To provide a method of effectively cleaning an immersion lithographic apparatus.
SOLUTION: A cleaning apparatus for immersion lithographic apparatus comprises a substrate table so configured as to hold a substrate, a projection system PS configured to project a patterned radiation beam onto the substrate, a megasonic transducer 20 configured to clean a surface, and a liquid supply system configured to supply a liquid between the megasonic transducer and the surface to be cleaned. The surface of the immersion lithographic projection apparatus is cleaned using megasonic waves generated from the megasonic transducer configured to clean the surface.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种有效地清洗浸没式光刻设备的方法。 解决方案：一种用于浸没式光刻设备的清洁设备，包括：被配置为保持基板的基板台，配置成将图案化的辐射束投影到基板上的投影系统PS，配置成清洁表面的兆声换能器20，以及 液体供应系统，构造成在所述兆声换能器和待清洁表面之间提供液体。 浸没式光刻投影装置的表面使用由构造成清洁表面的兆声传感器产生的兆声波来清洁。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2009246384A

公开(公告)日：2009-10-22

申请号：JP2009169087

申请日：2009-07-17

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STAVENGA MARCO KOERT ,  JACOBS JOHANNES HENRICUS WILHE ,  JANSEN HANS ,  VERHAGEN MARTINUS CORNELIS MAR

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/709

Abstract: PROBLEM TO BE SOLVED: To disclose varieties of pressure adjusting means in order to reduce pressure gradient in a liquid supply system of a lithography apparatus. SOLUTION: The liquid supply system includes a liquid sealing structure constituted so as to at least partially close liquid between a projection system of a lithography apparatus and a substrate table. There is the possibility that high pressure gradient might cause particulate contamination in the liquid supply system/in sealing liquid structure. The pressure gradient is reduced for example by means of the use of slow switching of one valve or a plurality of valves, by means of the use of an extraction flow detouring one valve or a plurality of valves or passing through the valve, not switching the valve to a closed position or additionally to by means of the use of a branch for liquid flowing to a liquid discharge passage, by means of the use of a pressure control device or a flow rate limiter for preventing shock waves, and by means of the use of liquid/damper of a buffering capacity for compensating pressure variation. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：为了降低光刻设备的液体供应系统中的压力梯度，公开各种压力调节装置。 解决方案：液体供应系统包括液体密封结构，其构造成在光刻设备的投影系统和基板台之间至少部分地关闭液体。 高压梯度有可能导致液体供应系统/密封液体结构中的颗粒污染。 例如，通过使用一个阀或多个阀的缓慢切换，通过使用迂回一个阀或多个阀或通过阀的提取流来降低压力梯度，而不切换 阀门到关闭位置，或另外通过使用液体流向液体排放通道的分支，借助于使用压力控制装置或流量限制器来防止冲击波，并借助于 使用缓冲能力的液体/阻尼器来补偿压力变化。 版权所有（C）2010，JPO＆INPIT