Lithographic apparatus and device manufacturing method
    1.
    发明专利
    Lithographic apparatus and device manufacturing method 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号:JP2007258749A

    公开(公告)日:2007-10-04

    申请号:JP2007154924

    申请日:2007-06-12

    Abstract: PROBLEM TO BE SOLVED: To provide an interferometric displacement measuring system for use in a lithographic projection apparatus having increased precision in spite of pressure and temperature disturbances in the optical paths of measurement and reference beams. SOLUTION: Measurement values of an interferometric measurement system are corrected for variations of atmospheric conditions such as pressure, temperature and turbulence using measurement values from a second harmonic interferometer. A ramp, representing the dependence of the SHI (second harmonic interferometer) data on a path length, is removed before use of the SHI data. The SHI may use a passive Q-switched laser as a light source and Brewster prisms in a receiver module. Optical fibers may be used to conduct light to detectors. A mirror reflecting the measurement beams has a coating of a thickness selected to minimize the sensitivity of the SHI data to changes in the coating thickness. COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题:提供一种用于光刻投影设备的干涉位移测量系统,其具有在测量和参考光束的光路中的压力和温度干扰的情况下具有提高的精度。 解决方案:使用来自二次谐波干涉仪的测量值来校正干涉测量系统的测量值,以测量大气条件(如压力,温度和湍流)的变化。 代表SHI(二次谐波干涉仪)数据对路径长度的依赖性的斜坡在使用SHI数据之前被去除。 SHI可以使用无源Q开关激光器作为光源,并在接收器模块中使用布鲁斯特棱镜。 可以使用光纤将光传导到检测器。 反映测量光束的反射镜具有选择的厚度的涂层,以使SHI数据对涂层厚度的变化的敏感性最小化。 版权所有(C)2008,JPO&INPIT

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