公开(公告)号：NL2010544A

公开(公告)日：2013-10-03

申请号：NL2010544

申请日：2013-03-28

Applicant: ASML NETHERLANDS BV ,  TNO

Inventor： JONG ANTHONIUS ,  DONCK JACQUES

IPC: G01N21/94 ,  G03F7/20

公开(公告)号：NL2003421A

公开(公告)日：2010-04-22

申请号：NL2003421

申请日：2009-09-02

Applicant: ASML NETHERLANDS BV

Inventor： JONG ANTHONIUS ,  JANSEN HANS ,  DONCK JACQUES ,  GORTER HARRIE ,  BERG JOHANNES

IPC: G03F7/20

Abstract: A lithographic apparatus includes a fluid supply system configured to provide a cleaning fluid to a surface to be cleaned. The cleaning fluid includes from 25 to 98.99 wt % water; from 1 to 74.99 wt % solvent selected from one or more glycol ethers, esters, alcohols and ketones; and from 0.01 to 5 wt % surfactant.